Semiconductor Device and Method of Manufacturing the Same
    48.
    发明申请
    Semiconductor Device and Method of Manufacturing the Same 有权
    半导体器件及其制造方法

    公开(公告)号:US20150076591A1

    公开(公告)日:2015-03-19

    申请号:US14027683

    申请日:2013-09-16

    Abstract: A semiconductor device includes a semiconductor body having a first surface and a second surface opposite to the first surface. The semiconductor device further includes first and second trenches extending from the first surface into the semiconductor body. The semiconductor device further includes at least one lateral IGFET including a first load terminal at the first surface, a second load terminal at the first surface and a gate electrode within the first trenches. The semiconductor device further includes at least one vertical IGFET including a first load terminal at the first surface, a second load terminal at the second surface and a gate electrode within the second trenches.

    Abstract translation: 半导体器件包括具有第一表面和与第一表面相对的第二表面的半导体本体。 半导体器件还包括从第一表面延伸到半导体本体的第一和第二沟槽。 半导体器件还包括至少一个横向IGFET,其包括第一表面处的第一负载端子,第一表面处的第二负载端子和第一沟槽内的栅电极。 半导体器件还包括至少一个垂直IGFET,其包括第一表面处的第一负载端子,第二表面处的第二负载端子和第二沟槽内的栅电极。

Patent Agency Ranking