60.
    发明专利
    未知

    公开(公告)号:CH605497A5

    公开(公告)日:1978-09-29

    申请号:CH1610473

    申请日:1973-11-15

    Applicant: BASF AG

    Abstract: 1440669 Substituted phenylindans BASF AG 16 Nov 1973 [18 Nov 1972 1 June 1973 30 May 1973] 53220/73 Heading C2C The invention comprises 1-methyl-3-(monohalogeno)-phenyl indans of the general Formula I in which R 1 , R 2 and R 3 are identical or different and each is alkyl or hydrogen and R 4 is halogen also dihalogeno-1-methyl-3-phenylindans of the general Formula II in which R 1 and R 2 are identical or different and each is alkyl or hydrogen and R 4 is a halogen substituent in the m- or p-position of the phenyl ring and in the 4-, 5- or 6-position of the indan nucleus, provided that when both radicals R 1 are methyl and one radical R 2 is hydrogen the other radical R 2 is alkyl. The compounds of Formula I may be prepared by reacting a mixture of styrene of the general Formula III and of halogenostyrene of the general Formula IV in which R 1 to R 4 have the above meanings, in the presence of phosphoric acid of at least 75% strength by weight and optionally, additionally to the acid, in the presence of an organic compound irradiated with light of 2000 to 8000 Š and capable of absorbing the said light. The compounds of Formula II in which R 1 and R 3 are identical or different and each is alkyl or hydrogen and R 4 is halogen may be obtained by reacting one or more halogeno styrenes of the general Formula IV as sole starting material(s) in the presence of phosphoric acid of at least 75% strength by weight and, additionally to the acid, in the presence of an organic compound irradiated with light of 2000 to 8000 Š and capable of absorbing the said light.

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