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公开(公告)号：US20250013142A1
公开(公告)日：2025-01-09
申请号：US18708573
申请日：2022-11-11
Applicant: ASML NETHERLANDS B.V.
Abstract: A method for forming a pellicle for use in a lithographic apparatus is disclosed. The method includes: providing a porous membrane formed from a first material; applying at least one layer of two-dimensional material to at least one side of the porous membrane; and applying a capping layer to the at least one layer of two-dimensional material on at least one side of the porous membrane such that the at least one layer of two-dimensional material is disposed between the or each capping layer and the porous membrane. The at least one layer of two-dimensional material may act to close the adjacent side of the porous membrane and to form a smoother and flatter exterior surface of the pellicle. Advantageously, this may allow the porous membrane to be protected from etching while reducing EUV flare, regardless of the material used for the capping layer.
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42.发明授权公开(公告)号：US12189308B2
公开(公告)日：2025-01-07
申请号：US18129169
申请日：2023-03-31
Applicant: ASML NETHERLANDS B.V.
Inventor： Richard Johannes Franciscus Van Haren , Leon Paul Van Dijk , Oktay Yildirim , Orion Jonathan Pierre Mouraille
Abstract: A method for determining a target feature in a model of a patterning process based on local electric fields estimated for the patterning process. The method includes obtaining a mask stack region of interest. The mask stack region of interest has one or more characteristics associated with propagation of electromagnetic waves through the mask stack region of interest. The mask stack region of interest includes the target feature. The method includes estimating a local electric field based on the one or more characteristics associated with the propagation of electromagnetic waves through the mask stack region of interest. The local electric field is estimated for a portion of the mask stack region of interest in proximity to the target feature. The method includes determining the target feature based on the estimated local electric field.
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公开(公告)号：US12189302B2
公开(公告)日：2025-01-07
申请号：US17738093
申请日：2022-05-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Wim Tjibbo Tel , Bart Peter Bert Segers , Everhardus Cornelis Mos , Emil Peter Schmitt-Weaver , Yichen Zhang , Petrus Gerardus Van Rhee , Xing Lan Liu , Maria Kilitziraki , Reiner Maria Jungblut , Hyunwoo Yu
IPC: G03F7/07 , G03F7/00 , G06F30/20 , G06N3/02 , G06F119/18 , G06F119/22
Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.
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公开(公告)号：US20250004362A1
公开(公告)日：2025-01-02
申请号：US18293851
申请日：2022-07-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Franciscus Theodorus AGRICOLA , Lourdes FERRE LLIN , Dennis DE GRAAF , Chaitanya Krishna ANDE , Inci DONMEZ NOYAN , Fai Tong SI , Ties Wouter VAN DER WOORD , Anne-Sophie ROLLIER , Maxime BIRON , Adrianus Johannes Maria GIESBERS
Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane includes metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.
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公开(公告)号：US20240427251A1
公开(公告)日：2024-12-26
申请号：US18704337
申请日：2022-10-24
Applicant: ASML Netherlands B.V.
Inventor： Douglas C. CAPPELLI
IPC: G03F7/00
Abstract: An inspection apparatus includes a radiation source, an optical system, and a detector. The radiation source generates a beam of radiation. The optical system directs the beam along an optical axis and toward a target so as to produce scattered radiation from the target. The optical system includes a beam displacer including four reflective surfaces having a spatial arrangement. The beam displacer receives the beam along the optical axis, performs reflections of the beam so as to displace the optical axis of the beam, rotates to shift the displaced optical axis, and preserves polarization of the beam such that a polarization state of the beam along the deflected optical axis is invariant to the rotating based on the spatial arrangement of the four reflective surfaces. The detector receives the scattered radiation to generate a measurement signal based on the received scattered radiation.
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Patent Agency Ranking
公开(公告)号：US20240427216A1
公开(公告)日：2024-12-26
申请号：US18699041
申请日：2022-09-30
Applicant: ASML NETHERLANDS B.V.
Abstract: A broadband radiation source device configured for generating broadband output radiation upon receiving substantially linearly polarized input radiation, the source device including: a hollow-core photonic crystal fiber; at least a first polarization element operable to impose a substantially circular or elliptical polarization on the input radiation prior to being received by the hollow-core photonic crystal fiber; and a second polarization element operable in combination with the first polarization element to impose a substantially elliptical polarization on the input radiation, wherein the second polarization element and the first polarization element are oriented such that the elliptical polarization compensates at least partially for birefringence of the hollow-core photonic crystal fiber.
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公开(公告)号：US20240419088A1
公开(公告)日：2024-12-19
申请号：US18719902
申请日：2022-11-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Akshay Dipakkumar HARLALKA , Muthukumaran LOGANATHAN , Eric Scott SLOAN , Bill CHANG , Santiago E. DEL PUERTO , Daniel Nathan BURBANK , Brandon Adam EVANS , Venkata Siva Chaithanya CHILLARA , Joseph George WIHBEY, III
IPC: G03F7/00
Abstract: Systems, methods, and computer programs for providing a force opposed to inertial forces present on a patterning device during imaging operations of a photolithographic system include a means for providing coarse positioning of a pusher in combination with a short-stroke actuator and pushing tip configured to engage an edge of the patterning device. In an embodiment, the coarse positioning is provided by providing a guide along which the short-stroke actuator may be translated, and a locking mechanism is configured to selectively hold the actuator in place relative to the patterning device. In an embodiment, the coarse positioning is provided by a long-stroke actuator, for example an eccentric linear drive actuator.
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公开(公告)号：US20240411230A1
公开(公告)日：2024-12-12
申请号：US18700780
申请日：2022-09-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Benjamin Cunnegonda Henricus SMEETS , Bram peter Johan LINSSEN , Willem Arie ROOS , Mark Johannes Hermanus FRENCKEN
IPC: G03F7/00
Abstract: A fluid extraction system for a lithographic apparatus, the fluid extraction system configured to extract fluid that a fluid handling system, including a fluid handling structure, is arranged to supply along a flow path that includes a gap between an edge of a substrate and an edge of a surrounding structure of the substrate; and a controller arranged to control the flow rate of the fluid in the flow path in dependence on one or more selected from: a property of the substrate, a property of the fluid handling system, a property of the fluid handling structure, a property of the fluid extraction system, and/or the separation between the fluid handling structure and the fluid extraction system.
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公开(公告)号：US12164125B2
公开(公告)日：2024-12-10
申请号：US17600420
申请日：2020-03-06
Applicant: ASML Netherlands B.V.
Inventor： Han-Kwang Nienhuys , Sietse Thijmen Van Der Post
IPC: G02B5/18
Abstract: A grating is provided on a mirror for specularly reflecting and diffracting a grazing-incidence beam of radiation and has a periodic structure with a grating period comprising first (ridge) and second (trench) substructures either side of a sidewall 806 facing the incident beam 800. The ridge is configured to specularly reflect the beam from the flat top 808 of the ridge into a specularly reflected beam 810 in a zeroth-order direction β′=β. The grating is configured with fixed or varying pitch to diffract the beam from the grating periods in one or more non-zero-diffraction-order direction β′≠β. The shape of the trench may be is described by structural parameters top width and depth that define the aspect ratio of the trench. The shape is determined such that any rays (and optionally diffraction) of the beam that reflect once from the trench floor in the zeroth-order direction are obscured by the sidewall.
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公开(公告)号：US20240402622A1
公开(公告)日：2024-12-05
申请号：US18699654
申请日：2022-10-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Petrus Martinus Bernardus VERMEULEN , Johannes Adrianus Leonardus DE GOEIJ , René Wilhelmus Antonius Hubertus LEENAARS , Bas JANSEN , Ron Geeraard Catharina DE BRUIJN
Abstract: A coupling having a variable stiffness is disclosed. The coupling includes: a deformable component and a support being movably arranged with respect to each other, wherein the deformable component includes a viscoelastic material, wherein the support has a recess configured to receive the deformable component, wherein the deformable component is configured to deform in volumetric deformation when, in use, a force is applied to the deformable component, and wherein a shape of the deformable component and a shape of the support are configured such that the variable stiffness gradually increases as a function of an amount of the force. A stage apparatus may have the coupling.
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