公开(公告)号：WO2021037662A1

公开(公告)日：2021-03-04

申请号：PCT/EP2020/073323

申请日：2020-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： NIKIPELOV, Andrey ,  BALTUSSEN, Sander ,  BANINE, Vadim, Yevgenyevich ,  DOLGOV, Alexandr ,  DONMEZ NOYAN, Inci ,  HOUWELING, Zomer, Silvester ,  NOTENBOOM, Arnoud, Willem ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER WOORD, Ties, Wouter ,  VERMEULEN, Paul, Alexander ,  VLES, David, Ferdinand ,  VORONINA, Victoria ,  YEGEN, Halil, Gökay

IPC: G03F1/62 ,  G03F7/20 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12

Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.

公开(公告)号：WO2019007590A1

公开(公告)日：2019-01-10

申请号：PCT/EP2018/063898

申请日：2018-05-28

Applicant: ASML NETHERLANDS B.V.

Inventor： JEUNINK, Andre, Bernardus ,  VORONINA, Victoria ,  DRUZHININA, Tamara ,  PETERSON, Brennan ,  PIJNENBURG, Johannes, Adrianus, Cornelis, Maria

IPC: G03F9/00 ,  H01L23/544

Abstract: The invention relates to a method for revealing sensor targets on a substrate covered with a layer, said method comprising the following steps: determining locations of first areas on the substrate with yielding target portions and of second areas on the substrate with non-yielding target portions; at least partially removing feature regions of the layer covering sensor targets in the second areas to reveal sensor targets in the second areas; measuring a location of the revealed sensor targets in the second areas; determining a location of sensor targets in the first areas based on the measured location of the revealed sensor targets in the second areas; and at least partially removing sensor target regions of the layer covering the sensor targets in the first areas using the determined location of the sensor targets in the first areas.

公开(公告)号：WO2020035203A1

公开(公告)日：2020-02-20

申请号：PCT/EP2019/067113

申请日：2019-06-27

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus ,  KAUR, Chanpreet ,  VAN DE WIJDEVEN, Jeroen, Johan, Maarten ,  HUANG, Yang-Shan ,  JEUNINK, Andre, Bernardus ,  DRUZHININA, Tamara ,  VORONINA, Victoria

IPC: G03F9/00

Abstract: Disclosed is an apparatus for processing at least a first substrate in a lithographic process, which first substrate comprises a mask layer and one or more marks arranged below said mask layer, the apparatus comprising a first substrate support configured to hold the first substrate, a clearing tool configured to clear at least one of the marks by clearing an area of the mask layer above said mark while the first substrate is arranged on the first substrate support, and a measurement tool configured to determine a position of at least one of the cleared marks while the first substrate is arranged on the first substrate support.

公开(公告)号：WO2019037964A1

公开(公告)日：2019-02-28

申请号：PCT/EP2018/069601

申请日：2018-07-19

Applicant: ASML NETHERLANDS B.V.

Inventor： HUANG, Yang-Shan ,  JEUNINK, Andre, Bernardus ,  VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus ,  VORONINA, Victoria

IPC: G03F7/20

Abstract: A clear-out tool is described, the clear-out tool being configured to at least partially remove a masking layer from a target area of an object using a laser beam. The clear-out tool comprising a barrier member configured to be arranged above a surface of the object containing the target area and configured to contain a liquid in a space next to the target area or surrounding the target area.

公开(公告)号：EP3759550A1

公开(公告)日：2021-01-06

申请号：EP19705767.2

申请日：2019-02-21

Applicant: ASML Netherlands B.V.

Inventor： DE JAGER, Pieter, Willem, Herman ,  WUISTER, Sander, Frederik ,  VAN LARE, Marie-Claire ,  MAAS, Ruben, Cornelis ,  POLYAKOV, Alexey, Olegovich ,  DRUZHININA, Tamara ,  VORONINA, Victoria ,  KURGANOVA, Evgenia ,  OVERKAMP, Jim, Vincent ,  KASTRUP, Bernardo ,  VAN KAMPEN, Maarten ,  DOLGOV, Alexandr

IPC: G03F7/004 ,  G03F7/20

公开(公告)号：EP4022392A1

公开(公告)日：2022-07-06

申请号：EP20765216.5

申请日：2020-08-20

Applicant: ASML Netherlands B.V.

Inventor： NIKIPELOV, Andrey ,  BALTUSSEN, Sander ,  BANINE, Vadim, Yevgenyevich ,  DOLGOV, Alexandr ,  DONMEZ NOYAN, Inci ,  HOUWELING, Zomer, Silvester ,  NOTENBOOM, Arnoud, Willem ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER WOORD, Ties, Wouter ,  VERMEULEN, Paul, Alexander ,  VLES, David, Ferdinand ,  VORONINA, Victoria ,  YEGEN, Halil, Gökay

IPC: G03F1/62 ,  G03F7/20 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12

公开(公告)号：EP3693796A1

公开(公告)日：2020-08-12

申请号：EP19156092.9

申请日：2019-02-08

Applicant: ASML Netherlands B.V.

Inventor： VAN DE KERKHOF, Marcus Adrianus ,  VORONINA, Victoria ,  OSORIO OLIVEROS, Edgar Alberto ,  VAN DER HORST, Ruud Martinus

IPC: G03F7/20 ,  B08B7/00 ,  G02B26/10 ,  G02B27/00 ,  B23K26/0622

Abstract: A lithographic apparatus comprising: a component (100) subject to contamination (101); and a cleaning system (200), the cleaning system comprising a laser radiation source (201) configured to emit pulses of radiation (202); a beam delivery system (204,205) configured to direct the radiation to a point of incidence (P) on the component; and an actuator (206) for controlling the position of the point of incidence with respect to the component.