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公开(公告)号：JP2000251734A
公开(公告)日：2000-09-14
申请号：JP4716899
申请日：1999-02-24
Applicant: CANON KK
Inventor： NOMA TAKASHI , MIURA NAOKO
Abstract: PROBLEM TO BE SOLVED: To detect temperature and atmospheric conditions accurately and efficiently. SOLUTION: This panel display monitor structure is installed to assay parameters for manufacturing conditions of a manufacturing process of a flat display panel 2 and constituted by forming a material 12 having sensitivity to a process environment comprising temperature and atmosphere into a fine particle layer in on a base substance 11.
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公开(公告)号：JPH1055748A
公开(公告)日：1998-02-24
申请号：JP15420697
申请日：1997-06-12
Applicant: CANON KK
Inventor： UENO RIE , SAKANO YOSHIKAZU , TAKEDA TOSHIHIKO , NOMURA ICHIRO , SUZUKI HIDETOSHI , KANEKO TETSUYA , NOMA TAKASHI
Abstract: PROBLEM TO BE SOLVED: To enable an electron emission quantity to be changed and extend longer service life by providing plural electrodes with their different electric characteristics respectively capable of applying voltage between two electrodes independently from the outside and switching the electrodes. SOLUTION: After a lift-off resist is formed on a well washed glass substrate 1 by photolithography technique, electrodes 3, 4, 171, 172, and 173 with their specified intervals are formed by vacuum evaporation. The electrodes 171, 172, and 173 connected in parallel to between the electrodes 3 and 4 makes it possible to apply voltage independently from the outside. Next, a part forming a fine particle membrane 5 remains on an electrode substrate 1, and a Cr film is vacuum-evaporated fully. Further, organic solvent containing organic paradium is applied and sintered thereon, and plural fine particle membranes 5 composed of pd fine particles is formed between the electrodes 3 and 4. Finally, the Cr film is removed by etching, and the electron emission element is completed. Thus, the width of each fine particle membrane 5 is changed, electron characteristics are changed, and by which the electron emission quantity can be changed stepwise.
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43.发明专利
公开(公告)号：JPH0927273A
公开(公告)日：1997-01-28
申请号：JP19796895
申请日：1995-07-12
Applicant: CANON KK
Inventor： YAMAMOTO KEISUKE , ASAI AKIRA , NOMA TAKASHI , MATSUTANI SHIGEKI , OSADA YOSHIYUKI
Abstract: PROBLEM TO BE SOLVED: To reduce the influence on element component members and on electron emission characteristics by heat generation during current-carrying forming process so as to achieve high reliability of an electron emission element by forming an electron emitting part through a reverse piezoelectric effect on a conductive film. SOLUTION: A piezoelectric element 6 consisting of a piezoelectric electrode 7 and a piezoelectric layer 8 is formed over a substrate 1, element electrodes 4, 5 are provided on the piezoelectric element 6, and a conductive film 3 is formed between the electrodes 4, 5. In current-passing forming, a current is passed between the electrodes 4, 5 and a voltage is applied to the piezoelectric electrode 7 to destroy, deform, or denature the conductive film 3 locally to form an electron emitting part 2. Deflection of the conductive film 3 caused by a reverse piezoelectric effect promotes the local destruction, deformation, or denaturing to reduce the amount of heat during the current-passing forming so as to reduce the influence of the heat on the component members of the element and on electron emission characteristics. Also, the power consumption and the processing time required for the formation of the electron emitting part can both be reduced greatly.
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公开(公告)号：JPH0612997A
公开(公告)日：1994-01-21
申请号：JP18572692
申请日：1992-06-22
Applicant: CANON KK
Inventor： UENO RIE , SAKANO YOSHIKAZU , TAKEDA TOSHIHIKO , NOMURA ICHIRO , SUZUKI HIDETOSHI , KANEKO TETSUYA , NOMA TAKASHI
Abstract: PURPOSE:To provide a surface conduction type electron emitting element, in which a position and shape of an electron emitting part can be controlled, and a picture forming device of using this element. CONSTITUTION:In an electron emitting element, electrodes 3, 4 are formed on an insulating substrate 1, to further form a fine grain film 5 of providing a step differenced part 2 with partly different film thickness. When electrification treatment is applied to the fine grain film 5, an electron emitting part 6 is linearly formed along the step differenced part 2. Consequently, by arbitrarily designing a shape of the step differenced part 2, an electron emission amount, electron emission efficiency, etc., can be controlled, and in the case of using for a picture forming device, a picture display of uniform brightness, shape and luminance of phosphor can be obtained.
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公开(公告)号：JPH0518086B2
公开(公告)日：1993-03-11
申请号：JP887483
申请日：1983-01-22
Applicant: CANON KK
Inventor： NISHIMURA YUKIO , ASANO TOSHIAKI , KAWAKAMI EIGO , MIZUSAWA NOBUTOSHI , HARUTA MASAHIRO , NOMA TAKASHI , TAKAGI HIROTSUGU , NAKAZAWA MASANOBU , OZAWA KUNITAKA
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Patent Agency Ranking
公开(公告)号：JP2003238292A
公开(公告)日：2003-08-27
申请号：JP2002037043
申请日：2002-02-14
Applicant: CANON KK
Inventor： NOMA TAKASHI
Abstract: PROBLEM TO BE SOLVED: To provide fluorite which is suitable as an optical component for excimer laser of an exposure device for photolithography. SOLUTION: A method of manufacturing a fluorite crystal comprises a step for melting calcium fluoride in a crucible and then solidifying the resulting melt, and includes a step for growing the fluorite single crystal from the lower end of the melt in the crucible, and a step for subsequently depositing fluorite polycrystal from the melt. Further, in the method of manufacturing the fluorite crystal, a step for analyzing the concentration of an impurity in a part of the fluorite polycrystal and judging from the analyzed value whether the quality of the formed fluorite single crystal is good or not. COPYRIGHT: (C)2003,JPO
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公开(公告)号：JP2001147207A
公开(公告)日：2001-05-29
申请号：JP33005199
申请日：1999-11-19
Applicant: CANON KK
Inventor： NOMA TAKASHI , TAKADA KAZUHIRO
IPC: G01N23/207
Abstract: PROBLEM TO BE SOLVED: To easily set a membrane sample to a sample holder for diffracting obliquely incident X-rays in a case measuring the diffraction of obliquely incident X-rays of the membrane sample and to reduce the effect of scattered X-rays due to the constituent member of the sample holder for diffracting obliquely incident X-rays. SOLUTION: Sample support members 4, each of which is arranged so as to cover a part of an aperture part 2 through the end surface A provided on the same plane as a measuring reference surface 3 and holds a sample 1 so that the measuring surface of the sample 1 coincides with a measuring reference sample 3, are provided to a sample holder substrate 14, which has an aperture part 2 and the measuring reference surface 3 formed thereto, within a range wherein the relation of the thickness T of an end surface B in primary X-rays 5 with the distance L from the end surface B to the center of the irradiation region of primary X-rays 5 in the sample 1, the maximum incident angle ωm of primary X-rays 5 and the width W of the irradiation region of primary X-rays 5 in the end surface becomes T>W/2+L+Tanωm and primary X-rays 5 applied to the part other than the measuring surface of the sample 1 is shielded by the end surface B.
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公开(公告)号：JP2000275192A
公开(公告)日：2000-10-06
申请号：JP8173999
申请日：1999-03-25
Applicant: CANON KK
Inventor： TAKADA KAZUHIRO , NOMA TAKASHI
IPC: G01N23/20
Abstract: PROBLEM TO BE SOLVED: To arbitrarily set resolving power in the measurement of the diffraction pattern of diffracted X-rays generated when a sample is irradiated with X-rays. SOLUTION: In the X-ray diffraction apparatus, a sample 3 is held on a goniometer 12 having a sample rotating mechanism and the incident angle ωof primary X-ray 4 from an X-ray source 7 is regulated by the sample rotating mechanism. A position-sensitive type proportion counter 6 is provided in order to measure the emitting angle α of diffracted/scattered X-rays 5 from the sample 3 to be arranged on a rectilinear stage 11 movable in a Tx-direction and a Ty-direction and changes in its resolving power corresponding to the distance L with the sample 3.
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公开(公告)号：JP2000275113A
公开(公告)日：2000-10-06
申请号：JP8173899
申请日：1999-03-25
Applicant: CANON KK
Inventor： NOMA TAKASHI , TAKADA KAZUHIRO
Abstract: PROBLEM TO BE SOLVED: To accurately measure an internal stress near the surface of a sample or a thin film state sample by excluding an effect of a refraction of an X-ray on the surface of the sample. SOLUTION: In the method for measuring an X-ray stress, a sample 3 is held on a sample rotating mechanism 21, and hence an incident angle α of a primary X-ray 4 from an X-ray source 9 is set to 5 deg. or below. A diffraction X-ray 5 diffraction at the sample 3 is measured in its intensity by an X-ray detector 6. A calculator 19 detects a diffraction angle θ from an intensity distribution of the diffraction X-ray 5 measured by the detector 6, the diffraction angle when no influence of refraction of X-ray exists from the data of the angles α, θ is obtained, and an internal stress of the sample 3 is calculated base on the diffraction angle.
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公开(公告)号：JPH11337507A
公开(公告)日：1999-12-10
申请号：JP14145298
申请日：1998-05-22
Applicant: CANON KK
Inventor： TAKADA KAZUHIRO , NOMA TAKASHI
IPC: G01N23/20
Abstract: PROBLEM TO BE SOLVED: To provide an X-ray reflectance measuring device, which can evaluate the structure in a micro-area of a test sample when the surface of the test sample is irradiated with X-ray and a reflectance of X-ray reflected on the surface of the test sample is measured to evaluate the structure of the test sample. SOLUTION: A crystalline 2 consisting of powder whose particle diameters are uniform is sprayed on the surface of a measured test sample 1. An X-ray from an X-ray generating device 3 arranged on the surface side of the measured test sample 1 is cast on the crystalline 2 via a collimator 4 comprising slits 4a and 4b. The X-ray cast on the crystalline 2 is diffracted by the crystalline 2 and is made incident on the surface of the measured test sample 1 at a small angle with respect to the surface of the measured test sample 1 to make total reflection on the surface of the measured test sample 1. The X-ray diffracted by the crystalline 2 is made incident on the measured test sample 1 thus, the width of an X-ray irradiated area on the surface of the measured test sample 1 is lessened. The X-ray reflected on the surface of the measured test sample 1 passes through a slit 7 and a monochromator 6 and an X-ray detector detects the X-ray.
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