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公开(公告)号：DE2829080C2
公开(公告)日：1989-07-27
申请号：DE2829080
申请日：1978-07-01
Applicant: CONTROL DATA CORP., MINNEAPOLIS, MINN., US
Inventor： HARTE, KENNETH J., CARLISLE, MASS., US
IPC: H01J3/38 , G09G1/04 , G11C11/30 , H01J27/00 , H01J29/46 , H01J29/56 , H01J29/70 , H01J31/08 , H01J31/60
Abstract: An electron beam tube electrostatic deflection system and method of operation is described. The electron beam tube includes an eight-fold deflector and means are provided for applying two different quadrupole correction electric potentials to selected ones of the eight-fold deflector members and for applying an octupole correction electrical potential to all eight deflector members. In the preferred embodiment, the quadrupole and octupole correction potentials applied to one set of four deflector members are represented by the respective values (V2c - V), (-V2c - V), (V2c - V) and (-V2c - V), and the quadrupole and octupole correction potentials applied to the second set of four deflector members are represented respectively by the values (V2s + V), (-V2s + V), (V2s + V) and (-V2s + V) where the quadrupole correction electric potential V2c = [A2c(Vx2 - Vy2)]/Vc, (1) THE QUADRUPOLE CORRECTION ELECTRIC POTENTIAL V2s = (2A2s VxVy)/Vc, (2) AND THE OCTUPOLE CORRECTION POTENTIAL V applied to all eight of the eight-fold deflector members is given by the expression V = [A4(Vx4 - 6Vx2Vy2 + Vy4)]/4Vc3 (3) WHERE A2c, A2s and A4 are constants, Vx and Vy are the x and y deflection electric potentials, and -Vc is the cathode voltage of the electron gun used in the electron beam tube apparatus. In preferred arrangements, the electrostatic deflection system further includes means for applying a dynamic focusing electric potential to the objective lens assembly of the electron beam tube apparatus in conjunction with both the correction and deflection electric potentials described above. The dynamic focusing electric potential is VOBJ(DF) = VOBJ(0) + [(ADF(Vx2 + Vy2))/Vc](4) WHERE ADF is a constant and VOBJ(O) is the uncorrected value of the direct current objective lens supply voltage. Both deflection and correction electric potentials are developed by an eight-fold deflector voltage generator which includes as its heart a novel octupole-quadrupole generator.
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公开(公告)号：FR2397065B1
公开(公告)日：1983-05-06
申请号：FR7820063
申请日：1978-07-05
Applicant: CONTROL DATA CORP
IPC: H01J3/38 , G09G1/04 , G11C11/30 , H01J27/00 , H01J29/46 , H01J29/56 , H01J29/70 , H01J31/08 , H01J31/60 , H01J29/74 , H01J31/58
Abstract: An electron beam tube electrostatic deflection system and method of operation is described. The electron beam tube includes an eight-fold deflector and means are provided for applying two different quadrupole correction electric potentials to selected ones of the eight-fold deflector members and for applying an octupole correction electrical potential to all eight deflector members. In the preferred embodiment, the quadrupole and octupole correction potentials applied to one set of four deflector members are represented by the respective values (V2c - V), (-V2c - V), (V2c - V) and (-V2c - V), and the quadrupole and octupole correction potentials applied to the second set of four deflector members are represented respectively by the values (V2s + V), (-V2s + V), (V2s + V) and (-V2s + V) where the quadrupole correction electric potential V2c = [A2c(Vx2 - Vy2)]/Vc, (1) THE QUADRUPOLE CORRECTION ELECTRIC POTENTIAL V2s = (2A2s VxVy)/Vc, (2) AND THE OCTUPOLE CORRECTION POTENTIAL V applied to all eight of the eight-fold deflector members is given by the expression V = [A4(Vx4 - 6Vx2Vy2 + Vy4)]/4Vc3 (3) WHERE A2c, A2s and A4 are constants, Vx and Vy are the x and y deflection electric potentials, and -Vc is the cathode voltage of the electron gun used in the electron beam tube apparatus. In preferred arrangements, the electrostatic deflection system further includes means for applying a dynamic focusing electric potential to the objective lens assembly of the electron beam tube apparatus in conjunction with both the correction and deflection electric potentials described above. The dynamic focusing electric potential is VOBJ(DF) = VOBJ(0) + [(ADF(Vx2 + Vy2))/Vc](4) WHERE ADF is a constant and VOBJ(O) is the uncorrected value of the direct current objective lens supply voltage. Both deflection and correction electric potentials are developed by an eight-fold deflector voltage generator which includes as its heart a novel octupole-quadrupole generator.
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公开(公告)号：DE3023926A1
公开(公告)日：1982-01-14
申请号：DE3023926
申请日：1980-06-26
Applicant: LEYBOLD HERAEUS GMBH & CO KG
Inventor： WILMERS MARTIN DIPL PHYS DR RE
Abstract: The guide system is formed by electron or ion sources, electron, or ion-optical devices etc. It has metal tube for holding the individual components of the system. Electrodes (4) under voltage are supported in the metal tube (1) via rings (2,3) of electrically insulating material. The component materials are chosen so that their thermal expansion coefficients are increased from inside outwards. Pref. the components under voltage are of a tungsten- copper alloy. The voltage carrying electrodes may be of vitreous carbon. The rings may be of aluminium oxide ceramic material. A spiral spring (7) is typically provided for securing the axial position of the support rings and the electrodes. The use of the metal tube offers a simple design for erection of systems with close tolerances, of self-centering type and with heating facilities.
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公开(公告)号：CA1094210A
公开(公告)日：1981-01-20
申请号：CA250593
申请日：1976-04-15
Applicant: BUNKER RAMO
Inventor： BECHER JAMES V , SPAULDING TEDFORD H
IPC: G02B6/255 , G02B6/38 , G02B6/42 , H02G15/08 , H04B10/12 , H04B10/135 , H04B10/14 , H04B10/2581 , H01J3/38 , G02B5/14
Abstract: This invention relates to electrical connector parts for housing optoelectronic transducers and to optical connector parts for housing terminal portions of a fiber optic light guide. The prior art provides connectors of this type but they are either permanently connected or they require critical alignment each time the connector parts are assembled. The present invention overcomes this problem by providing an optoelectronic connector assembly comprising an electrical connector part having a front end portion, an optical connector part having a front end portion adapted to engage with the front end portion of said electrical connector part, an optoelectronic transducer, device for firmly supporting said transducer within said electrical connector part so that said transducer faces the front end of said electrical connector part, an optical fiber having material of light transmitting characteristics, and device for rigidly and firmly positioning a terminal end portion of said optical fiber within said optical connector part so that the end of said fiber faces the front end of said optical connector part, and wherein said latter device renders unnecessary any subsequent physical adjustment of said optical fiber with respect to said optical connector part.
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公开(公告)号：SU635535A1
公开(公告)日：1978-11-30
申请号：SU2514584
申请日：1977-07-26
Applicant: SEVERO ZAPAD ZAOCH POLT INST
Inventor： FEDOTOV ALEKSEJ IVANOVICH , REJFE EVGENIJ DAVIDOVICH , DENISENKOV ANATOLIJ IVANOVICH , GANZBURG LEONID BEJSAKHOVICH , GRUNIN PETR SHULIMOVICH
IPC: H01J3/38
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Patent Agency Ranking
公开(公告)号：EP3678161A1
公开(公告)日：2020-07-08
申请号：EP19207531.5
申请日：2010-10-12
Applicant: Perkinelmer Health Sciences Inc.
Inventor： Ferrara, Keith , Barkus, David , Patkin, Adam , Mannino, Rosario , Pentek, Daniel , Delorenzo, Frank , Rasmussen, Barton
Abstract: An assembly comprising:
a housing (606) comprising a first integral alignment feature; and
a source assembly comprising source components (608a, 608b. 608c, 609) and a terminal lens (610) configured to focus a beam, wherein the terminal lens comprises a second integral alignment feature, wherein the source assembly is constructed and arranged to couple to the housing when the first integral alignment feature is coupled to the second integral alignment feature to align the terminal lens with the source components in the housing and retain the source components in the housing, and wherein the first integral alignment feature engages the second integral alignment feature to retain the source assembly to the housing upon circumferential rotation of the terminal lens.-
37.发明申请METHOD AND APPARATUS FOR FABRICATION OF HIGH GRADIENT INSULATORS WITH PARALLEL SURFACE CONDUCTORS SPACED LESS THAN ONE MILLIMETER APART 审中-公开用于制造平面绝缘体的方法和装置，其间隔不超过一毫升APART
公开(公告)号：WO99027419A1
公开(公告)日：1999-06-03
申请号：PCT/US1998/024710
申请日：1998-11-20
CPC classification number: G03F7/70408 , G03F7/001 , G03F7/20 , H01J3/38
Abstract: Optical patterns and lithographic techniques are used as part of a process to embed parallel and evenly spaced conductors in the non-planar surfaces of an insulator to produce high gradient insulators. The approach extends the size that high gradient insulating structures can be fabricated as well as improves the performance of those insulators by reducing the scale of the alternating parallel lines of insulator and conductor along the surface. This fabrication approach also substantially decreases the cost required to produce high gradient insulators.
Abstract translation: 使用光学图案和光刻技术作为在绝缘体的非平坦表面中嵌入平行且均匀间隔的导体以产生高梯度绝缘体的工艺的一部分。 该方法延伸了可以制造高梯度绝缘结构的尺寸，并且通过减小沿表面的绝缘体和导体的交替平行线的尺度来提高那些绝缘体的性能。 这种制造方法也大大降低了生产高梯度绝缘体所需的成本。
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公开(公告)号：JP2019057385A
公开(公告)日：2019-04-11
申请号：JP2017180230
申请日：2017-09-20
Applicant: 日新イオン機器株式会社
Abstract: 【課題】イオン源支持台Xに載置したイオン源101を安定な状態で倒伏姿勢にできるようにする。 【解決手段】長尺状のプラズマ生成容器10及びプラズマ生成容器10における長手方向と直交する方向に対向する側壁11bに設けられた一対のローラ31を備えるイオン源101が載置されるイオン源支持台Xであって、イオン源101が吊り下げられた状態において、一対のローラ31が転動可能に載置される一対のレール5と、一対のレール5に一対のローラ31が載置された状態において、イオン源101をレール5の一端側Aから他端側Bに向かって引き込む引き込み機構6とを具備するようにした。 【選択図】図3
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