公开(公告)号：JPS585320Y2

公开(公告)日：1983-01-29

申请号：JP1142876

申请日：1976-02-03

IPC: H01J37/06 ,  G11B9/10 ,  H01J3/12 ,  H01J29/56 ,  H01J37/09 ,  H01J37/305 ,  G11B11/02

公开(公告)号：JPS5569942A

公开(公告)日：1980-05-27

申请号：JP14429779

申请日：1979-11-07

Applicant: CONTROL DATA CORP

Inventor： SUTAARINGU PURAISU NIYUUBERII ,  JIYON REINORUZU BAAGESU

IPC: H01J3/12 ,  H01J3/18 ,  H01J9/02 ,  H01J29/18 ,  H01J29/46 ,  H01J29/62 ,  H01J29/74 ,  H01J29/80

公开(公告)号：JPS54100661A

公开(公告)日：1979-08-08

申请号：JP691178

申请日：1978-01-25

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO

IPC: H01J37/153 ,  H01J3/12 ,  H01J37/21

Abstract: PURPOSE:To make it possible to irradiate invariably a sample with electron-beam flux in the smallest aberration circle state even if the electron-beam flux is astigmatic. CONSTITUTION:Information generated from sample 11 through electron-beam irradiation is transmitted to automatic focusing unit 16 and display unit 17 by way of detector 14 and amplifier 15. With a start commanded by an operator, timing circuit 18 sends a signal to deflecting coils 13X and 13Y to allow electron beam EB to attain a circular or oval scan repeatedly, and also sends signal (a) synchronizing with the circular scan to automatic focusing unit 16 to start its operation. Namely, the unit 16 integrates the variation of a detection signal during the circular scan and transmits signal (b), at the time of a current value of an object lens when the variation is the smallest, to fix the current to the value. By this current value, the smallest aberration circle can be obtained. A clear electron microscope image can therefore be obtained by allowing an electron beam to make a raster scan in the smallest abberation circle state with the change-over switch returned.

公开(公告)号：JPS5193860A

公开(公告)日：1976-08-17

申请号：JP1888275

申请日：1975-02-17

IPC: H01J37/073 ,  H01J3/12 ,  H01J37/06 ,  H01J37/09

公开(公告)号：JPS5188167U

公开(公告)日：1976-07-14

申请号：JP562375

申请日：1975-01-09

IPC: H01J37/09 ,  H01J3/12 ,  H01J37/26

公开(公告)号：JP3723577B2

公开(公告)日：2005-12-07

申请号：JP52684697

申请日：1996-12-26

Applicant: ウシオ電機株式会社

Inventor： ワカロプロス，ジョージ

IPC: H01J3/12 ,  H01J33/02 ,  H01J3/18 ,  G21K5/04 ,  H01J1/15 ,  H01J37/06

CPC classification number: H01J3/12 ,  H01J33/02

公开(公告)号：JPH03149728A

公开(公告)日：1991-06-26

申请号：JP28786589

申请日：1989-11-07

Applicant: CANON KK

Inventor： NAKAMURA NAOHITO ,  ONO HARUTO ,  SUZUKI HIDETOSHI ,  NOMURA ICHIRO

IPC: H01J29/62 ,  G09F9/30 ,  H01J3/12 ,  H01J29/87 ,  H01J31/12

Abstract: PURPOSE:To prevent the collision of an electron beam with a support wall, reduce charge-up, and improve the focusing property of an electron beam to a face plate by providing an auxiliary electrode in parallel with the face plate on the atmospheric pressure-proof support wall, and forming an electron lens between the face plate and the auxiliary electrode. CONSTITUTION:An auxiliary electrode 17 with an electron passing hole at the position with the distance (b) from an electron source 15 is protruded and fixed on the atmospheric pressure-proof support wall 18 of a flat type image display device oppositely arranged with a face plate 10 applied with the electron accelerating voltage Va at the position with the distance D from the electron source 15 via the atmospheric pressure-proof support wall 18, and a means applying the constant voltage Vc not changed in response to the information signal satisfying the relation Vc

公开(公告)号：JPS5914221B2

公开(公告)日：1984-04-03

申请号：JP15409077

申请日：1977-12-21

Applicant: Tokyo Shibaura Electric Co

Inventor： TAKIGAWA TADAHIRO

IPC: H01J37/06 ,  G03F1/00 ,  G03F1/76 ,  H01J3/12 ,  H01J37/305 ,  H01L21/027

公开(公告)号：JPS5848989B2

公开(公告)日：1983-11-01

申请号：JP691178

申请日：1978-01-25

Applicant: Nippon Electron Optics Lab

Inventor： NAMAE TAKAO

IPC: H01J37/153 ,  H01J3/12 ,  H01J37/21

公开(公告)号：JPS5459255U

公开(公告)日：1979-04-24

申请号：JP13295377

申请日：1977-10-03

IPC: H01J31/15 ,  H01J3/12 ,  H01J29/00