公开(公告)号：US20190171109A1

公开(公告)日：2019-06-06

申请号：US16257955

申请日：2019-01-25

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Anton Bernhard Van Oosten ,  Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Koen Jacobus Johannes Maria Zaal

IPC: G03F7/20 ,  G02B26/08 ,  G02B7/182

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

公开(公告)号：US10222706B2

公开(公告)日：2019-03-05

申请号：US14743775

申请日：2015-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri Lof ,  Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03B27/42 ,  G03F7/20 ,  G03F9/00

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

公开(公告)号：USRE46933E1

公开(公告)日：2018-07-03

申请号：US14715314

申请日：2015-05-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Marinus Aart Van Den Brink ,  Jozef Petrus Henricus Benschop ,  Erik Roelof Loopstra

IPC: G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/70341

Abstract: The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.

公开(公告)号：US09958787B2

公开(公告)日：2018-05-01

申请号：US14428023

申请日：2013-09-17

Applicant: ASML Netherlands B.V.

Inventor： Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Christiaan Louis Valentin ,  Antonius Johannes Josephus Van Dijsseldonk

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70425 ,  G03F7/7045 ,  G03F7/70466 ,  G03F7/70475

Abstract: A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between center points of the first and second patterned areas corresponds with a dimension of a conventional exposure.

公开(公告)号：US09715183B2

公开(公告)日：2017-07-25

申请号：US14365549

申请日：2013-01-24

Applicant: ASML Netherlands B.V.

Inventor： Wouter Dick Koek ,  Arno Jan Bleeker ,  Erik Roelof Loopstra ,  Heine Melle Mulder ,  Erwin John Van Zwet ,  Dries Smeets ,  Robert Paul Ebeling

IPC: G03B27/52 ,  G03F7/20 ,  G02B6/42

CPC classification number: G03F7/70891 ,  G02B6/4296 ,  G03F7/7015 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  Y10T29/49

Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

公开(公告)号：US20160062248A1

公开(公告)日：2016-03-03

申请号：US14937724

申请日：2015-11-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

公开(公告)号：US09134622B2

公开(公告)日：2015-09-15

申请号：US14107734

申请日：2013-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US20140375972A1

公开(公告)日：2014-12-25

申请号：US14481740

申请日：2014-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract translation: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US20140347641A1

公开(公告)日：2014-11-27

申请号：US14365549

申请日：2013-01-24

Applicant: ASML Netherlands B.V.

Inventor： Wouter Dick Koek ,  Arno Jan Bleeker ,  Erik Roelof Loopstra ,  Heine Melle Mulder ,  Erwin John Van Zwet ,  Dries Smeets ,  Robert Paul Ebeling

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G02B6/4296 ,  G03F7/7015 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  Y10T29/49

Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

Abstract translation: 一种具有波导形成的波导的器件，所述波导由穿过所述波导的辐射透明的材料的连续体形成，其中所述主体具有输入表面和输出表面，以及冷却器，被配置为冷却所述输入表面和/或输出表面 。 一种具有可编程图案形成装置的曝光装置，包括多个辐射发射器，被配置为提供多个辐射束; 以及投影系统，包括固定部分和移动部分，其被配置为将所述多个辐射束投影到基于图案被选择的目标上的位置上，其中所述辐射发射器中的至少一个包括波导，所述波导被配置为输出 包括非偏振和/或圆偏振辐射的辐射束。

公开(公告)号：US11150560B2

公开(公告)日：2021-10-19

申请号：US16881109

申请日：2020-05-22

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van De Kerkhof ,  Anton Bernhard Van Oosten ,  Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Koen Jacobus Johannes Maria Zaal

IPC: G03F7/20 ,  G02B7/182 ,  G02B26/08

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.