公开(公告)号：US11769767B2

公开(公告)日：2023-09-26

申请号：US17704422

申请日：2022-03-25

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Souvick Mitra ,  Robert J. Gauthier, Jr. ,  Alain F. Loiseau ,  You Li ,  Tsung-Che Tsai

IPC: H01L27/02

CPC classification number: H01L27/0255 ,  H01L27/0262

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to diode triggered Silicon controlled rectifiers and methods of manufacture. The structure includes a diode string comprising a first type of diodes and a second type of diode in bulk technology in series with the diode string of the first type of diodes.

公开(公告)号：US20220320073A1

公开(公告)日：2022-10-06

申请号：US17808647

申请日：2022-06-24

Applicant: GlobalFoundries U.S. Inc.

Inventor： Robert J. Gauthier, JR. ,  Alain F. Loiseau ,  Souvick Mitra ,  Tsung-Che Tsai ,  Meng Miao ,  You Li

IPC: H01L27/02

Abstract: Embodiments of the disclosure provide an integrated circuit (IC) structure, including a triple well structure within a semiconductor substrate. A base region is within a doped well of the triple well structure, a collector terminal is within the doped well and laterally separated from the base region by a first insulator and a first avalanche junction is defined between a first pair of oppositely-doped semiconductor regions within the collector terminal. An emitter terminal is within the third doped well of the triple well structure and laterally separated from the collector terminal by a second insulator. A second avalanche junction is defined between a second pair of oppositely-doped semiconductor regions of the emitter terminal.

公开(公告)号：US11289471B2

公开(公告)日：2022-03-29

申请号：US17001009

申请日：2020-08-24

Applicant: GLOBALFOUNDRIES U.S. INC.

Inventor： You Li ,  Alain F. Loiseau ,  Souvick Mitra ,  Tsung-Che Tsai ,  Robert J. Gauthier, Jr. ,  Meng Miao

IPC: H01L29/74 ,  H01L27/02 ,  H01L29/73 ,  H01L27/06 ,  H01L27/092 ,  H01L27/088 ,  H01L29/78 ,  H01L29/06

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to an electrostatic discharge (ESD) device and methods of manufacture. The structure (ESD device) includes: a trigger collector region having fin structures of a first dopant type, a collector region having fin structures in a well of a second dopant type and further including a lateral ballasting resistance; an emitter region having a well of the second dopant type and fin structures of the first dopant type; and a base region having a well and fin structures of the second dopant type.

公开(公告)号：US11201466B2

公开(公告)日：2021-12-14

申请号：US16033731

申请日：2018-07-12

Applicant: GLOBALFOUNDRIES U.S. INC.

Inventor： You Li ,  Alain F. Loiseau ,  Souvick Mitra ,  Tsung-Che Tsai ,  Mickey Yu ,  Robert J. Gauthier, Jr.

IPC: H02H9/04 ,  H01H1/00 ,  H01L23/60 ,  H01L27/02 ,  H02H1/00

Abstract: A circuit structure includes: a network of clamps; sense elements in series with the clamps and configured to sense a turn-on of at least one clamp of the network of clamps; and feedback elements connected to the clamps to facilitate triggering of remaining clamps of the network of clamps.