Novel tissue factor targeted antibodies as anticoagulants
    51.
    发明申请
    Novel tissue factor targeted antibodies as anticoagulants 失效
    新型组织因子靶向抗体作为抗凝剂

    公开(公告)号:US20060166284A1

    公开(公告)日:2006-07-27

    申请号:US10512215

    申请日:2003-04-30

    Abstract: This invention relates to novel antibodies that bind with greater affinity to the factor VIIa/tissue factor (FVIIa/TF) complex than to tissue factor (TF) alone, do not compete for binding to TF with FVII and FX, an inhibit FX activation. The antibodies bind at the site of injury and prevent the initiation of thrombosis. The antibodies can be used to treat a variety of thrombotic conditions including but not limited to deep vein thrombosis, disseminated intravascular coagulation, and acute coronary syndrome.

    Abstract translation: 本发明涉及与单独的组织因子(TF)相比,与因子VIIa /组织因子(FVIIa / TF)复合物具有更高亲和力结合的新型抗体,不竞争与FVII和FX的结合,抑制FX激活。 抗体在损伤部位结合并防止血栓形成的发生。 抗体可用于治疗各种血栓形成病症,包括但不限于深静脉血栓形成,弥散性血管内凝血和急性冠状动脉综合征。

    Connection components with anisotropic conductive material interconnection
    54.
    发明授权
    Connection components with anisotropic conductive material interconnection 有权
    连接部件采用各向异性导电材料互连

    公开(公告)号:US06825552B2

    公开(公告)日:2004-11-30

    申请号:US10139169

    申请日:2002-05-06

    Abstract: A connection component for a microelectronic element includes a body of dielectric material having opposing first and second surfaces. A plurality of elongated leads extend through the body between the first and second surfaces. The leads have a first end accessible at the first surface and a second end accessible at the second surface. A layer of anisotropic conductive material overlies the first ends and the first surface of the body for electrical connection of the leads to a microelectronic element.

    Abstract translation: 用于微电子元件的连接部件包括具有相对的第一和第二表面的绝缘材料体。 多个细长的引线在第一和第二表面之间延伸通过本体。 引线具有在第一表面可接近的第一端和在第二表面可接近的第二端。 一层各向异性导电材料覆盖在主体的第一端和第一表面上,用于将引线电连接到微电子元件。

    Assemblies for temporarily connecting microelectronic elements for testing and methods therefor
    56.
    发明授权
    Assemblies for temporarily connecting microelectronic elements for testing and methods therefor 失效
    用于临时连接用于测试的微电子元件的组件及其方法

    公开(公告)号:US06794202B2

    公开(公告)日:2004-09-21

    申请号:US09802834

    申请日:2001-03-09

    Abstract: A method of making a microelectronic assembly includes providing a first microelectronic element having one or more conductive bumps, the conductive bumps including a first fusible material that transforms from a solid to a liquid at a first melting temperature, and providing a second microelectronic element having one or more conductive elements. The conductive bumps of the first microelectronic element are electrically interconnected with the conductive elements of the second microelectronic element using a second fusible material, the second fusible material having a second melting temperature that is lower than the first melting temperature of the first fusible material. During the electrically interconnecting step, the second fusible material is maintained at a temperature that is greater than or equal to the second melting temperature and less than the first melting temperature of the first fusible material. The method also includes testing the microelectronic assembly after the electrically interconnecting step while maintaining the second fusible material at a temperature that is greater than or equal to the second melting temperature.

    Abstract translation: 一种制造微电子组件的方法包括提供具有一个或多个导电凸块的第一微电子元件,所述导电凸块包括在第一熔化温度下从固体转变为液体的第一可熔材料,以及提供具有一个 或更多导电元件。 第一微电子元件的导电凸块使用第二可熔材料与第二微电子元件的导电元件电互连,第二可熔材料具有低于第一可熔材料的第一熔化温度的第二熔化温度。 在电互连步骤期间,第二可熔材料保持在大于或等于第二熔融温度并小于第一熔融材料的第一熔化温度的温度。 该方法还包括在电互连步骤之后测试微电子组件,同时将第二可熔材料保持在大于或等于第二熔融温度的温度。

    Method of manufacturing connection components using a plasma patterned mask
    57.
    发明授权
    Method of manufacturing connection components using a plasma patterned mask 有权
    使用等离子体图案化掩模制造连接部件的方法

    公开(公告)号:US06518160B1

    公开(公告)日:2003-02-11

    申请号:US09245227

    申请日:1999-02-05

    Abstract: A connection component is made by providing an assembly comprising a base layer of a dielectric material, a metal layer overlying the base layer, and a top layer of a plasma-etchable material overlying the metal layer; forming openings in the top layer to produce a top layer mask; and forming first conductive elements from the metal layer by removing metal from regions of the metal layer aligned with the openings in the top layer mask. This method may be used to form a connection component having vias or bond windows formed therein for connection with other elements of a microelectronic device and conductive elements may be formed on either or both sides of the base layer.

    Abstract translation: 通过提供包括电介质材料的基底层,覆盖在基底层上的金属层和覆盖在金属层上的等离子体可蚀刻材料的顶层的组件来制造连接部件; 在顶层中形成开口以产生顶层掩模; 以及通过从与顶层掩模中的开口对准的金属层的区域中去除金属,从金属层形成第一导电元件。 该方法可以用于形成具有形成在其中的通孔或接合窗口的连接部件,用于与微电子器件的其它元件连接,并且可以在基底层的一侧或两侧上形成导电元件。

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