저저항 금속패턴 형성 방법
    41.
    发明公开
    저저항 금속패턴 형성 방법 有权
    制备具有低电阻率的金属图案的方法

    公开(公告)号:KR1020050061285A

    公开(公告)日:2005-06-22

    申请号:KR1020040088804

    申请日:2004-11-03

    Abstract: 본 발명은 저저항 금속패턴 형성 방법에 관한 것으로, 보다 상세하게(ⅰ) 광촉매 화합물을 기판에 코팅하여 광촉매 필름을 형성하는 단계; (ⅱ) 상기 광촉매 필름 상에 수용성 고분자 화합물을 코팅하여 수용성 고분자 층을 형성하는 단계; (ⅲ) 상기 광촉매 필름 및 수용성 고분자 층을 선택적으로 노광하여 결정성장용 핵의 잠재적 패턴을 수득하는 단계; 및 (ⅳ) 상기 결정성장용 핵의 잠재적 패턴을 도금처리하여 금속결정을 성장시켜 금속패턴을 수득하는 단계를 포함하는 금속패턴 형성방법에 관한 것이다. 본 발명에 따른 방법에 의할 경우, 저저항 금속을 포함한 다층 배선 패턴을 비교적 간단한 공정을 통해 형성할 수 있고, 각 층을 구성하는 금속도 필요에 따라 자유롭게 택할 수 있으며, 제조 단가도 저렴하여 LCD, PDP, EL과 같은 평판 표시 소자에 쉽게 적용할 수 있다.

    신규 실록산계 수지 및 이를 이용한 반도체 층간 절연막
    42.
    发明公开
    신규 실록산계 수지 및 이를 이용한 반도체 층간 절연막 无效
    由特定单体的水解和凝结制备的新型基于硅氧烷的树脂,以及形成的层间绝缘膜

    公开(公告)号:KR1020050024721A

    公开(公告)日:2005-03-11

    申请号:KR1020030060811

    申请日:2003-09-01

    Abstract: PURPOSE: Provided are a siloxane-based resin with superior solubility in an organic solvent and good fluidity, and an interlayer insulating film formed therefrom having excellent mechanical physical properties. CONSTITUTION: The siloxane-based resin is prepared by hydrolysis and condensation of a monomer represented by the formula 1 and a monomer selected from the group consisting of compounds represented by the formula 2 to 6 in the presence of an organic solvent using an acid or a basic catalyst, and water. In the formula 1-6, R, R1 and R2 are independently a hydrogen atom, a C1-C3 alkyl group, a C6-C10 cycloalkyl group, or a C6-C15 aryl group, X1-X6 are independently a halogen atom or a C1-C5 alkoxy group, m is an integer of 1-5, n and s is an integer of 1-3, p and q are each an integer of 0-1, r is an integer of 0-10, and t is an integer of 3-8. The interlayer insulating film is formed by dissolving such siloxane-based resin in an organic solvent and coating the solution onto a silicone substrate, followed by heat-curing.

    Abstract translation: 目的:提供在有机溶剂中具有优异溶解性和良好流动性的硅氧烷类树脂,以及由其形成的层间绝缘膜具有优异的机械物理性能。 构成:硅氧烷类树脂通过在有机溶剂的存在下使用酸或其盐的水解和缩合由式1表示的单体和选自由式2至6表示的化合物的单体制备 碱性催化剂和水。 在式1-6中,R 1,R 2和R 2独立地为氢原子,C 1 -C 3烷基,C 6 -C 10环烷基或C 6 -C 15芳基,X 1 -X 6独立地为卤素原子或 C1-C5烷氧基,m为1-5的整数,n和s为1-3的整数,p和q各自为0-1的整数,r为0-10的整数,t为 一个3-8的整数。 层间绝缘膜通过将这种硅氧烷类树脂溶解在有机溶剂中并将溶液涂布在硅树脂基材上,然后进行热固化而形成。

    실록산계 수지 및 이를 이용한 반도체 층간 절연막
    43.
    发明公开
    실록산계 수지 및 이를 이용한 반도체 층간 절연막 有权
    具有优异机械性能的硅氧烷树脂和使用其的半导体的中间层电介质膜

    公开(公告)号:KR1020040103659A

    公开(公告)日:2004-12-09

    申请号:KR1020030035276

    申请日:2003-06-02

    Abstract: PURPOSE: Provided is a siloxane resin, which has excellent physical properties and a low dielectric constant, and is useful for an interlayer dielectric film for semiconductors having excellent physical properties, thermal stability and cracking resistance. CONSTITUTION: The siloxane resin is obtained by carrying out hydrolysis and condensation of a monomer represented by the following formula 1 and a monomer represented by the following formula 2 by using an acid or base catalyst in the presence of an organic solvent. In formula 1, R1 is H, a C1-C3 alkyl or C6-C15 aryl; each of X1, X2 and X3 independently represents a C1-C3 alkyl, C1-C10 alkoxy or a halogen atom, at least one of X1, X2 and X3 being a hydrolyzable functional group; m is an integer of 0-10; and p is an integer of 3-8. In formula 2, each R2 independently represents H, a C1-C3 alkyl or C6-C15 aryl; X4 is a C1-C10 alkoxy; Y is a C1-C3 alkyl or C1-C10 alkoxy; and n is an integer of 1-10.

    Abstract translation: 目的:提供具有优异的物理性能和低介电常数的硅氧烷树脂,并且可用于具有优异的物理性能,热稳定性和抗开裂性的半导体层间绝缘膜。 构成:通过在有机溶剂的存在下使用酸或碱催化剂进行水解和缩合由下式1表示的单体和由下式2表示的单体而获得的硅氧烷树脂。 在式1中,R 1是H,C 1 -C 3烷基或C 6 -C 15芳基; X 1,X 2和X 3各自独立地表示C 1 -C 3烷基,C 1 -C 10烷氧基或卤素原子,X 1,X 2和X 3中的至少一个为可水解官能团; m为0-10的整数; p为3-8的整数。 在式2中,每个R 2独立地表示H,C 1 -C 3烷基或C 6 -C 15芳基; X4是C1-C10烷氧基; Y是C1-C3烷基或C1-C10烷氧基; n为1-10的整数。

    컨쥬게이티드 고분자 패턴 형성용 조성물 및 이를 이용한패턴형성방법
    45.
    发明公开
    컨쥬게이티드 고분자 패턴 형성용 조성물 및 이를 이용한패턴형성방법 有权
    形成结合聚合物图案的组合物及其形成方法

    公开(公告)号:KR1020040051488A

    公开(公告)日:2004-06-18

    申请号:KR1020030068741

    申请日:2003-10-02

    Inventor: 이상균 송기용

    Abstract: PURPOSE: A composition for the formation of a conjugated polymer pattern and a method for forming a conjugated polymer pattern by using the composition are provided, to allow a conjugated polymer to be patterned effectively and simply. CONSTITUTION: The composition comprises a precursor polymer represented by the formula 1; and a photobase generator, wherein R is an aromatic monocyclic hydrocarbon group, a aromatic polycyclic hydrocarbon group, an acyclic unsaturated hydrocarbon group, or a monocyclic unsaturated hydrocarbon group having at least one hetero atom; and X is Br, Cl or I. Preferably the photobase generator is represented by the formula 2, wherein R1 is H, an alkyl or alkoxy group of C1-C10, a halogen atom, or an alkyl or alkoxy group having at least Si; R2 is a nitro group substituted at one or both ortho position; R3 is a phenyl group, a naphthalenyl group, a linear or cyclic alkyl group of C1-C10, a halogen atom, or an alkyl group of C1-C10 having N, O or S; and i is 1 or 2.

    Abstract translation: 目的:提供用于形成共轭聚合物图案的组合物和通过使用该组合物形成共轭聚合物图案的方法,以使得共轭聚合物能够有效且简单地被图案化。 构成:组合物包含由式1表示的前体聚合物; 和光源产生剂,其中R是具有至少一个杂原子的芳族单环烃基,芳族多环烃基,无环不饱和烃基或单环不饱和烃基; X是Br,Cl或I.优选地,光碱产生剂由式2表示,其中R1是H,C1-C10的烷基或烷氧基,卤素原子或具有至少Si的烷基或烷氧基; R2是在一个或两个邻位取代的硝基; R3是苯基,萘基,C1-C10的直链或环状烷基,卤素原子或具有N,O或S的C1-C10的烷基; 我是1或2。

    히드록시 그룹을 구비하는 불소치환 알킬 노르보넨카르복실산 에스테르 모노머를 포함하는 감광성 폴리머 및이를 포함하는 레지스트 조성물
    46.
    发明公开
    히드록시 그룹을 구비하는 불소치환 알킬 노르보넨카르복실산 에스테르 모노머를 포함하는 감광성 폴리머 및이를 포함하는 레지스트 조성물 无效
    包含具有羟基的氟取代的烷基异丁酸羧酸酯单体的含有聚合物的感光性聚合物和包含该羟基的耐酸性组合物

    公开(公告)号:KR1020030057948A

    公开(公告)日:2003-07-07

    申请号:KR1020010088064

    申请日:2001-12-29

    Abstract: PURPOSE: Provided are a photosensitive polymer having improved resist properties necessary to form a submicron pattern size, and a resist composition comprising the same. CONSTITUTION: The photosensitive polymer has monomers represented by formula 3. Particularly, the photosensitive polymer has a structure represented by formula 4(wherein R1 is hydrogen or C1-C20 hydrocarbon group, n is a value of 1-7, m/(m+n) is 0,1-0.6), and has a weight average molecular weight of 3,000-50,000. The resist composition comprises (a) the photosensitive polymer, and (b) 1-15 wt% photoacid generator(based on weight of the photosensitive polymer). The composition further comprises 0.01-2 wt% of organic base(based on weight of the photosensitive polymer).

    Abstract translation: 目的:提供具有改进的形成亚微米图案尺寸所需的抗蚀剂性能的光敏聚合物和包含其的抗蚀剂组合物。 光敏性聚合物具有由式3表示的单体。特别地,光敏性聚合物具有由式4表示的结构(其中R 1为氢或C 1 -C 20烃基,n为1-7,m /(m + n)为0,1-0.6),重均分子量为3,000〜5000。 抗蚀剂组合物包含(a)光敏聚合物和(b)1-15重量%的光酸产生剂(基于光敏聚合物的重量)。 组合物还包含0.01-2重量%的有机碱(基于光敏聚合物的重量)。

    플렉서블 전기변색 소자 및 그 제조방법
    47.
    发明授权
    플렉서블 전기변색 소자 및 그 제조방법 失效
    柔性电镀装置及其制造方法

    公开(公告)号:KR101109253B1

    公开(公告)日:2012-01-30

    申请号:KR1020050133664

    申请日:2005-12-29

    CPC classification number: G02F1/155 G02F1/1533

    Abstract: 본 발명은 플렉서블 전기변색 소자 및 그 제조방법에 관한 것으로, 더욱 상세하게는 감광성 절연막을 프린팅하여 절연층을 형성하고, 전기영동을 이용하여 소정의 패턴으로 정착된 반도체층을 가압하여 압축함으로써 표시소자의 콘트라스트 및 구동특성이 향상된 플렉서블 전기변색 소자 및 그 제조방법에 관한 것이다.
    전기변색 소자, 감광성 절연막, 프린팅, 절연층, 전기영동, 가압, 반도체층

    무전해 구리 도금액, 그의 제조방법 및 무전해 구리도금방법
    48.
    发明公开
    무전해 구리 도금액, 그의 제조방법 및 무전해 구리도금방법 无效
    无光镀铜解决方案,其生产工艺和无镀铜方法

    公开(公告)号:KR1020080083790A

    公开(公告)日:2008-09-19

    申请号:KR1020070024433

    申请日:2007-03-13

    Inventor: 송기용 조성헌

    CPC classification number: C09D1/00 C23C18/40

    Abstract: An electroless copper plating solution is provided to form a copper plating film having excellent adhesive force and low electrical resistance, a method for preparing the electroless copper plating solution is provided, and an electroless copper plating method is provided to form an electroless copper plating film having stable and improved adhesive force and low electrical resistance by using the electroless copper plating solution. An electroless copper plating solution comprises a copper salt, a complex agent, a reducing agent, and a pH adjusting agent, wherein the plating solution comprises an acid solution of 2,2'-dipyridyl and has a pH range of 11.5 to 13.0. The electroless copper plating solution has mole ratios of the complex agent and the reducing agent to the copper salt of 1:3 and 1:4 respectively. The plating solution comprises 0.01 to 0.05 mole/L of a copper salt, 0.03 to 0.15 mole/L of a complex agent, 0.04 to 0.20 mole/L of a reducing agent, 0.1 to 0.2 mole/L of a pH adjusting agent, and 0.1 to 0.5 mmol/L of an acid solution of 2,2'-dipyridyl. A method for preparing an electroless copper plating solution comprises the steps of: sequentially dissolving a copper salt, a complex agent, and a reducing agent into water to prepare a plating solution; adjusting a pH(potential of hydrogen) of the plating solution to a range of 11.5 to 13.0 using a pH adjusting agent; dissolving 2,2'-dipyridyl into a mixed solution of water and an acid to prepare an acid solution of 2,2'-dipyridyl; and mixing the acid solution of 2,2'-dipyridyl with the pH-adjusted plating solution.

    Abstract translation: 提供一种化学镀铜溶液以形成具有优异的粘合力和低电阻的铜电镀膜,提供了一种制备无电镀铜溶液的方法,并提供了化学镀铜方法以形成化学镀铜膜,其具有 通过使用无电解铜电镀液,稳定且改善的粘合力和低电阻。 无电镀铜溶液包括铜盐,络合剂,还原剂和pH调节剂,其中电镀溶液包含2,2'-联吡啶的酸溶液,pH范围为11.5至13.0。 化学镀铜溶液的复合剂和还原剂与铜盐的摩尔比分别为1:3和1:4。 电镀液含有0.01〜0.05摩尔/ L的铜盐,0.03〜0.15摩尔/升的络合剂,0.04〜0.20摩尔/升的还原剂,0.1〜0.2摩尔/升的pH调节剂,以及 0.1至0.5mmol / L的2,2'-联吡啶的酸溶液。 一种无电镀铜溶液的制备方法,包括以下步骤:将铜盐,络合剂和还原剂依次溶解在水中,制备电镀溶液; 使用pH调节剂将电镀液的pH(电位)调节至11.5〜13.0的范围; 将2,2'-联吡啶溶于水和酸的混合溶液中,制备2,2'-联吡啶的酸溶液; 并将2,2'-联吡啶的酸溶液与pH调节的电镀溶液混合。

    투명전극 및 그의 제조방법
    49.
    发明公开
    투명전극 및 그의 제조방법 有权
    透明电极及其透射方法

    公开(公告)号:KR1020070080330A

    公开(公告)日:2007-08-10

    申请号:KR1020060011545

    申请日:2006-02-07

    Abstract: A transparent electrode is provided to simply fabricate a transparent electrode with high penetration and low resistance by performing a plating process instead of a sputtering process necessitating expensive vacuum equipment. A grid electrode(20) is formed on a transparent substrate(10). A nano metal layer(30) is formed on the grid electrode. A conductive high polymer layer(40) is formed on the grid electrode and the nano metal layer. The substrate can be a transparent inorganic substrate like glass or quartz or a transparent plastic substrate selected from a group composed of PET(polyethylene terephthalate), PEN(polyethylene naphathalate), PES(polyethylene sulfone), polycarbonate, polystyrene, polyester, acrylic resin, olefin maleic copolymer and norbornene-based resin.

    Abstract translation: 提供透明电极以通过执行电镀工艺而不是需要昂贵的真空设备的溅射工艺简单地制造具有高穿透性和低电阻的透明电极。 在透明基板(10)上形成栅电极(20)。 在栅电极上形成纳米金属层(30)。 在栅电极和纳米金属层上形成导电高分子层(40)。 基材可以是玻璃或石英的透明无机基材或选自PET(聚对苯二甲酸乙二醇酯),PEN(聚萘二甲酸乙二醇酯),PES(聚乙烯砜),聚碳酸酯,聚苯乙烯,聚酯,丙烯酸树脂, 烯烃马来酸共聚物和降冰片烯类树脂。

    플렉서블 전기변색 소자 및 그 제조방법
    50.
    发明公开
    플렉서블 전기변색 소자 및 그 제조방법 失效
    柔性电致变色器件及其制造方法

    公开(公告)号:KR1020070070792A

    公开(公告)日:2007-07-04

    申请号:KR1020050133664

    申请日:2005-12-29

    CPC classification number: G02F1/155 G02F1/1533

    Abstract: A flexible electrochromic device, and a method for manufacturing the same are provided to improve a driving characteristic of an electrochromic device by forming an insulating layer on a transparent electrode, and improve the characteristic of a display device by forming a pattern of high quality by electrophoretic deposition and a compression process. An insulating layer is formed on a flexible transparent electrode(10) except a predetermined pattern. A nanocrystalline semiconductor layer(30) is formed on the transparent electrode at the predetermined pattern by using electrophoretic deposition. An electrochromic monomolecular layer(40) is formed on the semiconductor layer. A flexible opposite electrode(50) is arranged to face the transparent electrode. An electrolyte(60) is formed in a space between the transparent electrode and the opposite electrode.

    Abstract translation: 提供柔性电致变色器件及其制造方法,以通过在透明电极上形成绝缘层来改善电致变色器件的驱动特性,并通过电泳形成高品质图案来提高显示器件的特性 沉积和压缩过程。 在除了预定图案之外的柔性透明电极(10)上形成绝缘层。 通过使用电泳沉积,以预定图案在透明电极上形成纳米晶体半导体层(30)。 在半导体层上形成电致变色单分子层(40)。 柔性相对电极(50)布置成面对透明电极。 在透明电极和相对电极之间的空间中形成电解质(60)。

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