公开(公告)号：GB2203890A

公开(公告)日：1988-10-26

申请号：GB8806913

申请日：1988-03-23

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J3/08

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：DE3624770A1

公开(公告)日：1987-01-29

申请号：DE3624770

申请日：1986-07-22

Applicant: RADIATION DYNAMICS

Inventor： MALONE HOWARD F

IPC: H05H5/02 ,  H01J3/08 ,  H01J37/06 ,  H01J37/248 ,  H02M3/28 ,  H05G1/34

公开(公告)号：ZA861238B

公开(公告)日：1986-10-29

申请号：ZA861238

申请日：1986-02-19

Applicant: COCA COLA CO

Inventor： CREDLE WILLIAM S JR

IPC: B67D7/58 ,  F01B20060101 ,  F03H1/00 ,  F04B9/12 ,  F04B43/06 ,  H01J3/08 ,  H01J27/02 ,  B67D ,  F01B

公开(公告)号：FR2487116B1

公开(公告)日：1985-04-12

申请号：FR8114087

申请日：1981-07-20

Applicant: RCA CORP

IPC: H04N5/68 ,  G09G1/20 ,  G09G3/30 ,  H04N3/12 ,  H01J17/49 ,  H01J3/08

公开(公告)号：DE2644688C2

公开(公告)日：1983-08-25

申请号：DE2644688

申请日：1976-10-02

Applicant: INTERNATIONAL BUSINESS MACHINES CORP., 10504 ARMONK, N.Y., US

Inventor： KO, WEN-CHUANG, WAPPINGERS FALLS, N.Y., US ,  SAWATZKY, ERICH, SAN JOSE, CALIF., US

IPC: G01R19/08 ,  G01Q30/02 ,  G01R31/302 ,  G01T1/29 ,  G21K5/04 ,  H01J37/04 ,  H01J37/244 ,  H01J37/317 ,  H01L21/265 ,  H01J3/08

公开(公告)号：FR2492586B1

公开(公告)日：1983-01-21

申请号：FR8022381

申请日：1980-10-20

Applicant: V ELEKTROTEKHNICHESKY

IPC: H01J3/02 ,  H01J3/08

公开(公告)号：FR2492586A1

公开(公告)日：1982-04-23

申请号：FR8022381

申请日：1980-10-20

Applicant: V ELEKTROTEKHNICHESKY

Inventor： UDRIS YAN YANOVICH ,  CHERNOV VLADLEN ALEXANDROVICH

IPC: H01J3/02 ,  H01J3/08

Abstract: Control method for a gas discharge electron gun which uses constant control of the electron stream. The potential difference between the incident plate (4) and the anode (7) is altered using a magnetic field. The efficiency and performance of the control makes it more effective for various gas pressures around the gun and incident plate. The gas discharge electron gun (1) for a high voltage thermonic discharge has a channel (2) to direct the electron stream (3) onto the incident plate (4). The anode (7) is insulated from the incident plate (4) and is the potential determined by an independent voltage source (9) connected between the two. An electromagnetic coil (5) is coaxially located around the anode (7).

公开(公告)号：FR2365203B1

公开(公告)日：1979-01-12

申请号：FR7628313

申请日：1976-09-21

Applicant: INST VYSOKIKH TEMPERATUR AKADE

IPC: H01J1/46 ,  H01J3/00 ,  H01J3/08

公开(公告)号：DE2748322A1

公开(公告)日：1978-05-11

申请号：DE2748322

申请日：1977-10-27

Applicant: RCA CORP

Inventor： GANGE ROBERT ALLEN

IPC: H01J31/12 ,  H01J1/20 ,  H01J3/08 ,  H01J29/04 ,  H01J29/52

公开(公告)号：NL7711885A

公开(公告)日：1978-05-03

申请号：NL7711885

申请日：1977-10-28

Applicant: RCA CORP

IPC: H01J31/12 ,  H01J1/20 ,  H01J3/08 ,  H01J29/04 ,  H01J29/52 ,  H01J1/28