公开(公告)号：US20250004362A1

公开(公告)日：2025-01-02

申请号：US18293851

申请日：2022-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Franciscus Theodorus AGRICOLA ,  Lourdes FERRE LLIN ,  Dennis DE GRAAF ,  Chaitanya Krishna ANDE ,  Inci DONMEZ NOYAN ,  Fai Tong SI ,  Ties Wouter VAN DER WOORD ,  Anne-Sophie ROLLIER ,  Maxime BIRON ,  Adrianus Johannes Maria GIESBERS

IPC: G03F1/62 ,  G03F1/24

Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane includes metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.