公开(公告)号：KR1020100105493A

公开(公告)日：2010-09-29

申请号：KR1020100024310

申请日：2010-03-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 야마와쿠준 ,  오이카와준지 ,  나카야마히로유키

IPC: H01L21/3065

CPC classification number: H01L21/67017

Abstract: PURPOSE: A substrate processing apparatus and an exhausting method are provided to prevent an exhaust flowing path from being clogged due to particles in an exhausted gas from a chamber by charging the particles and the inner wall of the exhaust flowing path. CONSTITUTION: Substrates are contained in a processing container(50). An exhaust flowing path(51) exhausts a exhausted gas from the inside of the processing chamber. One or a plurality of exhaust pumps(52) is arranged on the exhausting flowing path. A unit for removing harmless(53) traps harmful components from the exhausted gas. An ionizing gas supplying unit(55) supplies an ionizing gas for charging particles in the exhausted gas.

Abstract translation: 目的：提供一种基板处理装置和排气方法，以通过对颗粒和排气流动路径的内壁进行充填来防止排气流动路径由于来自室的排出气体中的颗粒而堵塞。 构成：底物包含在处理容器（50）中。 排气流路51从处理室的内部排出排出的气体。 在排气流路上布置有一个或多个排气泵（52）。 用于消除无害（53）的单元从排气中捕获有害成分。 电离气体供给单元（55）为排出气体中的粒子供给电离气体。