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公开(公告)号：WO2010061378A3
公开(公告)日：2010-11-18
申请号：PCT/IL2009001026
申请日：2009-11-03
Applicant: YEDA RES & DEV , NAAMAN RON , BARDEA AMOS , YOFFE ALEXANDER
Inventor： NAAMAN RON , BARDEA AMOS , YOFFE ALEXANDER
IPC: B81C1/00
CPC classification number: C12M23/06 , B81C1/00031 , B81C2201/0154 , B81C2201/0198 , C12M27/00 , H01F41/16
Abstract: The present invention relates to a method and apparatus for patterning a substrate. The method comprises providing at least one magnetic pattern generator (100b) configured and operable to modulate the magnetic field to induce varying magnetic properties to a magnetic field according to a desired pattern; applying the modulated magnetic field in the vicinity of the substrate (102) creating a certain pattern of regions of interaction to be obtained on top of the substrate; and; interacting the substrate with magnetic particles (106), while under the application of the modulated magnetic field, the magnetic particles being attracted to selected regions of interaction defined by the certain pattern while being substantially not attracted to regions outside the regions of interaction, thus creating on top of the substrate the certain pattern of regions interacted with the magnetic particles. The desired pattern corresponds to a certain pattern for a predetermined magnetic field profile and at a predetermined distance from the magnetic pattern generator, where the sample is to be located.
Abstract translation: 本发明涉及一种用于图案化衬底的方法和装置。 该方法包括提供至少一个磁性图案发生器（100b），其配置并可操作以根据期望的图案调制磁场以对磁场产生变化的磁性; 在所述基板（102）附近施加所述调制磁场，从而产生将在所述基板的顶部上获得的相互作用区域的特定图案; 和; 在使用调制磁场的同时，将衬底与磁性颗粒（106）相互作用，磁性颗粒被吸引到由特定图案限定的相互选择的相互作用区域，同时基本上不被吸引到相互作用区域之外的区域，从而产生 在衬底的顶部，某些区域与磁性颗粒相互作用。 期望的图案对应于预定磁场分布的特定图案，并且距离磁图案发生器预定距离处，其中样本将被定位。
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公开(公告)号：WO2010057031A1
公开(公告)日：2010-05-20
申请号：PCT/US2009/064448
申请日：2009-11-13
Applicant: SEAGATE TECHNOLOGY, LLC , LEE, Kim, Yang , KUO, David, S. , BUECHEL, Dorothea , PELHOS, Kalman
Inventor： LEE, Kim, Yang , KUO, David, S. , BUECHEL, Dorothea , PELHOS, Kalman
CPC classification number: G11B5/855 , B81C1/00111 , B81C2201/0154 , B81C2201/038 , Y10T428/2457 , Y10T428/26
Abstract: Methods comprising providing a pre-patterned substrate having an array of thick walls, depositing a conforming layer on the pre-patterned substrate, etching the conforming layer from the top of the thick walls and the space between the walls, and etching the thick walls while leaving thin walls of conforming layer.
Abstract translation: 方法包括提供具有厚壁阵列的预图案化衬底，在预图案化衬底上沉积合适层，从厚壁的顶部和壁之间的空间蚀刻适形层，并蚀刻厚壁，同时 留下薄壁的合格层。
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公开(公告)号：JP5523469B2
公开(公告)日：2014-06-18
申请号：JP2011536532
申请日：2009-11-13
Applicant: シーゲイト テクノロジー エルエルシー
Inventor： リー，キム・ヤン , クオ，デイビッド・エス , ビューヒェル，ドロシア , ペリョス，カルマン
CPC classification number: G11B5/855 , B81C1/00111 , B81C2201/0154 , B81C2201/038 , Y10T428/2457 , Y10T428/26
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公开(公告)号：JP2008034843A
公开(公告)日：2008-02-14
申请号：JP2007183637
申请日：2007-07-12
Applicant: Centre Natl De La Recherche Scientifique , Commiss Energ Atom , Univ Jean Monnet , コミツサリア タ レネルジー アトミーク , セントレ・ナショナル・デ・ラ・レシェルシェ・サイエンティフィーク , ユニヴェルシテ・ジャン・モネ
Inventor： FOURNEL FRANK , MEZIERE JEROME , BAVARD ALEXIS , PIGEON FLORENT , GARRELIE FLORENCE
CPC classification number: B81C1/00634 , B81B2203/033 , B81C2201/0154 , H01L21/221 , H01L21/26506 , H01L21/268
Abstract: PROBLEM TO BE SOLVED: To provide a method capable of accurately obtaining a periodic network of structural pattern on the surface of a substrate. SOLUTION: The invention relates to the method for manufacturing a periodic nano structure on one surface of the substrate (10) that exhibits the periodic network of displacement incorporated into a crystalline region (4) located in the vicinity of an interface (5) between the crystalline material surfaces of the assembled two members (1, 2) by the bonding for forming the substrate (10). It further includes: a step for forming an implant (6) made from a material other than the crystalline region (4) at the displacement (3); and a step for radiating electromagnetic waves (11) to the substrate (10) to cause an electromagnetic energy localized at the implant (6) to be absorbed for causing this absorption to result in the periodic nano structure (12) on the surface of the substrate (10). COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供能够精确地获得基板表面上的结构图案的周期性网络的方法。 解决方案：本发明涉及在衬底（10）的一个表面上制造周期性纳米结构的方法，该方法表现出位于界面附近的结晶区域（4）中的位移周期性网络（5） ）通过用于形成衬底（10）的接合而在组装的两个构件（1,2）的结晶材料表面之间。 其还包括：在位移（3）处形成由除结晶区域（4）之外的材料制成的植入物（6）的步骤; 以及用于向基板（10）辐射电磁波（11）以使定位在植入物（6）处的电磁能量被吸收的步骤，用于使该吸收在周边纳米结构（12）的表面上产生周期性纳米结构 基板（10）。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：KR1020110091863A
公开(公告)日：2011-08-16
申请号：KR1020117012529
申请日：2009-11-03
Applicant: 예다 리서치 앤드 디벨럽먼트 캄파니 리미티드
IPC: B81C1/00 , H01L21/027
CPC classification number: C12M23/06 , B81C1/00031 , B81C2201/0154 , B81C2201/0198 , C12M27/00 , H01F41/16 , C12M1/34 , H01L21/0274
Abstract: 본 발명은 기판을 패터닝하기 위한 방법 및 장치에 관련된다. 상기 방법은, 목적 패턴에 따라 변화하는 자성 특성들을 자기장에 유도하기 위해 자기장을 조정하도록 구성되고 조작 가능한 적어도 하나의 자기 패턴 발생기(100b)를 제공하는 단계; 기판(102)의 부근에 조정된 자기장을 가하여, 기판의 상부에 얻어지는 상호작용의 영역들의 특정 패턴을 형성하는 단계; 및 조정된 자기장의 적용 하에서, 기판이 자성 입자들(106)과 상호작용하는 단계를 포함하고, 자성 입자들은 특정 패턴에 의해 정의된 선택된 상호작용의 영역들에 유인되고, 상호작용의 영역들 외측의 영역들에는 실질적으로 유인되지 않으며, 따라서 자성 입자들과 상호작용하는 특정 패턴의 영역들을 기판의 상부에 형성한다. 목적 패턴은 소정 자기장 프로파일에 대해, 샘플이 위치하게 되는 자기 패턴 발생기로부터 소정 거리에서, 특정 패턴에 대응한다.
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Patent Agency Ranking
46.发明申请公开(公告)号：US20180194616A1
公开(公告)日：2018-07-12
申请号：US15743326
申请日：2016-05-24
Applicant: Robert Bosch GmbH
Inventor： Joerg Muchow , Rainer Straub , Stefan Pinter
CPC classification number: B81C1/00103 , B81B7/0058 , B81B2201/042 , B81B2203/0384 , B81C1/00317 , B81C2201/0133 , B81C2201/0143 , B81C2201/0154 , B81C2203/0136 , G02B1/14 , G02B26/0833
Abstract: A manufacturing method for a micromechanical window structure including the steps: providing a substrate, the substrate having a front side and a rear side; forming a first recess on the front side; forming a coating on the front side and on the first recess; and forming a second recess on the rear side, so that the coating is at least partially exposed, whereby a window is formed by the exposed area of the coatings.
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公开(公告)号：US10017383B2
公开(公告)日：2018-07-10
申请号：US14883825
申请日：2015-10-15
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Stephen E. Luce , Anthony K. Stamper
CPC classification number: B81C1/00698 , B81C1/0015 , B81C1/00166 , B81C1/00523 , B81C2201/0132 , B81C2201/0133 , B81C2201/0145 , B81C2201/0154 , B81C2203/0145 , H01H1/0036 , H01H1/58 , H01H11/00 , H01H49/00 , H01H59/00 , H01H59/0009 , H01H2059/0018 , Y10T29/49105
Abstract: An approach includes a method of fabricating a switch. The approach includes forming a fixed electrode, forming a first cantilevered electrode, forming a second cantilevered electrode aligned vertically over the first fixed electrode, and which has an end that overlaps and is operable to directly contact an end of the first cantilevered electrode upon an application of a voltage to the fixed electrode, and forming a hermetically sealed volume encapsulating the first fixed electrode, the second fixed electrode, the first cantilevered electrode, and the second cantilevered electrode.
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公开(公告)号：US09944518B2
公开(公告)日：2018-04-17
申请号：US14883843
申请日：2015-10-15
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Stephen E. Luce , Anthony K. Stamper
CPC classification number: B81C1/00698 , B81C1/0015 , B81C1/00166 , B81C1/00523 , B81C2201/0132 , B81C2201/0133 , B81C2201/0145 , B81C2201/0154 , B81C2203/0145 , H01H1/0036 , H01H1/58 , H01H11/00 , H01H49/00 , H01H59/00 , H01H59/0009 , H01H2059/0018 , Y10T29/49105
Abstract: An approach includes a method of fabricating a switch. The approach includes forming a first fixed electrode and a second fixed electrode, forming a first cantilevered electrode aligned vertically over the first fixed electrode, forming a second cantilevered electrode aligned vertically over the first fixed electrode and which has an end that overlaps the first cantilevered electrode, forming a third cantilevered electrode aligned vertically over the second fixed electrode and operable to directly contact the first cantilevered electrode upon an application of a voltage to the second fixed electrode, and forming a hermetically sealed volume encapsulating the first fixed electrode, the second fixed electrode, the first cantilevered electrode, and the second cantilevered electrode.
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公开(公告)号：US20180016138A1
公开(公告)日：2018-01-18
申请号：US15717234
申请日：2017-09-27
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Stephen E. LUCE , Anthony K. STAMPER
CPC classification number: B81C1/00698 , B81C1/0015 , B81C1/00166 , B81C1/00523 , B81C2201/0132 , B81C2201/0133 , B81C2201/0145 , B81C2201/0154 , B81C2203/0145 , H01H1/0036 , H01H1/58 , H01H11/00 , H01H49/00 , H01H59/00 , H01H59/0009 , H01H2059/0018 , Y10T29/49105
Abstract: An approach includes a method of fabricating a switch. The approach includes forming a first cantilevered electrode operable to directly contact a second fixed electrode upon an application of a voltage to a first fixed electrode, forming a second cantilevered electrode with an end that overlaps the first cantilevered electrode, and forming a hermetically sealed volume encapsulating the first fixed electrode, the second fixed electrode, the first cantilevered electrode, and the second cantilevered electrode.
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公开(公告)号：US09718681B2
公开(公告)日：2017-08-01
申请号：US15012314
申请日：2016-02-01
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Stephen E. Luce , Anthony K. Stamper
CPC classification number: B81C1/00698 , B81C1/0015 , B81C1/00166 , B81C1/00523 , B81C2201/0132 , B81C2201/0133 , B81C2201/0145 , B81C2201/0154 , B81C2203/0145 , H01H1/0036 , H01H1/58 , H01H11/00 , H01H49/00 , H01H59/00 , H01H59/0009 , H01H2059/0018 , Y10T29/49105
Abstract: MEMS switches and methods of manufacturing MEMS switches is provided. The MEMS switch having at least two cantilevered electrodes having ends which overlap and which are structured and operable to contact one another upon an application of a voltage by at least one fixed electrode.
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