-
41.发明授权Spectral purity filter, radiation source, lithographic apparatus, and device manufacturing method 有权光谱纯度滤光片，辐射源，光刻设备和器件制造方法公开(公告)号：US09195144B2
公开(公告)日：2015-11-24
申请号：US13059057
申请日：2009-07-09
Applicant: Martin Jacobus Johan Jak , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Andrei Mikhailovich Yakunin
Inventor： Martin Jacobus Johan Jak , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Andrei Mikhailovich Yakunin
CPC classification number: G03F7/702 , G03F7/70191 , G03F7/70575 , G21K1/10
Abstract: A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.
Abstract translation: 光谱纯度滤光器被配置为允许透射通过其中的极紫外（EUV）辐射并折射或反射非EUV次级辐射。 光谱纯度滤光片可以是源模块和/或光刻设备的一部分。
-
公开(公告)号：US08390788B2
公开(公告)日：2013-03-05
申请号：US12500198
申请日：2009-07-09
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrey Mikhailovich Yakunin , Martin Jacobus Johan Jak
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrey Mikhailovich Yakunin , Martin Jacobus Johan Jak
CPC classification number: G03F7/702 , G03F7/70191 , G03F7/70575 , G21K1/10
Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.
-
公开(公告)号：US20130038926A1
公开(公告)日：2013-02-14
申请号：US13643265
申请日：2011-02-22
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
CPC classification number: G03F7/70891 , G02B5/208 , G03F7/70191 , G03F7/70575
Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.
Abstract translation: 光谱纯度滤光器包括一组材料，多个孔通过它们延伸。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。 材料体在第一波长辐射下由体积反射率基本上大于或等于70％的材料形成。 该材料的熔点高于1000℃
-
44.发明授权公开(公告)号：US08242471B2
公开(公告)日：2012-08-14
申请号：US12431423
申请日：2009-04-28
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Erik Roelof Loopstra , Maarten Marinus Johannes Wilhelmus Van Herpen
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Erik Roelof Loopstra , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC: G01J3/10
CPC classification number: G03F7/70916 , G21K2201/064 , H05G2/005
Abstract: A radiation source includes a radiation emitter configured to emit radiation, a collector configured to collect the radiation, and a contamination trap configured to trap contamination emitted by the radiation source. The contamination trap includes a plurality of foils that extend substantially radially, a first magnet ring configured to lie outside of an outer conical trajectory of radiation that is collected by the collector, and a second magnet ring configured to lie within the trajectory of radiation that is collected by the collector. The magnet rings are configured to provide a magnetic field that includes a component that is parallel to the foils.
Abstract translation: 辐射源包括被配置为发射辐射的辐射发射器，被配置为收集辐射的收集器以及被配置为捕获由辐射源发射的污染的污染阱。 污染物捕集器包括大致径向延伸的多个箔片，构造成位于由收集器收集的辐射的外锥形轨迹之外的第一磁环，以及构造成位于辐射轨迹内的第二磁环， 由收藏者收集。 磁环被配置成提供包括与箔片平行的部件的磁场。
-
公开(公告)号：US08120752B2
公开(公告)日：2012-02-21
申请号：US12466185
申请日：2009-05-14
IPC: G03B27/72
CPC classification number: G02B27/44 , G02B5/1838 , G02B5/1876 , G02B27/4244 , G02F1/061 , G03F7/70191 , G21K1/06 , G21K2201/067
Abstract: A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.
Abstract translation: 区域板包括多个连续布置的，相邻的和交替的第一和第二区域。 第一区域被布置成对于辐射的第一预定波长和不同于第一预定波长辐射的第二预定波长的辐射基本上是透明的。 第二区域被布置为基本上不透明，衍射或反射到第一预定波长的辐射并且对第二预定波长的辐射基本透明。
-
Patent Agency Ranking
46.发明申请公开(公告)号：US20110164237A1
公开(公告)日：2011-07-07
申请号：US13119895
申请日：2009-08-26
Applicant: Wouter Anthon Soer , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak , Denny Mathew , Hendrik Jan Kettelarij , Fredericus Christiaan Van Den Heuvel , Elizabeth Maria Kuijpers
Inventor： Wouter Anthon Soer , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak , Denny Mathew , Hendrik Jan Kettelarij , Fredericus Christiaan Van Den Heuvel , Elizabeth Maria Kuijpers
CPC classification number: G03F7/7095 , B82Y10/00 , G02B5/208 , G03F7/70191 , G03F7/70575 , G21K1/10 , G21K2201/061
Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture has been manufactured by an anisotropic etching process.
Abstract translation: 透射光谱纯度滤光器被配置为透射极紫外辐射。 光谱纯度滤光器包括具有多个孔的滤光器部分，其被配置为透射极紫外辐射并抑制第二类型辐射的透射。 每个孔径均通过各向异性蚀刻工艺制造。
-
公开(公告)号：US20110149262A1
公开(公告)日：2011-06-23
申请号：US13060581
申请日：2009-07-29
CPC classification number: G03F7/70958 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G21K1/062
Abstract: A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate. The anti-reflective coating is configured to transmit infrared radiation. The filter also includes a multi-layer stack configured to reflect extreme ultraviolet radiation and to substantially transmit infrared radiation.
Abstract translation: 光谱纯度滤光器被配置为反射极紫外辐射。 光谱纯度滤光器包括基板和在基板顶表面上的抗反射涂层。 抗反射涂层被配置为透射红外辐射。 该滤波器还包括配置成反射极紫外辐射并基本上透射红外辐射的多层叠层。
-
48.发明申请公开(公告)号：US20110134405A1
公开(公告)日：2011-06-09
申请号：US12809427
申请日：2008-12-19
Applicant: Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
Inventor： Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
Abstract: A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to a fuel release area that is associated with the first electrode and the second electrode, and a fuel release configured to induce release of fuel, supplied by the fuel supply, from the fuel release area. The fuel release area is spaced-apart from the first electrode and from the second electrode.
Abstract translation: 辐射源被配置成产生辐射。 辐射源包括第一电极和第二电极，其被配置为在使用期间产生放电以从等离子体燃料产生辐射发射等离子体。 辐射源还包括配置成将等离子体燃料供应到与第一电极和第二电极相关联的燃料释放区域的燃料供应，以及燃料释放装置，其被配置为引起由燃料供应源供应的燃料的释放 燃油释放区。 燃料释放区域与第一电极和第二电极间隔开。
-
49.发明申请OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS INCLUDING SUCH AN OPTICAL ELEMENT, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY 有权光学元件，包括这种光学元件的光刻设备，器件制造方法及其制造的器件公开(公告)号：US20110019174A1
公开(公告)日：2011-01-27
申请号：US12919741
申请日：2009-02-24
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin
CPC classification number: G02B5/208 , B82Y10/00 , G02B5/0891 , G02B5/22 , G02B5/26 , G03F7/70191 , G03F7/702 , G03F7/70575 , G03F7/70958 , G21K1/067 , G21K2201/061 , G21K2201/064 , G21K2201/065 , G21K2201/067
Abstract: An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.
Abstract translation: 光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面 第二层面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。
-
公开(公告)号：US20110007292A1
公开(公告)日：2011-01-13
申请号：US12920417
申请日：2009-03-03
CPC classification number: G03F7/70958 , G03F7/70033 , G03F7/70916 , G03F7/70983
Abstract: A lithographic apparatus includes a plasma source that includes a vessel configured to enclose a plasma formation site, an optical device configured to transfer optical radiation to or from the vessel, and a reflector arranged in an optical path between the optical device and the plasma formation site source. The reflector is configured to reflect the optical radiation between the optical device and the plasma formation site. The reflector is formed, in operation, as a molten metal mirror.
Abstract translation: 光刻设备包括等离子体源，其包括构造成包围等离子体形成位置的容器，被配置为向容器转移光辐射的光学器件和布置在光学器件与等离子体形成部位之间的光路中的反射器 资源。 反射器被配置为反射光学装置和等离子体形成部位之间的光辐射。 反射器在操作中形成为熔融金属镜。
-
-
-
-
-
-
-
-
-
Search Results
77
records
(took 0.039 seconds)
