Abstract:
Vision enhancement systems and methods facilitate determining or estimating an optical alignment of a lens in relation to the visual axis of an eye and applying the optical alignment to an action or process of providing, facilitating, and/or presenting one or more ophthalmic assessments.
Abstract:
A light-emitting diode with high luminous efficiency is disclosed which is free from deformation or defect of crystal caused by a dopant. The light-emitting diode emits no light of unnecessary wavelengths and has a wide selection of emission wavelengths. The light-emitting diode comprises a light-emitting layer composed of an ambipolar semiconductor containing no dopant, and an electron implanting electrode, namely an n electrode and a hole implanting electrode, namely a p electrode joined to the light-emitting layer.
Abstract:
In liquid crystal panel glass suitable for a polysilicon TFT substrate, a strain point, specific gravity, and a Young's modulus are determined to obtain pertinent solubility, a light weight, and strength for the polysilicon TFT substrate. Specifically, the strain point is not lower than 680 DEG C while the specific gravity is not higher than 2.45, and the Young' modulus is not smaller than 7600GPa. The glass may include a combination of SiO2, B2O3, Al2O3, and MgO.
Abstract translation:在适用于多晶硅TFT基板的液晶面板玻璃中,确定应变点,比重和杨氏模量,以获得多晶硅TFT基板的相关溶解度,重量和强度。 具体来说,应变点不低于680℃,比重不高于2.45,杨氏模量不小于7600GPa。 玻璃可以包括SiO 2,B 2 O 3,Al 2 O 3和MgO的组合。
Abstract:
A hole drilling jig for a spectacle lens used when a non-through hole extending toward the inside of the lens is drilled in the edge face of a spectacle lens and a production jig therefor and hole drilling method for a spectacle lens and a spectacle lens. The hole drilling jig comprises a jig body and a plurality of support members attached to the jig body, wherein a spectacle lens is inserted into the opening of the jig body to be held there by clamping and is supported by the support members. A bit of a drilling machine on which the hole drilling jig is set is applied to the edge face of the spectacle glass while being guided by a guide formed on the support members, whereby a non-through hole is made in the edge face.
Abstract:
The purpose of the present invention is to provide a substrate for a mask blank, a mask blank, and a transfer mask, facilitating the correction of a wavefront using a wavefront correction function in an exposure device. The purpose of the present invention also includes providing methods for manufacturing these products. A virtual plane profile is assumed to optically form in effect, a flat reference plane profile defined by the Zernike polynomials constituted by only terms with 2nd order or less of the variables in relation to a radius and including one or more terms with 2nd order of the variables in relation to a radius. A substrate for a mask blank is selected to have data (a PV value) of 25 nm or less, which is representing a difference between the maximum value and the minimum value of the difference waveform between a composite plane profile acquired by synthesizing each plane profile of two principal surfaces and the virtual plane profile.
Abstract:
A multi-channel or bidirectional optoelectronic device comprises a two or more optoelectronic components, e.g., a photodetector and a light source. A protective encapsulant can be applied to the optoelectronic device that includes hollow dielectric microspheres to reduce electrical cross-talk, and that can further include an optical absorber to reduce optical cross-talk.
Abstract:
A bidirectional optoelectronic device comprises a photodetector and a light source on a waveguide substrate, and a drive circuit for the light source. The waveguide substrate can include light collector(s) or trap(s) for redirecting and attenuating portions of optical signals propagating in waveguide layers on the substrate but not guided by a waveguide. A protective encapsulant can be applied that includes hollow dielectric microspheres to reduce electrical cross-talk, and that can further include an optical absorber to reduce optical cross-talk.
Abstract:
An optical apparatus comprises: an optical fiber, an optoelectronic device on a substrate, a circuit board, and an electrical connection therebetween. A substrate groove positions the fiber for optical coupling with the device. The substrate is mounted on the circuit board; a proximal fiber segment is secured in the substrate groove; a distal fiber segment is secured to the circuit board. The circuit board includes vias providing electrical connections between contacts on its top and bottom surfaces. A method comprises: mounting on the circuit board the substrate and optoelectronic device; establishing the electrical connection; securing proximal and distal fiber segments to the substrate groove and circuit board, respectively. Multiple substrates can be secured to a single piece of circuit board material, which can be divided into individual circuit boards after establishing electrical connections and securing optical fibers to the corresponding substrates and circuit board material.
Abstract:
An optical glass having a high refractive index and excellent suitability for precision press molding; and a preform for precision press molding and an optical element which comprise the glass. Provided are: a process for producing the optical element; a lens unit including the optical element; and an imaging device equipped with the lens unit.
Abstract:
A reflection type mask blank comprising a substrate (11), and, sequentially formed thereon, a reflection layer (12) for reflecting an exposure light in a short-wave region including an extreme ultraviolet region and an absorber layer (16) for absorbing an exposure light. The absorber layer (16) has a structure of at least two layers consisting of as a lower layer an exposure light absorbing layer (14) composed of an absorber of an exposure light in a short-wave region including an extreme ultraviolet region, and as an upper layer a low-reflectance layer (15) composed of an absorber of an inspection light used for mask pattern inspection. The upper layer consists of a material containing tantalum (Ta), boron (B) and nitrogen (N), B content being 5 at%-30 at%, a composition ratio between Ta and N (Ta:N) being 8:1 to 2:7. Alternatively, the reflection type mask blank may comprise a substrate, and, sequentially formed thereon, a multi-layer reflection film and an absorber layer, wherein the absorber layer consists of a material containing tantalum (Ta), boron (B) and nitrogen (N), B content being 5 at%-25 at%, a composition ratio between Ta and N (Ta:N) being 8:1 to 2:7.