VISION ENHANCEMENT SYSTEMS AND METHODS
    41.
    发明申请
    VISION ENHANCEMENT SYSTEMS AND METHODS 审中-公开
    视觉增强系统和方法

    公开(公告)号:WO2013159076A3

    公开(公告)日:2014-03-20

    申请号:PCT/US2013037497

    申请日:2013-04-19

    Inventor: ANELLO ROBERT D

    CPC classification number: A61B3/0025

    Abstract: Vision enhancement systems and methods facilitate determining or estimating an optical alignment of a lens in relation to the visual axis of an eye and applying the optical alignment to an action or process of providing, facilitating, and/or presenting one or more ophthalmic assessments.

    Abstract translation: 视觉增强系统和方法有助于确定或估计相对于眼睛的视轴的透镜的光学对准,并将光学对准应用于提供,促进和/或呈现一次或多次眼科评估的动作或过程。

    LIGHT-EMITTING DIODE
    42.
    发明申请
    LIGHT-EMITTING DIODE 审中-公开
    发光二极管

    公开(公告)号:WO2004095591B1

    公开(公告)日:2005-01-27

    申请号:PCT/JP2004005853

    申请日:2004-04-23

    CPC classification number: H01L33/025 H01S5/3018 H01S5/3027 H01S5/32341

    Abstract: A light-emitting diode with high luminous efficiency is disclosed which is free from deformation or defect of crystal caused by a dopant. The light-emitting diode emits no light of unnecessary wavelengths and has a wide selection of emission wavelengths. The light-emitting diode comprises a light-emitting layer composed of an ambipolar semiconductor containing no dopant, and an electron implanting electrode, namely an n electrode and a hole implanting electrode, namely a p electrode joined to the light-emitting layer.

    Abstract translation: 公开了一种发光效率高的发光二极管,其不受掺杂剂引起的晶体变形或缺陷的影响。 发光二极管不发出不必要的波长的光并具有广泛的发射波长选择。 发光二极管包括由不含掺杂剂的双极半导体构成的发光层和电子注入电极,即n电极和空穴注入电极,即连接到发光层的p电极。

    GLASS SUBSTRATE AND GLASS COMPOSITION FOR USE IN A LIQUID CRYSTAL PANEL
    43.
    发明申请
    GLASS SUBSTRATE AND GLASS COMPOSITION FOR USE IN A LIQUID CRYSTAL PANEL 审中-公开
    玻璃基板和玻璃组合物用于液晶面板

    公开(公告)号:WO0100538A2

    公开(公告)日:2001-01-04

    申请号:PCT/JP0004309

    申请日:2000-06-29

    Inventor: TACHIWANA KAZUO

    CPC classification number: C03C3/091

    Abstract: In liquid crystal panel glass suitable for a polysilicon TFT substrate, a strain point, specific gravity, and a Young's modulus are determined to obtain pertinent solubility, a light weight, and strength for the polysilicon TFT substrate. Specifically, the strain point is not lower than 680 DEG C while the specific gravity is not higher than 2.45, and the Young' modulus is not smaller than 7600GPa. The glass may include a combination of SiO2, B2O3, Al2O3, and MgO.

    Abstract translation: 在适用于多晶硅TFT基板的液晶面板玻璃中,确定应变点,比重和杨氏模量,以获得多晶硅TFT基板的相关溶解度,重量和强度。 具体来说,应变点不低于680℃,比重不高于2.45,杨氏模量不小于7600GPa。 玻璃可以包括SiO 2,B 2 O 3,Al 2 O 3和MgO的组合。

    HOLE DRILLING JIG FOR SPECTACLE LENS AND PRODUCTION JIG THEREFOR AND HOLE DRILLING METHOD FOR SPECTACLE LENS AND SPECTACLE LENS
    44.
    发明申请
    HOLE DRILLING JIG FOR SPECTACLE LENS AND PRODUCTION JIG THEREFOR AND HOLE DRILLING METHOD FOR SPECTACLE LENS AND SPECTACLE LENS 审中-公开
    孔眼钻孔钻头及其制造方法及孔眼钻孔方法用于镜面镜片和镜片镜片

    公开(公告)号:WO9937449A8

    公开(公告)日:1999-09-23

    申请号:PCT/JP9900271

    申请日:1999-01-25

    Inventor: WATANABE SHIGERU

    Abstract: A hole drilling jig for a spectacle lens used when a non-through hole extending toward the inside of the lens is drilled in the edge face of a spectacle lens and a production jig therefor and hole drilling method for a spectacle lens and a spectacle lens. The hole drilling jig comprises a jig body and a plurality of support members attached to the jig body, wherein a spectacle lens is inserted into the opening of the jig body to be held there by clamping and is supported by the support members. A bit of a drilling machine on which the hole drilling jig is set is applied to the edge face of the spectacle glass while being guided by a guide formed on the support members, whereby a non-through hole is made in the edge face.

    Abstract translation: 当在眼镜镜片的边缘面上钻出朝向镜片内侧延伸的非通孔时使用的眼镜镜孔用钻孔夹具及其制造用夹具及眼镜镜片和眼镜镜片的钻孔方法。 钻孔夹具包括夹具本体和附接到夹具本体的多个支撑构件,其中将眼镜镜片插入到夹具的开口中,以通过夹持保持在夹具上,并由支撑构件支撑。 钻孔机的一部分钻孔夹具被设置在眼镜玻璃的边缘面上,同时由形成在支撑构件上的引导件引导,从而在边缘面上形成非通孔。

    SUBSTRATE FOR MASK BLANK, MASK BLANK, METHODS FOR MANUFACTURING SUBSTRATE FOR MASK BLANK AND MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    45.
    发明申请
    SUBSTRATE FOR MASK BLANK, MASK BLANK, METHODS FOR MANUFACTURING SUBSTRATE FOR MASK BLANK AND MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
    用于掩模坯体的基底,掩模坯体,用于制造掩模坯体和掩模坯体的基底的方法,制造转移掩模的方法以及制造半导体装置的方法

    公开(公告)号:WO2016098452A8

    公开(公告)日:2017-04-20

    申请号:PCT/JP2015080088

    申请日:2015-10-26

    Applicant: HOYA CORP

    Abstract: The purpose of the present invention is to provide a substrate for a mask blank, a mask blank, and a transfer mask, facilitating the correction of a wavefront using a wavefront correction function in an exposure device. The purpose of the present invention also includes providing methods for manufacturing these products. A virtual plane profile is assumed to optically form in effect, a flat reference plane profile defined by the Zernike polynomials constituted by only terms with 2nd order or less of the variables in relation to a radius and including one or more terms with 2nd order of the variables in relation to a radius. A substrate for a mask blank is selected to have data (a PV value) of 25 nm or less, which is representing a difference between the maximum value and the minimum value of the difference waveform between a composite plane profile acquired by synthesizing each plane profile of two principal surfaces and the virtual plane profile.

    Abstract translation: 本发明的目的在于提供一种用于掩模坯体,掩模坯体和转印掩模的基板,便于利用曝光装置中的波前校正功能来校正波前。 本发明的目的还包括提供用于制造这些产品的方法。 假定虚拟平面轮廓实际上是光学形成的,由Zernike多项式定义的平坦基准平面轮廓由仅由具有与半径有关的变量的二阶或更少的项构成,并且包括一个或多个具有二阶 相对于半径的变量。 选择用于掩模基板的基板以具有25nm或更小的数据(PV值),该数据表示通过合成每个平面轮廓获得的合成平面轮廓之间的差异波形的最大值和最小值之间的差值 两个主要表面和虚拟平面轮廓。

    CROSS-TALK REDUCTION IN A BIDIRECTIONAL OPTOELECTRONIC DEVICE
    47.
    发明申请
    CROSS-TALK REDUCTION IN A BIDIRECTIONAL OPTOELECTRONIC DEVICE 审中-公开
    双向光电设备中的交叉减少

    公开(公告)号:WO2011163644A3

    公开(公告)日:2012-03-01

    申请号:PCT/US2011041919

    申请日:2011-06-25

    Applicant: HOYA CORP USA

    CPC classification number: H04B10/2503 G02B6/4246

    Abstract: A bidirectional optoelectronic device comprises a photodetector and a light source on a waveguide substrate, and a drive circuit for the light source. The waveguide substrate can include light collector(s) or trap(s) for redirecting and attenuating portions of optical signals propagating in waveguide layers on the substrate but not guided by a waveguide. A protective encapsulant can be applied that includes hollow dielectric microspheres to reduce electrical cross-talk, and that can further include an optical absorber to reduce optical cross-talk.

    Abstract translation: 双向光电子器件包括光电检测器和波导基板上的光源,以及用于光源的驱动电路。 波导基板可以包括用于重定向和衰减在基板上的波导层中传播但不由波导引导的光信号的部分的光收集器或陷波器。 可以应用保护性密封剂,其包括中空电介质微球体以减少电串扰,并且还可以包括减少光学串扰的光吸收剂。

    FIBER-COUPLED OPTOELECTRONIC DEVICE MOUNTED ON A CIRCUIT BOARD
    48.
    发明申请
    FIBER-COUPLED OPTOELECTRONIC DEVICE MOUNTED ON A CIRCUIT BOARD 审中-公开
    光纤耦合光电设备安装在电路板上

    公开(公告)号:WO2011038165A3

    公开(公告)日:2011-08-04

    申请号:PCT/US2010050082

    申请日:2010-09-23

    Applicant: HOYA CORP USA

    Inventor: BENZONI ALBERT M

    Abstract: An optical apparatus comprises: an optical fiber, an optoelectronic device on a substrate, a circuit board, and an electrical connection therebetween. A substrate groove positions the fiber for optical coupling with the device. The substrate is mounted on the circuit board; a proximal fiber segment is secured in the substrate groove; a distal fiber segment is secured to the circuit board. The circuit board includes vias providing electrical connections between contacts on its top and bottom surfaces. A method comprises: mounting on the circuit board the substrate and optoelectronic device; establishing the electrical connection; securing proximal and distal fiber segments to the substrate groove and circuit board, respectively. Multiple substrates can be secured to a single piece of circuit board material, which can be divided into individual circuit boards after establishing electrical connections and securing optical fibers to the corresponding substrates and circuit board material.

    Abstract translation: 光学装置包括:光纤,衬底上的光电器件,电路板以及它们之间的电连接。 基板槽定位用于与该装置的光耦合的光纤。 基板安装在电路板上; 近端纤维段固定在基底槽中; 远端纤维段固定到电路板上。 电路板包括在其顶表面和底表面上的触点之间提供电连接的通孔。 一种方法包括:在电路板上安装基板和光电子器件; 建立电气连接; 将近端和远端纤维段分别固定到衬底槽和电路板上。 多个基板可以固定到单片电路板材料上,其可以在建立电连接并将光纤固定到相应的基板和电路板材料之后被分成单独的电路板。

    REFLECTION TYPE MASK BLANK AND REFLECTION TYPE MASK AND PRODUCTION METHODS FOR THEM
    50.
    发明申请
    REFLECTION TYPE MASK BLANK AND REFLECTION TYPE MASK AND PRODUCTION METHODS FOR THEM 审中-公开
    反射型遮罩和反射型掩膜及其生产方法

    公开(公告)号:WO03085709A9

    公开(公告)日:2005-02-24

    申请号:PCT/JP0304615

    申请日:2003-04-11

    Abstract: A reflection type mask blank comprising a substrate (11), and, sequentially formed thereon, a reflection layer (12) for reflecting an exposure light in a short-wave region including an extreme ultraviolet region and an absorber layer (16) for absorbing an exposure light. The absorber layer (16) has a structure of at least two layers consisting of as a lower layer an exposure light absorbing layer (14) composed of an absorber of an exposure light in a short-wave region including an extreme ultraviolet region, and as an upper layer a low-reflectance layer (15) composed of an absorber of an inspection light used for mask pattern inspection. The upper layer consists of a material containing tantalum (Ta), boron (B) and nitrogen (N), B content being 5 at%-30 at%, a composition ratio between Ta and N (Ta:N) being 8:1 to 2:7. Alternatively, the reflection type mask blank may comprise a substrate, and, sequentially formed thereon, a multi-layer reflection film and an absorber layer, wherein the absorber layer consists of a material containing tantalum (Ta), boron (B) and nitrogen (N), B content being 5 at%-25 at%, a composition ratio between Ta and N (Ta:N) being 8:1 to 2:7.

    Abstract translation: 一种反射型掩模坯料,包括基板(11),并且依次形成有用于反射包括极紫外区域的短波区域中的曝光用光的反射层(12)和吸收层 曝光灯 吸收层(16)具有由下层组成的至少两层的结构,曝光光吸收层(14)由包括极紫外区域的短波区域中的曝光光的吸收体构成,并且 上层,由用于掩模图案检查的检查光的吸收体构成的低反射率层(15)。 上层由含钽(Ta),硼(B)和氮(N)的材料组成,B含量为5原子%-30原子%,Ta和N(Ta:N)的组成比为8:1 至2:7。 或者,反射型掩模坯料可以包括基底,并且依次形成多层反射膜和吸收层,其中吸收层由含有钽(Ta),硼(B)和氮( N),B含量为5原子%-25原子%,Ta与N(Ta:N)的组成比为8:1〜2:7。

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