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公开(公告)号:DE69505448T2
公开(公告)日:1999-04-22
申请号:DE69505448
申请日:1995-02-22
Applicant: CANON KK
Inventor: HARA SHINICHI , MIZUSAWA NOBUTOSHI , CHIBA YUJI
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公开(公告)号:DE3752179D1
公开(公告)日:1998-04-30
申请号:DE3752179
申请日:1987-12-09
Applicant: CANON KK
Inventor: EBINUMA RYUICHI , MIZUSAWA NOBUTOSHI , CHIBA YUJI
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公开(公告)号:DE69030348T2
公开(公告)日:1997-09-04
申请号:DE69030348
申请日:1990-10-03
Applicant: CANON KK
Inventor: WATANABE YUTAKA , EBINUMA RYUICHI , MIZUSAWA NOBUTOSHI , UZAWA SHUNICHI , KARIYA TAKAO
IPC: G03F7/20
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公开(公告)号:DE68927146T2
公开(公告)日:1997-02-06
申请号:DE68927146
申请日:1989-09-29
Applicant: CANON KK
Inventor: MATSUI SHIN , KARIYA TAKAO , MIZUSAWA NOBUTOSHI , EBINUMA RYUICHI , UZAWA SHUNICHI
IPC: G03F7/20 , H01L21/677 , H01L21/68
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公开(公告)号:DE69123279D1
公开(公告)日:1997-01-09
申请号:DE69123279
申请日:1991-04-04
Applicant: CANON KK
Inventor: KUNO MITSUTOSHI , FUJIOKA HIDEHIKO , MIZUSAWA NOBUTOSHI , CHIBA YUJI , KARIYA TAKAO , UDA KOJI , UZAWA SHUNICHI , KAWAKAMI EIGO
IPC: G03F7/20 , H01L21/687 , H01L21/00
Abstract: A method of controlling a conveying device having a gripping hand for gripping an article to be conveyed and a conveying mechanism for conveying the gripping hand, wherein a pressing force applied to the gripping hand through the article being conveyed is detected and the conveying operation of the conveying mechanism is stopped when the pressing force exceeds a predetermined. limit.
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公开(公告)号:DE3855083D1
公开(公告)日:1996-04-11
申请号:DE3855083
申请日:1988-11-11
Applicant: CANON KK
Inventor: MIZUSAWA NOBUTOSHI , EBINUMA RYUICHI , CHIBA YUJI
Abstract: An ink jet recording apparatus comprising: a non-contact print mode in which medium to be recorded and conveyed to a region in which printing can be performed is subjected to be recording by discharging ink in a non-contact manner from a recording head (IJH) confronting the medium to be recorded at a predetermined interval; and a contact cleaning mode in which a cleaning sheet (CP) which has been conveyed into the region in which printing can be performed by using at least a part of a conveyance route for the medium to be recorded is brought into contact with the recording head (IJH) and then the cleaning sheet is discharged from the region in which printing can be performed.
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公开(公告)号:DE3851870D1
公开(公告)日:1994-11-24
申请号:DE3851870
申请日:1988-11-11
Applicant: CANON KK
Inventor: MIZUSAWA NOBUTOSHI , EBINUMA RYUICHI , CHIBA YUJI
IPC: B41J2/165
Abstract: An ink jet recording apparatus comprising: a non-contact print mode in which medium to be recorded and conveyed to a region in which printing can be performed is subjected to be recording by discharging ink in a non-contact manner from a recording head (IJH) confronting the medium to be recorded at a predetermined interval; and a contact cleaning mode in which a cleaning sheet (CP) which has been conveyed into the region in which printing can be performed by using at least a part of a conveyance route for the medium to be recorded is brought into contact with the recording head (IJH) and then the cleaning sheet is discharged from the region in which printing can be performed.
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公开(公告)号:DE3750072T2
公开(公告)日:1994-10-27
申请号:DE3750072
申请日:1987-10-26
Applicant: CANON KK
Inventor: MIYAWAKI MAMORU , MASUDA YUKIO , ARAI RYUICHI , MIZUSAWA NOBUTOSHI , ISHIWATARI TAKAHIKO , OKUNUKI MASAHIKO
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公开(公告)号:GB2123755B
公开(公告)日:1986-06-04
申请号:GB8312885
申请日:1983-05-11
Applicant: CANON KK
Inventor: MIZUSAWA NOBUTOSHI , KOUMURA NOBORU
Abstract: A recording apparatus comprising a first ink tank mounted on a carriage, a second ink tank which remains disconnected from the first tank during recording, means for intermittently forming an ink supply path extending between the first and second ink tanks when ink is to be supplied to the first tank from the second tank, and means for maintaining constant the amount of ink within the first ink tank.
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公开(公告)号:DE68929187T2
公开(公告)日:2000-09-28
申请号:DE68929187
申请日:1989-08-31
Applicant: CANON KK
Inventor: KUROSAWA HIROSHI , AMEMIYA MITSUAKI , TERASHIMA SHIGERU , UDA KOJI , SHIMODA ISAMU , UZAWA SHUNICHI , OZAWA KUNITAKA , HARA SHINICHI , KAWAKAMI EIGO , MIZUSAWA NOBUTOSHI , MORI MAKIKO , EBINUMA RYUICHI
IPC: G03F7/20
Abstract: An exposure apparatus usable with synchrotron radiation source (201) wherein the synchrotron radiation (202,204) is generated by electron injection (210) into a ring (201). The exposure apparatus is to transfer a semiconductor element pattern of a mask (208) onto a semiconductor wafer (209) by the synchrotron radiation. The apparatus includes a shutter (207) for controlling the exposure of the wafer (209). The shutter (207) controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined (206,211,216) in response to the electron injection (210), and thereafter, the illuminance distribution is corrected (216,215,213,207) in a predetermined manner. By this, the illuminance distribution data for controlling (213,215) the shutter (207) always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer (209) are exposed with high precision.
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