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公开(公告)号：KR1020060001011A
公开(公告)日：2006-01-06
申请号：KR1020040050017
申请日：2004-06-30
Applicant: 한국과학기술연구원
IPC: C23C16/513
Abstract: 본 발명은 플라즈마 이온 주입 및 열처리에 의하여 금속으로 이루어진 입체구조 재료의 표면을 처리하여 표면의 소수성을 향상시키는 방법 및 장치에 관한 것이다. 본 발명에 따른 방법은 진공조 내에 위치한 전도성 시료대 위에 금속 시료를 위치시키는 단계, 진공조 내에 플라즈마원 기체를 도입하는 단계, 도입된 플라즈마원 기체로부터 플라즈마를 발생시키는 단계, 음의 고전압 펄스를 상기 금속 재료에 가하여, 플라즈마로부터 추출된 이온이 고에너지를 보유한 채 상기 시료의 표면에 주입되도록 하는 단계, 및 이온 주입 후 시료의 온도를 상승시켜 열처리하는 단계를 포함한다.
플라즈마 이온 주입, 열처리, 금속, 소수성, 입체 구조-
公开(公告)号：KR1020040085242A
公开(公告)日：2004-10-08
申请号：KR1020030019874
申请日：2003-03-31
Applicant: 한국과학기술연구원
IPC: C08J7/18
Abstract: PURPOSE: A method and a device for the surface treatment of the inside of a polymeric container are provided to modify the inner surface for the purpose of improving hydrophilicity, hydrophobicity, adhesive property, biocompatibility and gas barrier property, etc. CONSTITUTION: The method for the surface treatment of inside of a polymeric container comprises the steps of: (a) wrapping a polymeric container(7) with a conductive cover(8); (b) positioning the polymeric container(7) on a sample holder(11) in a vacuum reservoir(1); (c) shielding the polymeric container(7) and the sample holder(11) with an insulation body(10); (d) introducing a plasma source gas selected depending on the particular purpose of surface modification into the vacuum reservoir(1); and (e) discharging the gas to form plasma(6) and applying negative high-voltage pulse to the conductive cover(8) and the holder(11) so as to introduce gas plasma ions into the container at high energy, or introducing ions while generating plasma directly by using a strong electric field caused by high-voltage pulse applied to the holder(11) and ground electrode(9) inserted in the container(7) under high pressure.
Abstract translation: 目的：提供一种用于表面处理聚合物容器内部的方法和装置，以改善内表面，以改善亲水性，疏水性，粘合性，生物相容性和阻气性等。构成： 聚合物容器内部的表面处理包括以下步骤：（a）用导电盖（8）包裹聚合物容器（7）; （b）将聚合物容器（7）定位在真空容器（1）中的样品保持器（11）上; （c）用绝缘体（10）屏蔽聚合物容器（7）和样品保持器（11）; （d）将根据表面改性的特定目的选择的等离子体源气体引入真空容器（1）中; 和（e）排出气体以形成等离子体（6）并向导电盖（8）和保持器（11）施加负高压脉冲，以便以高能将气体等离子体离子引入容器中，或引入离子 同时通过使用由在高压下插入到容器（7）中的保持器（11）和接地电极（9）施加的高电压脉冲引起的强电场而直接产生等离子体。
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公开(公告)号：KR100407447B1
公开(公告)日：2003-11-28
申请号：KR1020010039821
申请日：2001-07-04
IPC: C01B13/11
CPC classification number: C01B13/115 , C01B3/382 , C01B2201/12 , C01B2201/90
Abstract: An apparatus for generating ozone in high concentration with efficiency and linearly controlling the concentration of ozone is disclosed. The apparatus includes an oxygen generator, a flat plate type ozone generator, a high-voltage transformer, a high-frequency inverter, a cooling-water supplier, and a control signal generator. The high-frequency inverter linearly controls the concentration of ozone by applying a high-frequency voltage pulse generated according to a predetermined ON/OFF time ratio corresponding to a voltage level of a control signal, to the flat plate type ozone generator through the high-voltage transformer. The flat plate type ozone generator uses a flat plate type ceramic as dielectrics, thereby optimizing the efficiency of ozone generation and the endurance of the ozone generator, and thus simultaneously miniaturizing dimension thereof.
Abstract translation: 公开了一种用于以高浓度高效地产生臭氧并线性控制臭氧浓度的装置。 该设备包括氧气发生器，平板型臭氧发生器，高压变压器，高频逆变器，冷却水供应器和控制信号发生器。 高频逆变器线性地通过所述高施加根据对应于一控制信号的电压电平的预定ON / OFF时间比所产生的高频电压脉冲，在平板型臭氧发生器控制的臭氧浓度 电压互感器。 平板型臭氧发生器使用平板型陶瓷作为电介质，由此优化了臭氧发生的效率和臭氧发生器的耐久性，并因此同时使其尺寸小型化。
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公开(公告)号：KR100375334B1
公开(公告)日：2003-03-06
申请号：KR1020010003734
申请日：2001-01-26
Applicant: 한국과학기술연구원
IPC: C23C14/48
Abstract: PURPOSE: A method for surface modification of sharp metallic parts using plasma source ion implantation technique is provided to increase surface strength and durability. CONSTITUTION: The surface modification method of sharp metallic parts includes the steps of placing a sharp metallic part(8) on a specimen stand(9) within a vacuum chamber(1); placing a metal grid(10) at a position apart from the sharp metallic part in fixed distance; forming the plasma of a gas to be ion-implanted into the vacuum chamber; and plasma ion implantation onto the surface of the sharp metallic part by applying negative voltage pulse to the sharp metallic part and the metal grid.
Abstract translation: 目的：提供一种使用等离子体源离子注入技术对尖锐金属部件进行表面改性的方法，以增加表面强度和耐久性。 构成：尖锐金属部件的表面改性方法包括以下步骤：在真空室（1）内的试样台（9）上放置尖锐的金属部件（8）; 将金属格栅（10）放置在离开尖锐金属部分的位置处，并且距离固定; 形成要离子注入到真空室中的气体的等离子体; 以及通过对尖锐金属部分和金属栅格施加负电压脉冲而将等离子体离子注入到尖锐金属部分的表面上。
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公开(公告)号：KR1020020063035A
公开(公告)日：2002-08-01
申请号：KR1020010003734
申请日：2001-01-26
Applicant: 한국과학기술연구원
IPC: C23C14/48
CPC classification number: C23C14/48 , C23C14/3485
Abstract: PURPOSE: A method for surface modification of sharp metallic parts using plasma source ion implantation technique is provided to increase surface strength and durability. CONSTITUTION: The surface modification method of sharp metallic parts includes the steps of placing a sharp metallic part(8) on a specimen stand(9) within a vacuum chamber(1); placing a metal grid(10) at a position apart from the sharp metallic part in fixed distance; forming the plasma of a gas to be ion-implanted into the vacuum chamber; and plasma ion implantation onto the surface of the sharp metallic part by applying negative voltage pulse to the sharp metallic part and the metal grid.
Abstract translation: 目的：提供使用等离子体源离子注入技术对尖锐金属部件进行表面改性的方法，以提高表面强度和耐久性。 构成：锋利的金属部件的表面改性方法包括将尖锐的金属部件（8）放置在真空室（1）内的样品台（9）上的步骤; 将金属网格（10）放置在距离尖锐金属部分固定距离的位置处; 形成要离子注入真空室的气体的等离子体; 并通过向锋利的金属部分和金属网格施加负电压脉冲将等离子体离子注入锋利的金属部分的表面上。
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Patent Agency Ranking
公开(公告)号：KR100308747B1
公开(公告)日：2001-11-02
申请号：KR1019980054636
申请日：1998-12-12
Applicant: 한국과학기술연구원
IPC: C08J9/00
Abstract: 고분자 재료의 표면에 반응성 기체의 플라즈마 이온을 주입하기 전 또는 주입한 후에 비활성 기체의 플라즈마 이온을 주입시키거나, 또는 반응성 기체와 비활성 기체의 혼합 기체의 플라즈마 이온을 주입하는 플라즈마 이온 주입에 의한 고분자 재료의 표면 처리 방법이 제공된다.
본 발명의 방법에 따라 고분자 재료의 표면을 처리하면, 비활성 기체의 플라즈마 이온에 의해 고분자 재료의 표면에 다수의 라디칼이 형성되고, 이 라디칼에 의해 고분자 사슬들이 가교 반응을 하여 사슬과 사슬간에 결합을 형성함으로써 고분자 사슬들이 서로 고정되기 때문에, 반응성 기체의 이온 플라즈마에 의해 생성되는 여러 친수성 또는 소수성 작용기를 안정하게 유지할 수 있어, 시간에 따른 에이징 측면에서 우수한 효과를 나타낸다.-
公开(公告)号：KR1020000039319A
公开(公告)日：2000-07-05
申请号：KR1019980054636
申请日：1998-12-12
Applicant: 한국과학기술연구원
IPC: C08J9/00
Abstract: PURPOSE: A surface-treating method is provided a modified polymer material having an improved surface stability by a plasma ion implantation using the reactive gas and inactive gas. CONSTITUTION: A polymer material is positioned on a sample die in vacuum chamber, and an inactive gas plasma ion such as helium, neon, argon, krypton and Xenon is formed on the surface of the polymer material to form a chemical active radical. The inactive gas plasma ion is implanted on the surface of the material adding a negative potential pulse, and a reactive gas plasma ion such as oxygen, nitrogen, carbon dioxide, carbon monoxide, ammonia, hydrogen, steam, methane and carbon tetrachloride is formed on the surface of the material to form a hydrophilic or hydrophobic functional group. The reactive gas plasma ion is implanted on the surface of the material adding a negative potential pulse to the inactive gas plasma ion implanted material.
Abstract translation: 目的：提供一种表面处理方法，该改性聚合物材料通过使用反应性气体和惰性气体的等离子体离子注入具有改进的表面稳定性。 构成：将聚合物材料定位在真空室中的样品管芯上，并在聚合物材料的表面上形成惰性气体等离子体离子如氦，氖，氩，氪和氙以形成化学活性基团。 将惰性气体等离子体离子注入添加负电位脉冲的材料的表面上，并且在氧气，氮气，二氧化碳，一氧化碳，氨，氢气，蒸汽，甲烷和四氯化碳之间形成反应性气体等离子体离子 材料的表面形成亲水或疏水官能团。 将反应性气体等离子体离子注入材料的表面，向惰性气体等离子体离子注入材料添加负电位脉冲。
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公开(公告)号：KR101905734B1
公开(公告)日：2018-10-11
申请号：KR1020170051838
申请日：2017-04-21
Applicant: 한국과학기술연구원
CPC classification number: G01N21/78 , G01N21/3103 , G01N21/314
Abstract: 비표지금 나노로드(label-free AuNRs)를포함하는, 철이온(Fe)과수은이온(Hg)의순차적비색검출센서가제공된다.
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