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公开(公告)号:ZA766715B
公开(公告)日:1977-10-26
申请号:ZA766715
申请日:1976-11-09
Applicant: HOECHST AG
IPC: C07D401/14 , A61K31/41 , A61K31/415 , A61K31/44 , A61K31/4427 , A61K31/4433 , A61P7/10 , A61P13/02 , A61P15/00 , A61P19/06 , A61P25/04 , A61P29/00 , C07D403/04 , C07D403/06 , C07D409/14 , A61K , C07D
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公开(公告)号:ZA7606715B
公开(公告)日:1977-10-26
申请号:ZA7606715
申请日:1976-11-09
Applicant: HOECHST AG
IPC: C07D401/14 , A61K31/41 , A61K31/415 , A61K31/44 , A61K31/4427 , A61K31/4433 , A61P7/10 , A61P13/02 , A61P15/00 , A61P19/06 , A61P25/04 , A61P29/00 , C07D403/04 , C07D403/06 , C07D409/14 , A61K , C07D
CPC classification number: C07D403/04 , A61K31/41 , A61K31/415 , C07D403/06
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公开(公告)号:ZA739328B
公开(公告)日:1974-10-30
申请号:ZA739328
申请日:1973-12-07
Applicant: HOECHST AG
IPC: C07D233/60 , C07D235/06 , C07D521/00 , C07D49/36
Abstract: Compounds of the formula IN WHICH R1 and R2 each stands for a hydrogen atom or together they stand for the group -CH=CH-CH=CH- which may carry one or more lower alkyl, halogeno-alkyl or alkoxy groups, halogen atoms or NO2-groups, and R3 and R4, independently of one another, each stands for a hydrogen atom, a lower alkyl, halogeno-alkyl, alkoxy or halogeno-alkoxy group, a halogen atom or NO2 or together they stand as a -CH=CH-CH=CH- group with the benzene nucleus for the naphthyl group, AND PHYSIOLOGICALLY ACCEPTABLE ACID ADDITION SALTS THEREOF, PROCESS FOR PREPARING THEM AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM AS ACTIVE SUBSTANCE.
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公开(公告)号:ZA7209141B
公开(公告)日:1973-09-26
申请号:ZA7209141
申请日:1972-12-28
Applicant: HOECHST AG
IPC: C07D233/54 , C07D233/64 , C07D235/12 , C07D235/18 , C07D235/20 , C07D
CPC classification number: C07D233/64 , C07C2603/18 , C07D235/12 , C07D235/18 , C07D235/20
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