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公开(公告)号：WO2022128246A1
公开(公告)日：2022-06-23
申请号：PCT/EP2021/080711
申请日：2021-11-05
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DE KERKHOF, Marcus, Adrianus , DOLGOV, Alexandr , HOUWELING, Zomer, Silvester , NIKIPELOV, Andrey
Abstract: There is provided a cleaning apparatus for cleaning a component of a lithographic apparatus, said apparatus comprising a first cleaning surface configured to physically interact with a contaminant particle located on a surface to be cleaned to remove the contaminant particle from the surface to be cleaned. Also described is a cleaning tip for cleaning a component of a lithographic apparatus, a method of cleaning a lithographic apparatus, and an apparatus and method for preventing re-contamination of a surface of a lithographic apparatus.
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Patent Agency Ranking
公开(公告)号：WO2021037662A1
公开(公告)日：2021-03-04
申请号：PCT/EP2020/073323
申请日：2020-08-20
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , BALTUSSEN, Sander , BANINE, Vadim, Yevgenyevich , DOLGOV, Alexandr , DONMEZ NOYAN, Inci , HOUWELING, Zomer, Silvester , NOTENBOOM, Arnoud, Willem , VAN DE KERKHOF, Marcus, Adrianus , VAN DER WOORD, Ties, Wouter , VERMEULEN, Paul, Alexander , VLES, David, Ferdinand , VORONINA, Victoria , YEGEN, Halil, Gökay
IPC: G03F1/62 , G03F7/20 , C01B32/158 , D01F9/12 , D01F11/12
Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.
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公开(公告)号：WO2022189087A1
公开(公告)日：2022-09-15
申请号：PCT/EP2022/053189
申请日：2022-02-10
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20 , H01L21/683 , H01L21/687
Abstract: An electrostatic clamp for clamping an object, the electrostatic clamp comprising an electroadhesive layer comprising a plurality of conductive compressible material elements coated with insulating material, wherein the electroadhesive layer is configured to electrically change adhesion to the object for clamping and unclamping the object, wherein the elements have an average diameter in a range of 1-100nm, preferably 5-20nm.
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公开(公告)号：EP4057068A1
公开(公告)日：2022-09-14
申请号：EP21161486.2
申请日：2021-03-09
Applicant: ASML Netherlands B.V.
IPC: G03F7/20 , H01L21/683
Abstract: An electrostatic clamp for clamping an object, the electrostatic clamp comprising an electroadhesive layer comprising a plurality of conductive compressible material elements coated with insulating material, wherein the electroadhesive layer is configured to electrically change adhesion to the object for clamping and unclamping the object.
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公开(公告)号：EP3759550A1
公开(公告)日：2021-01-06
申请号：EP19705767.2
申请日：2019-02-21
Applicant: ASML Netherlands B.V.
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公开(公告)号：EP4022392A1
公开(公告)日：2022-07-06
申请号：EP20765216.5
申请日：2020-08-20
Applicant: ASML Netherlands B.V.
Inventor： NIKIPELOV, Andrey , BALTUSSEN, Sander , BANINE, Vadim, Yevgenyevich , DOLGOV, Alexandr , DONMEZ NOYAN, Inci , HOUWELING, Zomer, Silvester , NOTENBOOM, Arnoud, Willem , VAN DE KERKHOF, Marcus, Adrianus , VAN DER WOORD, Ties, Wouter , VERMEULEN, Paul, Alexander , VLES, David, Ferdinand , VORONINA, Victoria , YEGEN, Halil, Gökay
IPC: G03F1/62 , G03F7/20 , C01B32/158 , D01F9/12 , D01F11/12
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