公开(公告)号：US20020074508A1

公开(公告)日：2002-06-20

申请号：US10001165

申请日：2001-12-04

Inventor： James R. Kahn ,  Cheryl A. Phillips ,  Harold R. Kaufman

IPC: H01J027/00

CPC classification number: H01J27/024

Abstract: In accordance with one specific embodiment of the present invention, the ion optics for use with an ion source have a plurality of electrically conductive grids that are mutually spaced apart and have mutually aligned respective pluralities of apertures through which ions may be accelerated and wherein each grid has an integral peripheral portion. A plurality of moment means are applied to a circumferentially distributed plurality of locations on the peripheral portion of each grid, which is initially flat, thereby establishing an annular segment of a cone as the approximate shape for that peripheral portion and a segment of a sphere as the approximate dished shape for the grid as a whole. The plurality of grids have conformal shapes in that the direction of deformation and the approximate spherical radii are the same. This elastic deformation during installation avoids any need for any permanent or inelastic deformation during fabrication, as well as controlling the excessive thermal displacements and accompanying performance changes to which flat grids are prone.

Abstract translation: 根据本发明的一个具体实施例，与离子源一起使用的离子光学器件具有多个相互间隔开的导电栅格，并且具有相互排列的多个孔，通过该孔可以离子加速，并且其中每个栅格 具有整体的周边部分。 多个力矩装置被施加到每个格栅的周边部分上的周向分布的多个位置，其最初是平坦的，从而建立锥体的环形段作为该外围部分和球体的一部分的近似形状， 作为整体的网格的近似抛光形状。 多个格栅具有共形形状，因为变形方向和近似球面半径相同。 安装过程中的这种弹性变形避免了在制造过程中任何永久性或非弹性变形的任何需要，以及控制过度的热位移和伴随的平坦栅格易于发生的性能变化。

公开(公告)号：US20020070347A1

公开(公告)日：2002-06-13

申请号：US09950940

申请日：2001-09-12

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Jack Bisson ,  Zhiyong Zhao ,  George Gammel ,  Daniel Alvarado ,  Craig Walker

IPC: H01J027/00

CPC classification number: H01J37/244 ,  H01J2237/24405 ,  H01J2237/31703

Abstract: A Faraday system for measuring ion beam current in an ion implanter or other ion beam treatment system includes a Faraday cup body defining a chamber which has an entrance aperture for receiving an ion beam, a suppression electrode positioned in proximity to the entrance aperture to produce electric fields for inhibiting escape of electrons from the chamber, and a magnet assembly positioned to produce magnetic fields for inhibiting escape of electrons from the chamber. The chamber may have a relatively small ratio of chamber depth to entrance aperture width.

Abstract translation: 用于测量离子注入机或其他离子束处理系统中的离子束电流的法拉第系统包括法拉第杯体，其限定具有用于接收离子束的入口孔的腔室，位于入口孔附近的抑制电极，以产生电 用于抑制电子从腔室逃逸的场;以及磁体组件，其被定位成产生用于抑制电子从腔室逸出的磁场。 室可以具有相对小的室深度与入口孔宽度的比率。

公开(公告)号：US20010028039A1

公开(公告)日：2001-10-11

申请号：US09797860

申请日：2001-03-05

Inventor： Rainer Plontke ,  Ines Stolberg ,  Michael Blume ,  Rainer Kabsch ,  Matthias Zierbock

IPC: H01J027/00

CPC classification number: H01J37/3045 ,  H01J2237/30438 ,  H01J2237/3175

Abstract: The invention refers to the field of electron beam lithography, in particular to a method for directing an electron beam (6) onto a target position (Z) on the surface of a substrate, the substrate first being placed onto a movable stage (2) and the stage (2) then being displaced stepwise, in the X and/or Y coordinates of a Cartesian grid, until the target position (Z) is located at a spacing from the impact point (P) of the undeflected electron beam (6) which is smaller than the smallest step distance of the stage displacement system, and then the electron beam (6) is directed onto the target position (Z) by deflection. This results in a considerable increase in positioning accuracy in electron beam lithography. Positioning accuracies on the order of 0.1 nm to 0.05 are achievable. The method is suitable in particular for writing grating patterns in which the spacing between the individual grating lines must be maintained with high accuracy.

Abstract translation: 本发明涉及电子束光刻领域，特别涉及一种将电子束（6）引导到衬底表面上的目标位置（Z）上的方法，该衬底首先被放置在可动平台（2）上， 然后阶段（2）在笛卡尔网格的X和/或Y坐标中逐步移位，直到目标位置（Z）位于与未偏转的电子束（6）的冲击点（P）的间隔 ）小于级位移系统的最小步距，然后电子束（6）通过偏转被引导到目标位置（Z）上。 这导致电子束光刻中定位精度的显着提高。 定位精度可达0.1〜0.05。 该方法特别适用于写入光栅图案，其中必须以高准确度保持单个光栅线之间的间隔。

公开(公告)号：US20040178339A1

公开(公告)日：2004-09-16

申请号：US10384236

申请日：2003-03-06

Applicant: The Trustees of Princeton University

Inventor： Charles Gentile ,  George Ascione ,  Andrew Carpe ,  Stephen Langish ,  John Parker

IPC: G01T001/04 ,  H01J027/00

CPC classification number: G01V5/0075 ,  G01V5/0091

Abstract: The present invention is directed toward an apparatus and methods for detection and identification of target radionuclides and threatening radionuclides that may be present in a sample volume. One aspect of the invention discloses a digital computational apparatus that determines similarity or identity to a target radionuclide or a threatening radionuclide. In another aspect, the invention discloses a high throughput apparatus for detection of a target radionuclide in a sample volume, or for identifying a target radionuclide present in a sample volume, or both, that includes a detecting means, an analyzing means, and an identifying means. In a further aspect the invention discloses a high throughput apparatus for communicating the presence of a target radionuclide in a sample volume, the identity of a target radionuclide in a sample volume, or both to appropriate personnel. In yet another aspect, the invention provides a high throughput apparatus for warning of the presence and/or the identity of a threatening radionuclide in a sample volume to appropriate personnel. The invention furthermore provides methods for accomplishing the above-disclosed detection, identification, communication and warning.

Abstract translation: 本发明涉及用于检测和鉴定可能存在于样品体积中的靶标放射性核素和威胁性放射性核素的装置和方法。 本发明的一个方面公开了一种确定与目标放射性核素或威胁放射性核素的相似性或身份的数字计算装置。 另一方面，本发明公开了一种用于检测样品体积中目标放射性核素或用于鉴定存在于样品体积中的目标放射性核素或两者的高通量装置，其包括检测装置，分析装置和识别 手段。 在另一方面，本发明公开了一种高通量装置，用于将样品体积中目标放射性核素的存在，样品体积中的靶标放射性核素的身份或两者传达给适当的人员。 在另一方面，本发明提供了一种用于向适当的人员警告样品体积中的威胁放射性核素的存在和/或身份的高通量装置。 本发明还提供了完成上述检测，识别，通信和警告的方法。

公开(公告)号：US20040124365A1

公开(公告)日：2004-07-01

申请号：US10670556

申请日：2003-09-26

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Michael Steigerwald

IPC: H01J027/00

CPC classification number: H01J37/075 ,  H01J37/073 ,  H01J37/243 ,  H01J2237/06316 ,  H01J2237/065

Abstract: An electron beam source comprises a source surface illuminated with a photon beam of adjustable intensity. The photon beam assists emission of electrons from the source surface due to a photo effect. An electric extraction field further assists in electron emission. Further, a heater is provided for further assisting in electron emission by a thermionic effect. An electron beam current is measured, and the intensity of the photon beam is adjusted based on the measured electron beam current.

Abstract translation: 电子束源包括用可调强度的光子束照射的源表面。 由于光照效应，光子束有助于来自源表面的电子的发射。 电提取场进一步有助于电子发射。 此外，提供加热器以进一步辅助电子发射通过热离子效应。 测量电子束电流，并且基于测量的电子束电流来调整光子束的强度。

公开(公告)号：US20040069953A1

公开(公告)日：2004-04-15

申请号：US10354929

申请日：2003-01-30

Inventor： Paul Sylvester

IPC: H01J027/00

CPC classification number: G21G4/08 ,  Y10S423/07

Abstract: A bismuth-213 generator comprising an insoluble composition having the general formula Zr(Phosponate)x(HPO4)2nullx.nH2O, wherein x is between 0 and 2; and n is the number of waters of hydration; and wherein cations of radioactive isotopes selected from radium, actinium and combinations thereof are immobilized on the composition. The value of x may be between about 0.2 and about 1. The phosphonate may be n-phosphonomethyl-miniodiacetic acid (PMIDA), wherein x may be between about 0.1 and about 1.9. The phosphonate may be one or more phosphonate having the formula: H2O3Pnull(CH2)a-Nnull((CH2)bCO2H)null((CH2)cCO2H), wherein a, b, and c are numbers from 1 to 3 that may or may not be equal. The value of x may also be between about 0.1 and 1.9.

Abstract translation: 铋-213发生器，其包含具有通式Zr（Phosponate）x（HPO 4）2-x.nH 2 O的不溶性组合物，其中x在0和2之间; n是水合水的数量; 并且其中选自镭，锕及其组合的放射性同位素的阳离子固定在组合物上。 x的值可以在约0.2和约1之间。膦酸酯可以是正膦酰基甲基 - 次碘酸（PMIDA），其中x可以在约0.1和约1.9之间。 膦酸酯可以是一种或多种具有下式的膦酸酯：H 2 O 3 P - （CH 2）a N - （（CH 2）b CO 2 H） - （（CH 2）c CO 2 H），其中a，b和c是1至3的数，其可以或可以 不平等 x的值也可以在约0.1和1.9之间。

公开(公告)号：US20040036032A1

公开(公告)日：2004-02-26

申请号：US10232502

申请日：2002-08-30

Inventor： Ka-Ngo Leung ,  Jani Reijonen ,  Arun Persaud ,  Qing Ji ,  Ximan Jiang

IPC: H01J027/00

CPC classification number: H01J37/08 ,  H01J27/18 ,  H01J37/077

Abstract: An electron beam system is based on a plasma generator in a plasma ion source with an accelerator column. The electrons are extracted from a plasma cathode in a plasma ion source, e.g. a multicusp plasma ion source. The beam can be scanned in both the x and y directions, and the system can be operated with multiple beamlets. A compact focused ion or electron beam system has a plasma ion source and an all-electrostatic beam acceleration and focusing column. The ion source is a small chamber with the plasma produced by radio-frequency (RF) induction discharge. The RF antenna is wound outside the chamber and connected to an RF supply. Ions or electrons can be extracted from the source. A multi-beam system has several sources of different species and an electron beam source.

公开(公告)号：US20030201398A1

公开(公告)日：2003-10-30

申请号：US09894204

申请日：2001-06-28

Inventor： Patrick D. Perkins

IPC: H01J027/00 ,  C22C019/03

CPC classification number: H01J49/10 ,  H01J37/08

Abstract: The present invention relates to an ionization source having a chamber for ionizing a sample. The ionization chamber has surfaces to reduce the overall interaction with reactive samples. The inner surface walls of the ionization chamber or the ionization chamber may be formed from an inert super alloy. For instance, Inconelnull 625, Inconelnull 601 or Hastelloynull) may comprise the ionization chamber or the surface walls of the ionization chamber. The invention also includes a method for reducing the interaction of a reactive analyte with an ion source.

Abstract translation: 本发明涉及一种具有用于离子化样品的室的电离源。 电离室具有减少与反应性样品的整体相互作用的表面。 电离室或电离室的内表面壁可以由惰性超级合金形成。 例如，Inconel TM 625，Inconel TM 601或Hastelloy）可以包括电离室或电离室的表面壁。 本发明还包括减少反应性分析物与离子源的相互作用的方法。

公开(公告)号：US20030122085A1

公开(公告)日：2003-07-03

申请号：US10034728

申请日：2001-12-27

Inventor： Gerhard Stengl ,  Hans Loschner ,  Elmar Platzgummer

IPC: H01J027/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/0807 ,  H01J2237/31755

Abstract: A field-ionization source, comprising array of emitter electrodes (31) and counter electrodes (32) positioned at a distance from the base (P1) of the emitter electrodes. The emitter electrodes, ending in emitter tips (61), extend from their bases towards corresponding openings (62) of the counter electrodes and are adapted to be connected to a positive electric high voltage with respect to the counter electrodes. At the emitter tips (61), gas species provided from a source substance are field-ionized by means of the high voltage and ions thus produced are accelerated through the openings (61, 41). A distribution system (43, S2) is provided to distribute said source substance from a supply to the space (S1) around the emitter tips.

Abstract translation: 一种场电离源，包括位于离发射极电极的基极（P1）一定距离处的发射极电极（31）和对置电极（32）阵列。 以发射极尖端（61）结束的发射电极从对准电极的相应开口（62）的基部延伸，并且适于相对于相对电极连接到正电高电压。 在发射极尖端（61）处，从源物质提供的气体物质通过高电压进行场离子化，所产生的离子通过开口（61,41）被加速。 提供分配系统（43,42）以将源物质从电源分配到围绕发射器尖端的空间（S1）。

公开(公告)号：US20030057378A1

公开(公告)日：2003-03-27

申请号：US09550171

申请日：2000-04-14

Inventor： Didier Pierrejean ,  Bruno Galland

IPC: H01J027/00

CPC classification number: H01J27/04 ,  H01J43/246 ,  H01J49/08 ,  H01J49/147

Abstract: In accordance with the invention, the ion source of a time-of-flight mass spectrometer includes an electron gun having an electron source and at least one electrode for conditioning the flow of electrons, followed by at least one microchannel wafer for generating a pulsed secondary electron beam containing a greater number of electrons from a pulsed primary electron beam. The secondary electron beam enters a gas ionization area of an ion gun which produces a flow of ions which is then passed through the flight tube in order to be analyzed by an ion detector. This provides a high-performance ion source which is compact, sensitive and easy to integrate.

Abstract translation: 根据本发明，飞行时间质谱仪的离子源包括具有电子源的电子枪和用于调节电子流的至少一个电极，随后是用于产生脉冲次级的至少一个微通道晶片 电子束包含来自脉冲一次电子束的更多数量的电子。 二次电子束进入离子枪的气体离子化区域，其产生离子流，然后将其流过飞行管，以便通过离子检测器进行分析。 这提供了一种高性能的离子源，它是紧凑，灵敏和容易集成的。