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公开(公告)号：KR101781553B1
公开(公告)日：2017-09-26
申请号：KR1020110083582
申请日：2011-08-22
Applicant: 삼성전자주식회사
Inventor： 김재흥
CPC classification number: B81B3/0021 , B81B2201/038 , B81B2203/0127 , B81B2203/053
Abstract: 용량성트랜스듀서와그 제조및 동작방법에관해개시되어있다. 본발명의일실시예에의한트랜스듀서는제1 도핑영역, 상기제1 도핑영역과반대되는도핑영역이고, 진동부분을포함하는제2 도핑영역및 상기제1 도핑영역과상기진동부분사이에존재하는빈 공간을포함한다. 상기제1 및제2 도핑영역은단일체이다. 상기진동부분은복수의관통홀을포함하고, 상기진동부분상에상기관통홀을밀봉하는물질막이구비된다.
Abstract translation: 公开了一种电容式换能器及其制造和操作方法。 根据本发明的一个实施例换能器是所述第一掺杂区域，所述第二掺杂区域和所述第一掺杂区和掺杂包括区域相对的一个振动部之间存在于所述第一掺杂区域，所述振动部 它包含一个空格。 第一和第二掺杂区是单片的。 振动部分包括多个通孔，并且设置有密封振动部分上的通孔的材料膜。
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公开(公告)号：KR101715878B1
公开(公告)日：2017-03-14
申请号：KR1020090073359
申请日：2009-08-10
Applicant: 삼성전자주식회사
Abstract: 광차폐장치및 그제조방법을개시한다. 광차폐장치는기판, 투명전극, 복수개의롤업액츄에이터, 및광 차폐패턴을포함한다. 기판은광이통과하는투광부를구비하며, 이러한기판의일면에는투명전극이형성되어있다. 불투광특성을가지며투광부의바깥쪽에고정되어있는복수개의롤업액츄에이터각각은고정단과이 고정단에연장형성된가동부로구성된다. 그리고서로인접한롤업액츄에이터사이에는간극이형성되어있는데, 이간극에대응하는위치의기판상에는광 차폐패턴이형성되어있다. 광차폐패턴은간극을통해서들어오는빛이투광부를통과하지못하도록차단한다.
Abstract translation: 目的：提供一种用于屏蔽光的装置及其制造方法，以将卷起致动器的驱动部分的全部或一部分分成多个间隙，从而在操作遮光时能够快速进行快门操作。 构成：在具有发光单元的基板的单面上形成透明电极（120）。 卷起致动器（130）固定在透明单元的外侧，并且形成在基板上，以通过分开来覆盖透明单元的表面。 在透明电极上形成与对应于相邻的卷起致动器之间的间隙的位置的间隙数相同的光屏图案（140）。 遮光图案的宽度与间隙的宽度相同或更大。
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公开(公告)号：KR101557485B1
公开(公告)日：2015-10-06
申请号：KR1020080124735
申请日：2008-12-09
Applicant: 삼성전자주식회사
Inventor： 김재흥
IPC: G02B26/02 , G02B26/08 , G02B27/22 , G02F1/1335
Abstract: 표시장치나광학스위칭분야등에적용될수 있는마이크로셔터디바이스및 그제조방법을개시한다. 투명한기판이구비된다. 격벽은기판상에형성되어단위픽셀을구획한다. 패턴층은단위픽셀내에서기판상에투명한제1 무늬부를갖게불투명한재질로패턴형성된다. 가동판은패턴층과마주하게배치되는것으로, 제1 무늬부와대응되게제2 무늬부가불투명하게형성되며, 제2 무늬부를제외한부위가광을투과할수 있게형성된다. 액추에이터는가동판을이동시키기위한것이다. 따라서, 회절등에의한누광을없애어명암비를높일수 있고, 광효율이향상될수 있다.
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公开(公告)号：KR101378418B1
公开(公告)日：2014-03-27
申请号：KR1020070111185
申请日：2007-11-01
Applicant: 삼성전자주식회사
IPC: H01L27/146
CPC classification number: H04N5/335 , H01L24/97 , H01L27/14618 , H01L27/14683 , H01L2224/16 , H01L2924/15788 , H01L2924/3511 , H04N5/2253 , H04N5/2257 , H04N5/3696 , H01L2924/00
Abstract: 오목면에 밀착 고정된 센서칩을 구비한 이미지센서 모듈 및 그 제조방법이 개시된다. 개시된 이미지센서 모듈은, 적어도 하나의 센서칩; 기판, 및 기판위에 형성되고, 상부에 센서칩을 만곡시켜 접합하는 오목면을 폴리머 성형법에 의해 형성한 폴리머층을 구비하는 적어도 하나의 센서칩 마운팅 구조물; 및 센서칩 위에서 센서칩 마운팅 구조물에 고정된 적어도 하나의 렌즈를 포함하는 것을 특징으로 한다.
이미지센서, 오목면, 센서, 고정-
公开(公告)号：KR101309795B1
公开(公告)日：2013-09-23
申请号：KR1020070103546
申请日：2007-10-15
Applicant: 삼성전자주식회사
CPC classification number: G02B7/08
Abstract: 가변 초점 광학 장치가 개시된다. 본 가변 초점 광학 장치는 광학 렌즈, 전압 인가 시에 서로 반대 방향으로 굽힘 변형하는 두 영역을 구비하며, 광학 렌즈와 연결된 액추에이터부 및, 전압이 인가되면 굽힘 변형에 의해 광학 렌즈의 초점이 변동되도록 액추에이터부를 지지하는 지지부를 포함한다. 이에 따라, 가변 초점 광학 렌즈의 구동 변위를 최대화할 수 있다.
바이몰프, 폴리머, 액추에이터, 가변 초점 광학 장치-
Patent Agency Ranking
公开(公告)号：KR1020130009140A
公开(公告)日：2013-01-23
申请号：KR1020110070033
申请日：2011-07-14
Applicant: 삼성전자주식회사
CPC classification number: G02B5/005 , G02B26/02 , G03B9/02 , G03B9/08 , G03B15/14 , H04N5/2254 , G02F1/17 , G03B9/00 , H04N5/225
Abstract: PURPOSE: A light transmission control device, an image device with the same, and a manufacturing method thereof are provided to utilize an elastomer in which a light transmission surface is changed, thereby obtaining the light transmission control device of a small volume. CONSTITUTION: A light transmission control device(100) comprises a first electrode(110), a second electrode(120), and a first elastomer layer(130). The second electrode is space from the first electrode. The first elastomer layer is arranged in between the first and second electrodes and has light transmission properties varying a light transmission surface according to applied voltage. The light transmission surface of the first elastomer layer becomes wide as the applied voltage is large.
Abstract translation: 目的：提供一种光传输控制装置，具有该光传输控制装置的图像装置及其制造方法，以利用其中透光表面改变的弹性体，从而获得小体积的光传输控制装置。 构成：光传输控制装置（100）包括第一电极（110），第二电极（120）和第一弹性体层（130）。 第二电极是距第一电极的空间。 第一弹性体层布置在第一和第二电极之间，并具有根据施加的电压改变透光表面的透光性。 随着施加的电压大，第一弹性体层的透光面变宽。
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公开(公告)号：KR1020110081700A
公开(公告)日：2011-07-14
申请号：KR1020100001988
申请日：2010-01-08
Applicant: 삼성전자주식회사
Abstract: PURPOSE: An optical shutter for a photographing apparatus and a manufacturing method thereof are provided to ensure uniform physical and mechanical property over the operating temperature range of a photographing apparatus. CONSTITUTION: An optical shutter for a photographing apparatus comprises a substrate(110), a transparent electrode, a light-transmissive insulating layer, and a roll up blade(150). The substrate has a light-transmissive region. The transparent electrode is formed in the top of the substrate. The light-transmissive insulating layer is formed on the transparent electrode. The roll up blade is a thin film that is formed of a single light-shielding conductive material on the upper side of the insulating layer One end of the roll up blade is fixed outside the light-transmissive region so that the roll up blade covers up the light-transmissive region.
Abstract translation: 目的：提供一种用于摄影设备的光学快门及其制造方法，以确保在拍摄设备的工作温度范围内物理和机械特性均匀。 构成：摄影装置用的光学快门包括基板（110），透明电极，透光绝缘层和卷起刀片（150）。 基板具有透光区域。 透明电极形成在基板的顶部。 透明绝缘层形成在透明电极上。 上卷叶片是在绝缘层的上侧由单个遮光导电材料形成的薄膜。卷起叶片的一端固定在透光区域的外侧，使得卷起叶片覆盖 透光区域。
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公开(公告)号：KR1020100122833A
公开(公告)日：2010-11-23
申请号：KR1020090073359
申请日：2009-08-10
Applicant: 삼성전자주식회사
CPC classification number: G03B9/28 , G03B9/60 , G03B11/00 , H04N5/2254
Abstract: PURPOSE: A device for shielding the light and a method for manufacturing the same are provided to divide the whole or one part of the driving part of the roll up actuator into a plurality of gap, thereby enabling fast shuttering operation when operating the light shielding. CONSTITUTION: A transparent electrode(120) is formed on single-side of a substrate having a light-transmitting unit. A roll-up actuators(130) is fixed to the external side of the transparent unit and is formed on the substrate to cover the surface of the transparent unit by dividing it. A light screen pattern(140) is formed on the transparent electrode as much as the gap number to the location corresponding to the gap between neighboring roll-up actuator. The width of the light shielding pattern is the same or bigger than the width of the gap.
Abstract translation: 目的：提供一种用于屏蔽光的装置及其制造方法，以将卷起致动器的驱动部分的全部或一部分分成多个间隙，从而在操作遮光时能够快速进行快门操作。 构成：在具有发光单元的基板的单面上形成透明电极（120）。 卷起致动器（130）固定在透明单元的外侧，并且形成在基板上，以通过分开来覆盖透明单元的表面。 在透明电极上形成与对应于相邻的卷起致动器之间的间隙的位置的间隙数相同的光屏图案（140）。 遮光图案的宽度与间隙的宽度相同或更大。
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公开(公告)号：KR1020100066086A
公开(公告)日：2010-06-17
申请号：KR1020080124735
申请日：2008-12-09
Applicant: 삼성전자주식회사
Inventor： 김재흥
IPC: G02B26/02 , G02B26/08 , G02B27/22 , G02F1/1335
CPC classification number: G02B26/02 , G02B6/353 , G02B26/08 , G02B26/0833 , G02B27/22 , G02F1/1335
Abstract: PURPOSE: A micro shutter device and a manufacturing method thereof are provided to prevent a leakage caused by diffraction by arranging a pattern layer patterned with opaque material so that it corresponds to a moving plate. CONSTITUTION: A partition(120) divides a unit pixel, formed on a substrate. A pattern layer(130) is patterned with opaque material in order to have a transparent first pattern unit on the substrate within the unit pixel. A moving plate is arranged so that it faces the pattern layer. A second pattern unit is formed to be opaque in order for the moving plate(140) to correspond to the first pattern unit. The moving plate, except for the area of the second pattern unit, penetrates light. An actuator(150) moves the movable plate.
Abstract translation: 目的：提供一种微快门装置及其制造方法，以通过布置图案化不透明材料的图案层以防止衍射造成的泄漏，使其对应于移动板。 构成：隔板（120）划分形成在基板上的单位像素。 图案层（130）用不透明材料构图，以便在单位像素内的衬底上具有透明的第一图案单元。 移动板被布置成使其面向图案层。 第二图案单元形成为不透明的，以使移动板（140）对应于第一图案单元。 除了第二图案单元的区域之外，移动板穿透光。 致动器（150）移动可动板。
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公开(公告)号：KR1020100023536A
公开(公告)日：2010-03-04
申请号：KR1020080082363
申请日：2008-08-22
Applicant: 삼성전자주식회사
IPC: H01L21/28 , H01L21/3065
CPC classification number: H01L21/76802 , H01L21/31116 , H01L21/31144
Abstract: PURPOSE: A manufacturing method of a semiconductor device is provided to reduce a notching due to an ion exchange process and an aspect ratio reduction by operating a step etching using a plurality of etching mask which has different size and selectivity ratio in the dry etching process of silicon. CONSTITUTION: An insulating layer(200) and a silicon layer(300) are formed on a wafer(100). A first and a second etching masks(410,420) which has different size opening each other are formed by being overlapped on the silicon layer. The silicon layer is etched to a predetermined depth at first by using the second etching mask. The second etching mask is removed. A through hole(310) is formed in order to pass through the silicon layer by using the first etching mask.
Abstract translation: 目的：提供一种半导体器件的制造方法，以通过使用在干法蚀刻工艺中具有不同尺寸和选择比的多个蚀刻掩模进行步骤蚀刻来减少由于离子交换过程引起的切口和宽高比减小 硅。 构成：在晶片（100）上形成绝缘层（200）和硅层（300）。 通过重叠在硅层上形成具有彼此开口的不同尺寸的第一和第二蚀刻掩模（410,420）。 首先通过使用第二蚀刻掩模将硅层蚀刻到预定深度。 去除第二蚀刻掩模。 形成通孔（310），以便通过使用第一蚀刻掩模穿过硅层。
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