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公开(公告)号：EP3629086A1
公开(公告)日：2020-04-01
申请号：EP18196626.8
申请日：2018-09-25
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
Abstract: Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing relative movement of the diffraction structure relative to the radiation beam from a first position wherein the radiation beam does not irradiate the diffraction structure to a second position wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining the intensity profile of the radiation beam based on the measured diffracted radiation signals.
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公开(公告)号：EP4492141A1
公开(公告)日：2025-01-15
申请号：EP23185153.6
申请日：2023-07-13
Applicant: ASML Netherlands B.V.
Inventor： SCHOLZ, Sandy, Claudia , VAN RIJSWIJK, Loes, Frederique , NIENHUYS, Han-Kwang , COENEN, Teis, Johan , PORTER, Christina, Lynn
IPC: G03F7/00
Abstract: Disclosed is a method of metrology comprising: obtaining metrology data relating to measurement of one or more structures on a substrate, said metrology data comprising a plurality of data elements, and wherein at least some of said data elements comprise complex values; selecting a respective signal type for each respective data element of said plurality of data elements or a subset thereof to obtain processed metrology data; and determining at least one parameter of interest from said processed metrology data.
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公开(公告)号：EP4047400A1
公开(公告)日：2022-08-24
申请号：EP21157622.8
申请日：2021-02-17
Applicant: ASML Netherlands B.V.
Inventor： SMORENBURG, Petrus, Wilhelmus , REININK, Johan , REIJNDERS, Marinus, Petrus , NIENHUYS, Han-Kwang , O DWYER, David , ROOBOL, Sander, Bas , PORTER, Christina, Lynn
Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.
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公开(公告)号：EP3879343A1
公开(公告)日：2021-09-15
申请号：EP20162286.7
申请日：2020-03-11
Applicant: ASML Netherlands B.V.
Inventor： VAN WEPEREN, Ilse , NIENHUYS, Han-Kwang , COENEN, Teis Johan
IPC: G03F7/20
Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; illuminating, at one or more further times, the at least part of the structure with electromagnetic radiation, the at least part of the structure being at a second orientation; and sensing, one or more further average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances and the one or more further average reflectances, an estimation of the parameter at the one or more further times.
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公开(公告)号：EP3049870B1
公开(公告)日：2019-05-15
申请号：EP14777038.2
申请日：2014-09-24
Applicant: ASML Netherlands B.V.
Inventor： BANINE, Vadim , BARTRAIJ, Petrus , VAN GORKOM, Ramon , AMENT, Lucas , DE JAGER, Pieter , DE VRIES, Gosse , DONKER, Rilpho , ENGELEN, Wouter , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , NIENHUYS, Han-Kwang , NIKIPELOV, Andrey , RENKENS, Michael , JANSSEN, Franciscus , KRUIZINGA, Borgert
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Patent Agency Ranking
公开(公告)号：EP3948369A1
公开(公告)日：2022-02-09
申请号：EP20707469.1
申请日：2020-03-06
Applicant: ASML Netherlands B.V.
Inventor： NIENHUYS, Han-Kwang , VAN DER POST, Sietse, Thijmen
IPC: G02B5/18
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公开(公告)号：EP3514630A1
公开(公告)日：2019-07-24
申请号：EP19152558.3
申请日：2014-06-17
Applicant: ASML Netherlands B.V.
Inventor： NIKIPELOV, Andrey , FRIJNS, Olav Waldemar Vladimir , DE VRIES, Gosse Charles , LOOPSTRA, Erik Roelof , BANINE, Vadim Yevgenyevich , DE JAGER, Pieter Willem Herman , DONKER, Rilpho Ludovicus , NIENHUYS, Han-Kwang , KRUIZINGA, Borgert , ENGELEN, Wouter Joep , LUITEN, Otger Jan , AKKERMANS, Johannes Antonius Gerardus , GRIMMINCK, Leonardus Adrianus Gerardus , LITVINENKO, Vladimir
IPC: G03F7/20 , H05H7/04 , G01J1/26 , G02B1/06 , G02B5/20 , G01J1/04 , G21K1/10 , H01S3/09 , G01J1/42 , G02B26/02 , H01S3/00
Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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公开(公告)号：EP3345023B1
公开(公告)日：2019-05-15
申请号：EP16753864.4
申请日：2016-08-03
Applicant: ASML Netherlands B.V.
Inventor： DE VRIES, Gosse, Charles , NIENHUYS, Han-Kwang
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公开(公告)号：EP3126910B1
公开(公告)日：2019-05-15
申请号：EP15712652.5
申请日：2015-03-30
Applicant: ASML Netherlands B.V.
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公开(公告)号：EP3126910A1
公开(公告)日：2017-02-08
申请号：EP15712652.5
申请日：2015-03-30
Applicant: ASML Netherlands B.V.
Inventor： NIKIPELOV, Andrey, Alexandrovich , AKKERMANS, Johannes, Antonius, Gerardus , GRIMMINCK, Leonardus, Adrianus, Gerardus , LOOPSTRA, Erik, Roelof , RENKENS, Michael, Jozef, Mathijs , TOMA, Adrian , NIENHUYS, Han-Kwang
CPC classification number: G03F7/70025 , G03F7/70008 , H01F6/04 , H01F7/0273 , H01F7/0278 , H01S3/0903 , H05H7/04 , H05H2007/041
Abstract: An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.
Abstract translation: 用于自由电子激光器的波动器（24b）包括用于电子束的管道（140）和沿管道轴向延伸的一个或多个周期性磁性结构（142）。 每个周期性磁性结构包括多个磁体（144）和多个无源铁磁元件（148），所述多个磁体与沿着轴向延伸的线中的多个无源铁磁元件交替布置。 多个磁体中的每一个在空间上与管分离，并且每个被动铁磁元件从相邻的磁体径向地延伸到管道。 可以在磁体和管之间设置间隔元件（146），以为磁体提供辐射屏蔽和/或用于管道的冷却。
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