-
公开(公告)号:EP3449312A1
公开(公告)日:2019-03-06
申请号:EP17717149.3
申请日:2017-04-12
Applicant: ASML Netherlands B.V.
Inventor: NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
-
公开(公告)号:EP4022392A1
公开(公告)日:2022-07-06
申请号:EP20765216.5
申请日:2020-08-20
Applicant: ASML Netherlands B.V.
Inventor: NIKIPELOV, Andrey , BALTUSSEN, Sander , BANINE, Vadim, Yevgenyevich , DOLGOV, Alexandr , DONMEZ NOYAN, Inci , HOUWELING, Zomer, Silvester , NOTENBOOM, Arnoud, Willem , VAN DE KERKHOF, Marcus, Adrianus , VAN DER WOORD, Ties, Wouter , VERMEULEN, Paul, Alexander , VLES, David, Ferdinand , VORONINA, Victoria , YEGEN, Halil, Gökay
IPC: G03F1/62 , G03F7/20 , C01B32/158 , D01F9/12 , D01F11/12
-
公开(公告)号:EP3963402A1
公开(公告)日:2022-03-09
申请号:EP20716758.6
申请日:2020-04-01
Applicant: ASML Netherlands B.V.
IPC: G03F7/16 , G03F7/20 , H01L21/687
-
公开(公告)号:EP3861405A1
公开(公告)日:2021-08-11
申请号:EP19773830.5
申请日:2019-09-25
Applicant: ASML Netherlands B.V.
Inventor: NIKIPELOV, Andrey , BECKERS, Johan Franciscus Maria
-
公开(公告)号:EP3514630A1
公开(公告)日:2019-07-24
申请号:EP19152558.3
申请日:2014-06-17
Applicant: ASML Netherlands B.V.
Inventor: NIKIPELOV, Andrey , FRIJNS, Olav Waldemar Vladimir , DE VRIES, Gosse Charles , LOOPSTRA, Erik Roelof , BANINE, Vadim Yevgenyevich , DE JAGER, Pieter Willem Herman , DONKER, Rilpho Ludovicus , NIENHUYS, Han-Kwang , KRUIZINGA, Borgert , ENGELEN, Wouter Joep , LUITEN, Otger Jan , AKKERMANS, Johannes Antonius Gerardus , GRIMMINCK, Leonardus Adrianus Gerardus , LITVINENKO, Vladimir
IPC: G03F7/20 , H05H7/04 , G01J1/26 , G02B1/06 , G02B5/20 , G01J1/04 , G21K1/10 , H01S3/09 , G01J1/42 , G02B26/02 , H01S3/00
Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
-
公开(公告)号:EP4473359A1
公开(公告)日:2024-12-11
申请号:EP23701775.1
申请日:2023-01-26
Applicant: ASML Netherlands B.V.
-
公开(公告)号:EP4437380A1
公开(公告)日:2024-10-02
申请号:EP22809484.3
申请日:2022-11-03
Applicant: ASML Netherlands B.V.
Inventor: NIKIPELOV, Andrey , VAN DER WOORD, Ties, Wouter , VERMEULEN, Paul, Alexander , HOUWELING, Zomer, Silvester
IPC: G03F1/62 , G03F7/20 , C01B32/158
CPC classification number: G03F1/62 , G03F7/70983 , C01B32/168
-
公开(公告)号:EP4200670A1
公开(公告)日:2023-06-28
申请号:EP21749855.9
申请日:2021-07-29
Applicant: ASML Netherlands B.V.
-
公开(公告)号:EP4045974A1
公开(公告)日:2022-08-24
申请号:EP20758237.0
申请日:2020-08-25
Applicant: ASML Netherlands B.V.
Inventor: NIKIPELOV, Andrey , KURILOVICH, Dmitry
-
公开(公告)号:EP3596546A1
公开(公告)日:2020-01-22
申请号:EP18704983.8
申请日:2018-02-15
Applicant: ASML Netherlands B.V.
-
-
-
-
-
-
-
-
-