公开(公告)号：JPH04147151A

公开(公告)日：1992-05-20

申请号：JP27077990

申请日：1990-10-09

Applicant: CANON KK

Inventor： MATSUTANI SHIGEKI

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To attain the high precision of the relative aligning of a reticle and a wafer by arranging linear marks composed of plural light transmitting parts and shielding parts in parallel with an aligning direction in a pitch that reflected light from the top and bottom surfaces of an alignment pattern on the surface of an object is separated, in fine patterns. CONSTITUTION:The fine patterns P have such constitution that the linear marks composed of plural light transmitting parts and shielding parts are arranged at a constant pitch, in parallel with a position detecting direction (X-direction). At this time, the pitch is set so that optical information based on the reflected light from the top and bottom surfaces of a three-dimensional structure alignment patterns Wa on the wafer, can be separated. In other words, the pitch is set in a degree that the brightness and darkness of the alignment pattern on a wafer surface can be detected with excellent precision via the fine patterns P when the wafer is changed in the optical axial direction of a projecting optical system 12. Thus, the relative positioning of the reticle and the wafer is carried out with the high precision.

公开(公告)号：JP2000251081A

公开(公告)日：2000-09-14

申请号：JP5204899

申请日：1999-02-26

Applicant: CANON KK

Inventor： MATSUTANI SHIGEKI

IPC: G06T1/00 ,  G06T7/60

Abstract: PROBLEM TO BE SOLVED: To obtain inner point decision algorithm which does not require a large calculation quantity and to decide an inner point in a short time by deciding whether a regarding point is present in a polygonal graphic formed of vertexes. SOLUTION: Inner points of a polygon A and the convex polygons B1, B2,..., BM constituting it divisionally are decided. After an inner point decision on a point P is made as to the convex polygon B1, it is evident that the point P is an inner point of the polygon A on condition that the point P is an inner point of the convex polygon B1, and the calculation is finished. When the point P is not an inner point of the convex polygon B1, an inner point decision based upon similar algorithm is made for the next convex polygon B2. When it is decided that the point P is an inner point of the convex polygon B2, it is decided that the point P is an inner point of the polygon A. When not, an inner point decision based upon improved algorithm is made for the next convex polygon B3. When it is decided that the point P is an inner point of none of all the convex polygons, it is judged that the point P is outside the polygon A.

公开(公告)号：JPH11328150A

公开(公告)日：1999-11-30

申请号：JP13397898

申请日：1998-05-15

Applicant: CANON KK

Inventor： ASAI AKIRA ,  MATSUTANI SHIGEKI ,  OKUDA MASAHIRO

IPC: G06F17/00 ,  G06F19/00

Abstract: PROBLEM TO BE SOLVED: To quickly and accurately analyze a modeled survival system by calculating a survival rate in the distance of an object to be solved in the survival system by a specified condition in an arithmetic means. SOLUTION: A CPU 21 stores the values of a replenishment success rate βand an advancing distance X from the keyboard 23 of this survival system analyzer at a RAM 25, calculates the respective terms of the total sum Σ from L=0 to by expressions I and II based on the stored values of the replenishment success rate βand the advancing distance X, and stores the calculated results of the respective terms for L=0 to in the RAM 25. Then, the total sum Σ of the stored calculated results of the respective terms is calculated by executing a total sum calculation module, the calculated total sum Σ is substituted in the expression III and the survival rate P(XS) is obtained. In the expressions I and III, is a maximum integer not exceeding X, and θis a step function.

公开(公告)号：JPH11110569A

公开(公告)日：1999-04-23

申请号：JP28113797

申请日：1997-09-30

Applicant: CANON KK

Inventor： ASAI AKIRA ,  MATSUTANI SHIGEKI ,  NODA TOMOYUKI

IPC: G06T7/60

Abstract: PROBLEM TO BE SOLVED: To discriminate the inner point of a graphic in a short time by checking whether or not all the outer products of two vectors whose terminating point is successive two points of the sequenced vertexes of a projected polygon and starting point is the point P are the same sign and discriminating whether or not the point P is present inside the projected polygon when the polygon is the projected polygon. SOLUTION: Whether or not all the outer products of the two vectors corresponding to two sides holding the polygon formed by the set of the directed vertexes on a plane and the sequenced vertexes of the polygon to the point P on the plane there between are of the same sign is checked, and whether or not the polygon is the projected polygon is discriminated. Then, when it is the projected polygon occording to the discrimination, whether or not all the outer products of the two vectors whose terminating point is successive two points of the sequenced vertexes of the projected polygon and starting point is a point P on the plane are of the same sign is checked, and whether or not the point P on the plane is present inside the projected polygon is discriminated. Thus, calculation force required for discriminating the inner point of the graphic is reduced and the inner point of the graphics is discriminated in a short time.

公开(公告)号：JPH0831315A

公开(公告)日：1996-02-02

申请号：JP18516394

申请日：1994-07-15

Applicant: CANON KK

Inventor： MATSUTANI SHIGEKI ,  OKUDA MASAHIRO

IPC: H01J9/02 ,  H01J1/30 ,  H01J31/12 ,  H01J31/15

Abstract: PURPOSE:To reduce dispersion in the electron emission characteristics of each electron emitting element of surface conduction type and also reduce dispersion in the electron emission characteristics from one to another among a number of such elements by processing and shaping the electron emission part of each element with a micro-needle. CONSTITUTION:An electron emitting element of surface conduction type is furnished with an electron emission part 2 on a conductive thin film 3 which puts in communication a pair of elementelectrodes 4, 5 furnished on a base board 1. In the manufacture of elements, the thin film 3 including the electron emission part 2 is processed with a micro-needle. In this processing, the electron emission part 2 undergoes a shaping by a probe 501 of a scanning tunneling microscope, which includes machining off the cracking part of the electron emission part, 2 so that an approx. constant crack width W1 is obtained.

公开(公告)号：JPH0765704A

公开(公告)日：1995-03-10

申请号：JP23596593

申请日：1993-08-30

Applicant: CANON KK

Inventor： SUGIOKA HIDEYUKI ,  ONISHI TOSHIICHI ,  OKUDA MASAHIRO ,  MATSUTANI SHIGEKI ,  MITOME MASANORI ,  ASAI AKIRA ,  OSADA YOSHIYUKI

IPC: H01J1/316 ,  H01J1/30 ,  H01J9/02 ,  H01J29/04 ,  H01J31/12

Abstract: PURPOSE:To provide an electron emission element, where the island structure of superfine particles is controlled by the orientation property peculiar to an organic film so as to suppress the dispersion between elements, by arranging an organic film layer containing superfine particles between a pair of electrodes. CONSTITUTION:On an insulating substrate 4, an organic film layer 1 of both mediaphilic properties, which shows peculiar self composition by the mutual action of hydrophobic and hydrophilic radicals containing superfine particles such as ribosome 202 where, for example, conductive superfine particles 201 are sealed, is arranged between element electrodes 2 and 3. For the ribosome, the size and the retention efficiency into inner water phase of sealed matter can be controlled to some degree by making method, so the dispersion between elements can be controlled by controlling the island structure of the superfine particles. After current application treatment with the voltage applied between the electrodes 2 and 3, the substrate 4 and an insulating substrate 13, where a phosphor layer 11 and a transparent electrode 12 are arranged, are confronted with each other across a sealing member 14, and the space 15 is decompressed for sealing.

公开(公告)号：JPH0574685A

公开(公告)日：1993-03-26

申请号：JP25964991

申请日：1991-09-11

Applicant: CANON KK

Inventor： MATSUTANI SHIGEKI

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To highly accurately position a reticle on a wafer by farming a fine pattern by arranging linear marks respectively composed of pluralities of light transmitting sections and light shielding sections in parallel in the positioning direction at such a pitch that reflected rays of light from the upper and lower surfaces of an alignment pattern on the surface of an object can be separated from each other. CONSTITUTION:An image pickup means is positioned to an object by projecting an alignment pattern on the surface of an object upon a prescribed surface on which fine patterns P1 and P2 are provided by means of a projecting optical system 12 and forming the images of both patterns on the plane of an image pickup means by means of a detecting optical system 19. The alignment patterns have a relief-like three-dimensional structure and the fine patterns P1 and P2 are arranged by a plurality of numbers in the direction of the optical axis of the optical system 19. In addition, the patterns P1 and P2 are formed by arranging pluralities of light transmitting sections and light shielding sections in parallel in the positioning direction at such a pitch that reflected rays of light from the upper and lower surfaces of the alignment pattern on the surface of the object can be separated from each other.

公开(公告)号：JPH04303912A

公开(公告)日：1992-10-27

申请号：JP9361991

申请日：1991-03-29

Applicant: CANON KK

Inventor： MATSUTANI SHIGEKI

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To relatively align a reticle with a wafer with high accuracy by a method wherein a fine pattern is provided with a plurality of light-transmitting parts and light-shielding parts in parallel to an alignment direction and one part out of said light-transmitting parts is provided with a rectilinear pattern on which a phase shift film has been executed. CONSTITUTION:An electronic-circuit pattern is formed on the face of a reticle R; the reticle is support by a reticle stage R1. A fine pattern P provided with a plurality of rectilinear light-transmitting parts and light-shielding parts whose line width is sufficiently narrow is formed on the face of a transmitting object 12. Phase shift films which correspond to 1/2 of the wavelength of illuminating light are executed on every other light-transmitting part out of the plurality of light-transmitting parts. A projection optical system 11 reduction-projects the circuit pattern on the face of the reticle R onto the face of a wafer W. The fine pattern P is provided with the plurality of light-transmitting parts and light-shielding parts in parallel with a position-detecting direction; rectilinear marks in which the phase shift films have been formed on every other light- transmitting part out of the plurality of light-transmitting parts are arranged at a definite pitch.

公开(公告)号：JPH04199505A

公开(公告)日：1992-07-20

申请号：JP32542290

申请日：1990-11-29

Applicant: CANON KK

Inventor： MATSUTANI SHIGEKI

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To correct a nominal error due to resist and enable highly accurate position detection by providing an optical system and storage and image sensing devices to detect a relative direction of a wafer and a mask and by controlling the position. CONSTITUTION:A relief-like mark M is formed on a wafer W, and a grating pattern G1 drawn with constant intervals in parallel to an axial direction whose position is to be detected is provided between a light source 18 and the wafer mark M. After one of the marks is aligned, its mark image is stored in a storage device 118. Then a stage 10 is driven and the pattern is aligned with a new mark image for another mark on the wafer W, and then the mark image is sensed by an image sensing device 114. Then the picked mark image and the mark image stored in the storage device 118 are used to identify an application state of resist applied on the wafer W, and based on the identification result, a nominal error of the mark due to the resist is corrected. Thus a nominal mark image due to the resist on the wafer mark M is corrected to realize highly accurate alignment.

公开(公告)号：JPH04186717A

公开(公告)日：1992-07-03

申请号：JP31684590

申请日：1990-11-20

Applicant: CANON KK

Inventor： MATSUTANI SHIGEKI

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To correct an adjustable amount based on an uneven shape of a resist surface caused by a wafer mark, remove unnecessary noise light and enable highly accurate alignment between a wafer and an exposure device body by utilizing position information from a plurality of wafer marks having different line widths formed on a wafer surface. CONSTITUTION:A plurality of alignment marks Wa1 to Wa3 having different line widths W1 to W3 are formed on a wafer W surface, while resist is further applied on them and a recording means is provided where a relational expression between the line widths of the alignment marks Wa1 to Wa3 and an amount of shift of position measurement due to a change in a incident position of a light flux to an image sensing means 110 caused by an uneven shape of the resist surface is recorded. Images of the alignment marks Wa1 to Wa3 are formed on the image sensing means 110, position information of these images and the recorded relational expression are used to calculate difference in position caused by the unevenness of a resist lighting, and the difference is referred to so as to perform relative alignment of the wafer W and the image sensing means 110.