Lateral bipolar transistor
    51.
    发明授权

    公开(公告)号:US11967635B2

    公开(公告)日:2024-04-23

    申请号:US17533805

    申请日:2021-11-23

    Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a lateral bipolar transistor and methods of manufacture. The structure includes: an extrinsic base region within a semiconductor substrate material; a shallow trench isolation structure extending into the semiconductor substrate material and bounding the extrinsic base region; an emitter region adjacent to the shallow trench isolation structure and on a side of the extrinsic base region; and a collector region adjacent to the shallow trench isolation structure and on an opposing side of the extrinsic base region.

    BIPOLAR JUNCTION TRANSISTORS INCLUDING WRAP-AROUND EMITTER AND COLLECTOR CONTACTS

    公开(公告)号:US20230075062A1

    公开(公告)日:2023-03-09

    申请号:US17525236

    申请日:2021-11-12

    Inventor: Hong Yu Jagar Singh

    Abstract: Structures for a bipolar junction transistor and methods of forming a structure for a bipolar junction transistor. The structure includes a first terminal having a first raised semiconductor layer having a top surface and a side surface, a second terminal having a second raised semiconductor layer, and a base layer positioned in a lateral direction between the first raised semiconductor layer of the first terminal and the second raised semiconductor layer of the second terminal. The structure further includes a contact positioned to overlap with the top surface and the side surface of the first raised semiconductor layer.

    FIN-BASED LATERAL BIPOLAR JUNCTION TRANSISTOR WITH REDUCED BASE RESISTANCE AND METHOD

    公开(公告)号:US20230061156A1

    公开(公告)日:2023-03-02

    申请号:US17687741

    申请日:2022-03-07

    Abstract: A disclosed structure includes a fin-based bipolar junction transistor (BJT) with reduced base resistance. The BJT includes one or more semiconductor fins. Each semiconductor fin has opposing sidewalls, a first width, and a base recess, which extends across the first width through the opposing sidewalls. The BJT includes a base region positioned laterally between collector and emitter regions. The base region includes a base semiconductor layer (e.g., an intrinsic base layer), which fills the base recess and which has a second width greater than the first width such that the base semiconductor layer extends laterally beyond the opposing sidewalls. In a BJT with multiple semiconductor fins, the base recess on each semiconductor fin is filled with a discrete base semiconductor layer. The base region further includes an additional base semiconductor layer (e.g., an extrinsic base layer) covering the base semiconductor layer(s). Also disclosed is a method of forming the structure.

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