公开(公告)号：EP2550563A1

公开(公告)日：2013-01-30

申请号：EP11701685.7

申请日：2011-02-03

Applicant: ASML Netherlands B.V.

Inventor： MEDVEDEV, Viacheslav ,  BANINE, Vadim ,  KRIVTSUN, Vladimir ,  SOER, Wouter ,  YAKUNIN, Andrei

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70575 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061

Abstract: A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second wavelength of the multi layer mirror structure and the one or more additional layers, and the thickness of the multi layer mirror structure and the one or more additional layers, are configured such that radiation of the second wavelength which is reflected from a surface of the reflector interferes in a destructive manner with radiation of the second wavelength which is reflected from within the reflector.

公开(公告)号：EP3049870B1

公开(公告)日：2019-05-15

申请号：EP14777038.2

申请日：2014-09-24

Applicant: ASML Netherlands B.V.

Inventor： BANINE, Vadim ,  BARTRAIJ, Petrus ,  VAN GORKOM, Ramon ,  AMENT, Lucas ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  DONKER, Rilpho ,  ENGELEN, Wouter ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  NIENHUYS, Han-Kwang ,  NIKIPELOV, Andrey ,  RENKENS, Michael ,  JANSSEN, Franciscus ,  KRUIZINGA, Borgert

IPC: G03F7/20 ,  G03F1/84 ,  G02B27/00 ,  G02B5/18 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  H01S3/09 ,  H05H7/04 ,  G01N21/956 ,  G02B27/09 ,  G21K1/06

公开(公告)号：EP2678743B1

公开(公告)日：2018-07-04

申请号：EP12702451.1

申请日：2012-01-18

Applicant: ASML Netherlands B.V.

Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  FRIJNS, Olav

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08

CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70058 ,  G21K1/062 ,  G21K2201/061

Abstract: A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.

公开(公告)号：EP2545413A1

公开(公告)日：2013-01-16

申请号：EP11704558.3

申请日：2011-01-31

Applicant: ASML Netherlands B.V.

Inventor： LABETSKI, Dzmitry ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  YAKUNIN, Andrei

IPC: G03F7/20 ,  G02B5/00 ,  G21K1/08

CPC classification number: H05G2/008 ,  G02B5/00 ,  G02B19/00 ,  G02B19/0023 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003

Abstract: A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.