-
公开(公告)号:DE1643670A1
公开(公告)日:1971-07-01
申请号:DE1643670
申请日:1967-10-05
Applicant: BASF AG
Inventor: PLATZ ROLF DR , MERGER FRANZ DR
IPC: C07C69/82
-
公开(公告)号:DE1957301A1
公开(公告)日:1971-05-19
申请号:DE1957301
申请日:1969-11-14
Applicant: BASF AG
Inventor: MERGER FRANZ DR , PLATZ ROLF DR , FUCHS WERNER DR
-
53.
公开(公告)号:DE1950603A1
公开(公告)日:1971-04-15
申请号:DE1950603
申请日:1969-10-08
Applicant: BASF AG
Inventor: FRIZ HANS DR , STECHL HANNS-HELGE DR , PLATZ ROLF DR
Abstract: Continuous removal of S-containing anions from alkaline solutions used washing gases Sulphite, sulphate, thiosulphate and thiocyanate anions are removed from alkaline solution used for removing H2S or COS from gas mixture or CO2 from S-containing gases by passing the spent alkaline solution through an anion exchanger. This process is much more convenient than the usual distillation under vacuum; it is esp. suitable for the regeneration of alkanolamine solution, or N-methylpyrrolidone.
-
公开(公告)号:CH475538A
公开(公告)日:1969-07-15
申请号:CH1264267
申请日:1967-09-11
Applicant: BASF AG
Inventor: HAUSDOERFER BERTHOLD DR , PLATZ ROLF DR
-
公开(公告)号:AT271425B
公开(公告)日:1969-06-10
申请号:AT877066
申请日:1966-09-16
Applicant: BASF AG
Inventor: DOCKNER TONI DR , PLATZ ROLF DR , HERRMANN GUENTER DR , MINSINGER MANFRED DR , DREHER ERICH DR
IPC: C07C20060101
-
公开(公告)号:DE3360152D1
公开(公告)日:1985-06-05
申请号:DE3360152
申请日:1983-02-14
Applicant: BASF AG
Inventor: PLATZ ROLF DR , GATH RUDOLPH HANS DR , PETERSEN HARRO DR
IPC: B01J23/86 , C07C233/00 , C07C102/10 , C07C103/133
-
公开(公告)号:DE3161030D1
公开(公告)日:1983-11-03
申请号:DE3161030
申请日:1981-07-13
Applicant: BASF AG
Inventor: RIEBER NORBERT DR , BOEHM HEINRICH DR , PLATZ ROLF DR , FUCHS WERNER DR
IPC: C07D231/10 , C07D231/12 , C07D261/08
Abstract: 1-Hydroxypyrazole and a process for its preparation by conversion of isoxazolineazoxy compounds at 140 DEG -600 DEG C. The end products obtainable by the process of the invention are valuable starting materials for the preparation of dyes, crop protection agents and drugs.
-
58.
公开(公告)号:DE3060081D1
公开(公告)日:1982-01-28
申请号:DE3060081
申请日:1980-01-02
Applicant: BASF AG
Inventor: PLATZ ROLF DR , HARTIG JUERGEN DR , WEITZ HANS-MARTIN DR
-
公开(公告)号:DE2861293D1
公开(公告)日:1982-01-14
申请号:DE2861293
申请日:1978-11-08
Applicant: BASF AG
Inventor: PLATZ ROLF DR , DOCKNER TONI DR , HENERS JUERGEN DR , HERBERT KRUG
IPC: C07B61/00 , B01J23/00 , B01J23/72 , C07C67/00 , C07C231/00 , C07C231/06 , C07C231/08 , C07C233/09 , C07C102/08 , C07C103/133
-
公开(公告)号:CH605497A5
公开(公告)日:1978-09-29
申请号:CH1610473
申请日:1973-11-15
Applicant: BASF AG
Inventor: EILINGSFELD HEINZ DR , BAUR KARL GERHARD DR , PATSCH MANFRED DR , PLATZ ROLF DR , SCHECKER HANS-GEORG DR , FISCHER MARTIN DR
IPC: C07C25/18 , B01J27/00 , B01J31/00 , C07B61/00 , C07C17/00 , C07C17/26 , C07C17/281 , C07C25/22 , C07C67/00 , C07C23/34
Abstract: 1440669 Substituted phenylindans BASF AG 16 Nov 1973 [18 Nov 1972 1 June 1973 30 May 1973] 53220/73 Heading C2C The invention comprises 1-methyl-3-(monohalogeno)-phenyl indans of the general Formula I in which R 1 , R 2 and R 3 are identical or different and each is alkyl or hydrogen and R 4 is halogen also dihalogeno-1-methyl-3-phenylindans of the general Formula II in which R 1 and R 2 are identical or different and each is alkyl or hydrogen and R 4 is a halogen substituent in the m- or p-position of the phenyl ring and in the 4-, 5- or 6-position of the indan nucleus, provided that when both radicals R 1 are methyl and one radical R 2 is hydrogen the other radical R 2 is alkyl. The compounds of Formula I may be prepared by reacting a mixture of styrene of the general Formula III and of halogenostyrene of the general Formula IV in which R 1 to R 4 have the above meanings, in the presence of phosphoric acid of at least 75% strength by weight and optionally, additionally to the acid, in the presence of an organic compound irradiated with light of 2000 to 8000 Š and capable of absorbing the said light. The compounds of Formula II in which R 1 and R 3 are identical or different and each is alkyl or hydrogen and R 4 is halogen may be obtained by reacting one or more halogeno styrenes of the general Formula IV as sole starting material(s) in the presence of phosphoric acid of at least 75% strength by weight and, additionally to the acid, in the presence of an organic compound irradiated with light of 2000 to 8000 Š and capable of absorbing the said light.
-
-
-
-
-
-
-
-
-