-
公开(公告)号：KR100965904B1
公开(公告)日：2010-06-24
申请号：KR1020090082592
申请日：2009-09-02
Applicant: 한국기계연구원
IPC: H01L21/027 , B82Y40/00
CPC classification number: H01L33/44 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L2933/0083 , B29C59/022
Abstract: PURPOSE: A patterning method of a metal oxide thin film using nano-imprint and manufacturing method of a light emitting diode are provided to reduce a pattern process by removing a process of covering an ultraviolet resin additionally. CONSTITUTION: A photosensitivity metal-organic precursor solution is coated on a substrate(S1). A photosensitivity metal-organic precursor coating layer is pressurized into a patterned mold(S2). Ultraviolet ray is radiated on the pressured metal-organic precursor coating layer to form a hardened metal oxide film pattern(S3). The patterned mold is removed from the metal oxide thin film pattern(S4). A plastic process of processing the metal oxide thin film pattern with a thermal process is performed.
Abstract translation: 目的：提供使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管的制造方法，以通过除去另外掩盖紫外线树脂的工艺来减少图案处理。 构成：将光敏金属 - 有机前体溶液涂覆在基材上（S1）。 将光敏金属 - 有机前体涂层加压成图案化模具（S2）。 将紫外线照射在加压的金属 - 有机前体涂层上以形成硬化的金属氧化物膜图案（S3）。 从金属氧化物薄膜图案去除图案化的模具（S4）。 进行利用热处理来处理金属氧化物薄膜图案的塑性工艺。
-
公开(公告)号：KR1020100038948A
公开(公告)日：2010-04-15
申请号：KR1020080098119
申请日：2008-10-07
Applicant: 한국기계연구원
IPC: H01L51/42
CPC classification number: H01L51/424 , H01L51/0036
Abstract: PURPOSE: An organic photovoltaic device and a manufacturing method thereof are provided to improve reliability of the device by preventing pattern breakdown of P3HT in a PCBM coating process. CONSTITUTION: A buffer layer(20) is formed on a first electrode(10). A photoactive layer(30) is formed to have a nano pattern on the buffer layer. A protective layer(40) is formed to protect the photoactive layer. An electron receiving layer(50) is formed on the protective layer. A second electrode(60) is formed on the electron receiving layer.
Abstract translation: 目的：提供有机光伏器件及其制造方法，以通过防止PCBM涂层工艺中P3HT的图案击穿来提高器件的可靠性。 构成：在第一电极（10）上形成缓冲层（20）。 光敏层（30）形成为在缓冲层上具有纳米图案。 形成保护层（40）以保护光敏层。 在保护层上形成电子接收层（50）。 在电子接收层上形成第二电极（60）。
-
公开(公告)号：KR1020100027458A
公开(公告)日：2010-03-11
申请号：KR1020080086391
申请日：2008-09-02
Applicant: 한국기계연구원
IPC: H01L21/027 , B82Y40/00
CPC classification number: G03F7/0002 , B82Y40/00
Abstract: PURPOSE: A method for forming an electro-conductive polymer layer with a nano pattern is provided to form the pattern on a conductive polymer layer with a low solubility by forming the conductive polymer layer with a polymerization method instead of a spin coating method. CONSTITUTION: A mold with nano pattern is prepared(S101). A conductive polymer layer is formed on the nano pattern with a chemical oxidization polymerization method(S102). The mold is immersed into a bath in which a monomer solution is contained in order to form the conductive polymer layer on the nano pattern of the mold. A conductive polymer layer is attached on a substrate(S103). The mold is separated from the conductive polymer layer(S104). The conductive polymer layer is formed the mold in the water tub putting the monomer [monomer] solution as dipping on the nano pattern of the mold.
Abstract translation: 目的：提供一种形成具有纳米图案的导电聚合物层的方法，通过用聚合方法代替旋涂法形成导电聚合物层，在具有低溶解度的导电聚合物层上形成图案。 构成：制备具有纳米图案的模具（S101）。 用化学氧化聚合法在纳米图案上形成导电聚合物层（S102）。 将模具浸入其中含有单体溶液的浴中，以便在模具的纳米图案上形成导电聚合物层。 将导电聚合物层附着在基板上（S103）。 模具与导电聚合物层分离（S104）。 导电聚合物层在水桶中形成模具，将单体[单体]溶液浸渍在模具的纳米图案上。
-
公开(公告)号：KR100935019B1
公开(公告)日：2010-01-06
申请号：KR1020080070252
申请日：2008-07-18
Applicant: 한국기계연구원
IPC: H01L21/027 , B82Y40/00
CPC classification number: H01L21/0334 , B82Y40/00
Abstract: PURPOSE: A method for manufacturing a metal nano pattern is provided to improve productivity by manufacturing a metal nano pattern easily by applying dry or wet etching. CONSTITUTION: A nano pattern is formed on a substrate(S101). A metal layer is formed on a nano pattern(S102). A polarization polymer layer is formed on the metal layer(S103). The metal layer and the planarization layer are etched to expose the metal partially(S104). The pattern is etched to expose the upper surface of the nano pattern to the outside and make the metal layer remain on the groove of the nano pattern(S105).
Abstract translation: 目的：提供一种用于制造金属纳米图案的方法，以通过采用干蚀刻或湿蚀刻方式容易地制造金属纳米图案来提高生产率。 构成：在基板上形成纳米图案（S101）。 在纳米图案上形成金属层（S102）。 在金属层上形成极化聚合物层（S103）。 蚀刻金属层和平坦化层以使金属部分露出（S104）。 蚀刻图案以将纳米图案的上表面暴露于外部，并使金属层保留在纳米图案的凹槽上（S105）。
-
公开(公告)号：KR1020090114962A
公开(公告)日：2009-11-04
申请号：KR1020080040865
申请日：2008-04-30
Applicant: 한국기계연구원
CPC classification number: G02F1/13471 , G02B6/004 , G02F2001/133507
Abstract: PURPOSE: A transparent substrate and a manufacturing method thereof are provided to prevent the reflection of emitted light by forming a anti-reflection nano patterns at both sides of a main substrate. CONSTITUTION: A transparent substrate(200) comprises a main substrate(210) which is faced with a light source. The main substrate comprises the first surface facing the light source and the second surface facing the first surface. Nano-patterns(213,215) for preventing the reflection of light are arranged on the first and second surfaces and consist of a plurality of protrusions. The nano patterns have a pitch of 20 to 500nm. An ITO(Indium Tin Oxide) substrate(230) is attached to the first side of the substrate.
Abstract translation: 目的：提供透明基板及其制造方法，以通过在主基板的两侧形成抗反射纳米图案来防止发射光的反射。 构成：透明基板（200）包括面向光源的主基板（210）。 主基板包括面对光源的第一表面和面向第一表面的第二表面。 用于防止光反射的纳米图案（213,215）布置在第一和第二表面上，并且由多个突起组成。 纳米图案具有20至500nm的间距。 ITO（氧化铟锡）衬底（230）附着到衬底的第一侧。
-
Patent Agency Ranking
公开(公告)号：KR100866600B1
公开(公告)日：2008-11-03
申请号：KR1020080085905
申请日：2008-09-01
Applicant: 한국기계연구원
CPC classification number: H01L21/6715 , H01L21/02118 , H01L21/31604 , H01L39/2435 , H01L39/2438 , H01L41/318 , H01L2224/80874
Abstract: A method for manufacturing an organic light emitting device is provided to improve photonic efficiency by including a photonic crystal structure. A photonic crystal layer is formed on a substrate(10). An intermediate layer(60) having the high refractive index in comparison with the photonic crystal layer(50) is formed on the photonic crystal layer. A first electrode layer(20), a light-emitting layer(30), and a second electrode layer(40) are successively formed on the intermediate layer. The photonic crystal layer material is coated on the substrate. The photonic crystal is formed by imprinting the photonic crystal layer material with a mask having an reverse surface shape.
Abstract translation: 提供一种用于制造有机发光器件的方法，以通过包括光子晶体结构来提高光子效率。 在基板（10）上形成光子晶体层。 与光子晶体层（50）相比，具有高折射率的中间层（60）形成在光子晶体层上。 第一电极层（20），发光层（30）和第二电极层（40）依次形成在中间层上。 将光子晶体层材料涂覆在基板上。 通过用具有反面形状的掩模印刷光子晶体层材料来形成光子晶体。
-
公开(公告)号：KR100842931B1
公开(公告)日：2008-07-02
申请号：KR1020070064308
申请日：2007-06-28
Applicant: 한국기계연구원
IPC: H01L21/027
CPC classification number: G03F7/0002 , B81C1/0046 , G03F7/0015 , G03F7/2012
Abstract: A fabricating method of a roll stamp using imprint lithography is provided to form a fine pattern without a joint at low cost. A flat stamp having a pattern on one surface is attached to a roll stamp including a resin layer coated on the circumference(S21). The pattern of the flat stamp is transferred on the roll stamp by rotating the roll stamp in one direction on one surface of the flat stamp(S22). The resin layer of the roll stamp including the transferred pattern is hardened(S23). The roll stamp is etched by using the resin layer of the roll stamp as an etching barrier(S24). An intermediate layer and the resin layer are sequentially laminated on the circumference of the roll stamp.
Abstract translation: 提供使用压印光刻的卷印的制造方法，以低成本形成无接头的精细图案。 在一个表面上具有图案的平面印模附着到包括涂覆在圆周上的树脂层的辊印（S21）上。 通过在平面印模的一个表面上沿着一个方向旋转卷边印记（S22），将平面印模的图案转印到卷边印章上。 包括转印图案的卷边印模的树脂层变硬（S23）。 通过使用辊印的树脂层作为蚀刻阻挡层来蚀刻辊印（S24）。 中间层和树脂层依次层压在卷边的圆周上。
-
公开(公告)号：KR101321104B1
公开(公告)日：2013-10-23
申请号：KR1020100132656
申请日：2010-12-22
Applicant: 한국기계연구원
Abstract: 나노 임프린트용 스탬프의 제조 방법에 관한 것으로서, 이 방법은 나노미터 스케일의 미세 패턴이 형성된 고분자 층을 갖는 기재를 하기 화학식 1 또는 하기 화학식 2로 표현되는 모노머 또는 폴리머로 처리하는 공정을 포함한다.
[화학식 1]
ABD
[화학식 2]
AD
상기 화학식 1 또는 화학식 2에서, A는 플루오로카본기 또는 하이드로카본기이고, B는 하이드로카본기 또는 Si(R
1 )
2 -O-[Si(R
1 )
2 -O-]
n -Si(R
1 )
2 -R
2 (여기서, R
1 은 서로 독립적으로 탄소수 1 내지 10의 알킬기이고, R
2 는 탄소수 1 내지 10의 알킬렌기이고, n은 1 내지 100의 정수임)이고, D는 아크릴레이트기, 메타아크릴레이트기, 비닐 에테르기, 아민기(NR
3
2 , 여기에서 R
3 는 H, CH
3 또는 C
6 H
5 임), 에폭시기, 글리시딜기, 글리시딜 에테르기, 이소시아네이트기(NCO), 에스테르기(COOR
4 , 여기에서, R
4 는 H 또는 CH
3 임), 또는 티올기(SH)이다.-
公开(公告)号：KR101208661B1
公开(公告)日：2012-12-05
申请号：KR1020100060249
申请日：2010-06-24
Applicant: 한국기계연구원
Abstract: 본발명은상대적으로저렴한비용으로정밀한나노복제품을제조할수 있는나노임프린트용스탬프및 이의제조방법을제공한다. 나노임프린트용스탬프의제조방법은베이스기판의일면에나노미터스케일의미세패턴을형성하는단계와, 미세패턴위에자외선경화형수지를도포하고, 스탬프기판으로자외선경화형수지를눌러베이스기판위에스탬프기판을적층하는단계와, 자외선경화형수지를경화시켜스탬프기판의일면에미세패턴과반대형상을지닌수지몰드층을형성하는단계와, 베이스기판으로부터수지몰드층이고정된스탬프기판을분리시키는단계를포함한다.
-
公开(公告)号：KR1020120053318A
公开(公告)日：2012-05-25
申请号：KR1020100114530
申请日：2010-11-17
Applicant: 한국기계연구원
CPC classification number: H01L51/5262 , H01L2251/56
Abstract: PURPOSE: An organic light emitting display and a manufacturing method thereof are provided to improve brightness and prevent reflection by decreasing a total reflection phenomenon using an intermediate layer or an air layer. CONSTITUTION: A metal oxide pattern layer(20) including a base layer(21) and a light crystal structure(22) is formed on a substrate(10). A filling layer(30) is formed on the metal oxide pattern layer. A transparent first electrode layer(40) is formed on the filling layer. An organic light emitting layer(50) is formed on the first electrode layer. A second electrode layer(60) made of metal is formed on the organic light emitting layer.
Abstract translation: 目的：提供一种有机发光显示器及其制造方法，以通过使用中间层或空气层减少全反射现象来提高亮度并防止反射。 构成：在基板（10）上形成包括基底层（21）和光晶体结构（22）的金属氧化物图案层（20）。 在金属氧化物图案层上形成填充层（30）。 在填充层上形成透明的第一电极层（40）。 在第一电极层上形成有机发光层（50）。 在有机发光层上形成由金属制成的第二电极层（60）。
-
-
-
-
-
-
-
-
-
Search Results
117
records
(took 0.026 seconds)
