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41.发明申请POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS AND A METHOD FOR POSITIONAL CONTROL 有权定位系统，平面设备和位置控制方法公开(公告)号：US20160077450A1
公开(公告)日：2016-03-17
申请号：US14956110
申请日：2015-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans BUTLER , Henrikus Herman Marie COX
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03B27/53 , G03B27/58 , G03F7/70725
Abstract: A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.
Abstract translation: 一种用于控制光刻设备的第一部件和第二部件之间的相对位置的定位系统，其中每个部件的位置由一组正交坐标定义，所述定位系统包括：测量装置，其被配置为确定 相对于测量坐标中的设定点位置的部件之一的瞬时位置; 以及控制器，被配置为基于所确定的误差来控制所述另一部件在控制坐标中的移动; 其中测量坐标与控制坐标不同。
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42.发明公开公开(公告)号：US20240175479A1
公开(公告)日：2024-05-30
申请号：US18284580
申请日：2022-04-11
Applicant: ASML Netherlands B.V. , Carl Zeiss SMT GmbH
Inventor： Maarten Hartger KIMMAN , Hans BUTLER , Johannes,Petrus,Martinus,Bernardus VERMEULEN , Stefan TROGER , Michael ERATH , Philipp GAIDA
CPC classification number: F16F15/08 , G03F7/70825 , G03F7/709
Abstract: A positioning system for moving or positioning a moveable object, the system including: a dynamic support system including a reaction mass, a first support, a first spring system to support the reaction mass from the first support, a second support, a second spring system to support the first support from the second support, and a damping system to provide damping to the dynamic support system; and an actuator for generating a driving force between the moveable object and the reaction mass for moving or position the object, wherein a first eigenfrequency and a second eigenfrequency of the dynamic support system are substantially the same.
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公开(公告)号：US20230266678A1
公开(公告)日：2023-08-24
申请号：US18123620
申请日：2023-03-20
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/7085 , G03F7/70775 , G03F7/70808 , G03F7/70716 , G03F7/70725 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088 , G03F7/70633
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US20220121127A1
公开(公告)日：2022-04-21
申请号：US17562446
申请日：2021-12-27
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Duygu AKBULUT , Marimus Johannes Maria VAN DAM , Hans BUTLER , Hugo Augustinus Joseph CRAMER , Engelbertus Antonius Franciscus VAN DER PASCH , Ferry ZIJP , Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Marinus Petrus REIJNDERS
IPC: G03F7/20 , G01N21/956
Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
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公开(公告)号：US20210318624A1
公开(公告)日：2021-10-14
申请号：US17267708
申请日：2019-07-15
Applicant: ASML Netherlands B.V.
Inventor： Bas JANSEN , Hans BUTLER , Alexander Pascal DIJKSHOORN
Abstract: The invention provides a substrate support arranged to support a substrate, comprising piezo a actuator, further comprising a first pair of electrodes, a second pair of electrodes and a piezo material having a first surface and a second surface. The first surface is arranged along a first direction and second direction. The first pair of electrodes comprises a first electrode arranged on the first surface and a second electrode arranged on the second surface. The second pair of electrodes is arranged to shear the piezo material. The first pair of electrodes is arranged to elongate the piezo material in a third direction perpendicular to the first direction and second direction. The first electrode is divided into at least two parts and is arranged to rotate the first surface and the second surface relatively to each other about the first direction wherein the piezo actuator is arranged to support the substrate.
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Patent Agency Ranking
公开(公告)号：US20210223703A1
公开(公告)日：2021-07-22
申请号：US17218420
申请日：2021-03-31
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US20210080834A1
公开(公告)日：2021-03-18
申请号：US17050264
申请日：2019-03-18
Applicant: ASML Netherlands B.V.
Inventor： Hans BUTLER , Joep Sander DE BEER , Cornelius Adrianus Lambertus DE HOON , Jeroen Pieter STARREVELD , Martinus VAN DUIJNHOVEN , Maurice Willem Jozef Etiënn WIJCKMANS
IPC: G03F7/20
Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.
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48.发明申请公开(公告)号：US20200050120A1
公开(公告)日：2020-02-13
申请号：US16482515
申请日：2018-01-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans BUTLER , Maurice Willem Jozef Etiënne WIJCKMANS
IPC: G03F9/00
Abstract: The present invention relates to a lithographic apparatus, comprising: a projection system configured to project a patterned radiation beam onto a substrate, comprising optical elements, a sensor frame, a first position measurement system configured to measure a position of an optical element relative to the sensor frame, comprising a sensor adapted to monitor an optical element, with a sensor element mounted to the sensor frame, a sensor frame support supporting the sensor frame on a reference, a force measurement device adapted to generate force measurement data relating to force exerted on the sensor frame by the sensor frame support, a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control said relative position based on at least the force measurement data.
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公开(公告)号：US20190377266A1
公开(公告)日：2019-12-12
申请号：US16547933
申请日：2019-08-22
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US20190302631A1
公开(公告)日：2019-10-03
申请号：US16382483
申请日：2019-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Erik Theodorus Maria BIJLAART , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN , Antonius Theodorus Anna Maria DERKSEN , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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