公开(公告)号：KR1020080046577A

公开(公告)日：2008-05-27

申请号：KR1020070118895

申请日：2007-11-21

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가네꼬도모히로 ,  미야따아끼라

IPC: H01L21/027

CPC classification number: G03F7/7075 ,  H01L21/67225 ,  H01L21/67276 ,  Y10S414/135 ,  G03F7/38 ,  H01L21/67098 ,  H01L21/67253

Abstract: A coating/developing apparatus, a substrate transfer method, and a computer program are provided to make constant the time period for each wafer after a light exposure process. A coating/developing apparatus(2) which forms a resist film by applying a resist liquid onto a substrate(W), and develops the resist film after light exposure process is performed by a light exposure apparatus(3), the coating/developing apparatus comprises a process part(12), an interface part(13), a main transfer mechanism, an interface unit transfer mechanism, and a control part(20). The process part comprises a plurality of post-exposure baking units(PEB) each having a standby position and performing baking process on the substrate after the light exposure process and before development process. The interface part transfer mechanism comprises a first transfer mechanism(21) transferring the substrate after light exposure to the post-exposure baking units, and a second transfer mechanism(22) transferring and receiving the substrate to and from the light exposure apparatus. The interface part comprises a relay position(TRS) for placing the substrate transferred by the second transfer mechanism and allowing the first transfer mechanism to receive the substrate. The control part allows the substrate to wait on the standby position and relay position of so that a time period from an end of light exposure to a start of post-exposure baking can be constant among the substrates.

Abstract translation: 提供涂布/显影装置，基板转印方法和计算机程序以在曝光处理之后使每个晶片的时间段恒定。 涂布显影装置（2）通过在基板（W）上涂布抗蚀剂液体形成抗蚀剂膜，并且在曝光处理之后显影抗蚀剂膜，通过曝光装置（3），涂布/显影装置 包括处理部件（12），接口部件（13），主传送机构，接口单元传送机构和控制部件（20）。 处理部分包括多个后曝光烘焙单元（PEB），每个曝光后烘烤单元具有待机位置，并且在曝光处理之后和显影处理之前在基板上进行烘烤处理。 界面部分传送机构包括：曝光后曝光烘焙单元之后将基板传送的第一传送机构（21），以及将第二传送机构（22）从曝光装置传送和接收基板。 接口部分包括用于放置由第二传送机构传送的基板并允许第一传送机构接收基板的继电器位置（TRS）。 控制部件允许衬底等待待机位置和中继位置，使得从曝光结束到曝光后烘烤开始的时间段在衬底之间可以是恒定的。

公开(公告)号：KR1020070102949A

公开(公告)日：2007-10-22

申请号：KR1020070036835

申请日：2007-04-16

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가네꼬도모히로 ,  미야따아끼라

IPC: H01L21/027

CPC classification number: Y02P90/02 ,  H01L21/6715 ,  G03F7/70808 ,  H01L21/67017 ,  H01L21/6773

Abstract: A coating and developing apparatus, a control method thereof and a recording medium are provided not to change a recipe according to an entrance of a final lot by inhibiting an outrun of a substrate while taking the substrate in an inspection module. A coating and developing apparatus includes a cassette station(21), a process station(S1), an inspection station(40), and a controller. The cassette station includes a plurality of substrates and a delivering unit. The delivering unit delivers the substrates between cassettes(C). The process station includes a plurality of process modules and a first substrate carrier unit. The process modules perform processes for substrate such as applying photoresist and developing the substrate. The first substrate carrier carries the substrate along a circulation route by a predetermined cycle time. The inspection station includes a plurality of inspection modules and a second substrate carrier unit. The inspection modules inspect the processed substrate. The second substrate carrier unit delivers the substrate between the cassette station and the process station. The controller controls the second substrate carrier unit.

Abstract translation: 提供了一种涂布和显影装置，其控制方法和记录介质，以便在将基板保持在检查模块中的同时，通过抑制基板超出而不会根据最终批次的入口改变配方。 一种涂料和显影装置，包括一个盒站（21），一个处理站（S1），一个检查站（40）和一个控制器。 盒式电台包括多个基板和输送单元。 输送单元在盒（C）之间传送基板。 处理站包括多个处理模块和第一基板载体单元。 工艺模块执行诸如施加光致抗蚀剂和显影衬底的衬底的工艺。 第一衬底载体沿着循环路线承载基板预定的周期时间。 检查站包括多个检查模块和第二基板承载单元。 检查模块检查经处理的基板。 第二衬底载体单元将衬底输送到盒式电台和处理站之间。 控制器控制第二基板载体单元。