Abstract:
An electromagnetic wave pulse measuring device, includes an elastic vibration wave generating section which irradiates a predetermined area of a sample with an elastic vibration wave, an electromagnetic wave pulse generating section which irradiates the predetermined area, which is irradiated with the elastic vibration wave, with an electromagnetic wave pulse, and an electromagnetic wave pulse detecting section which measures a waveform of the electromagnetic wave pulse modulated in the predetermined area by the elastic vibration wave. The timing at which the electromagnetic wave pulse detecting section measures the waveform of the electromagnetic wave pulse is a timing at which a phase angle of the elastic vibration wave has a predetermined value when the elastic vibration wave generating section generates the elastic vibration wave.
Abstract:
An optical pulse generating apparatus that supplies pump light and probe light includes a light source and a modulation unit configured to modulate light emitted from the light source, thereby dividing the light into the pump light and the probe light. The modulation unit is configured such that a frequency for modulating the light is variable. The modulation unit changes a difference between a moment of the pump light incident on an object and a moment of the probe light incident on the object by changing the frequency.
Abstract:
Optics collection and detection systems are provided for measuring optical signals from an array of optical sources over time. Methods of using the optics collection and detection systems are also described.
Abstract:
This invention relates to a dispersive holographic spectrometer (12) for analyzing radiation from an infrared source (16). The holographic spectrometer (12) comprises a piezoelectric block (40) having a holographic lens (38) on one face, an array of detectors (36) on another face and a pair of vernier electrodes (32, 34) on opposite faces. Radiation from the source (16) incident upon the holographic lens (38) is dispersed into component wavelengths (44, 46) and directed towards the detector array (36). The holographic lens (38) has a holographic interference pattern recorded on it such that radiation of predetermined wavelength components are dispersed sufficiently enough such that radiation of specific wavelengths falls on different detector elements (48) of the detector array (36). By applying a voltage to the electrodes (32, 38), an electric field is created within the piezoelectric block (40) such that it is either compressed or expanded. This change in the piezoelectric block (40) alters the direction of the radiation from the holographic lens (38) to the detector array (36). Therefore, misalignment of the source (16) with the holographic lens (38) can be compensated for such that piezoelectric adjustment of the block (40) will make the radiation of individual wavelengths fall on the desired detector element (48). Further, radiation from different wavelengths can be directed from one detector element to another. The detector array (36) is self-scanning such that an absorption spectrum can be measured and recorded over a range of frequencies.
Abstract in simplified Chinese:一种用于产生深紫外光(DUV)之连续波(CW)光之激光包含一二次谐波产生器及一四次谐波产生器。该四次谐波产生器包含复数个镜以及第一及第二非线性光学(NLO)晶体。该第一NLO晶体产生具有四次谐波波长之光,且经放置与该复数个镜成操作关系。该第二NLO晶体经放置与该第一NLO晶体成操作关系使得具有二次谐波波长之光穿过该第一NLO晶体及该第二NLO晶体。注意,该第二NLO晶体之第二光学轴围绕该第二NLO晶体内光之一传播方向相对于该第一NLO晶体之第一光学轴旋转约90度。该第二NLO晶体并未提供任何波长转换。
Abstract in simplified Chinese:一种材料传感设备包括:一激发源,其经组态以在一工件中诱发波;及一光学波导干涉仪,其经组态以传感该工件中之该等诱发波。该光学波导干涉仪包括具有一探针段端部之一探针段及经组态以准许设置该探针段端部与该工件之间的一间隙之一可调整耦合器。一控制器耦合至该可调整耦合器且经组态以设置该探针段端部与该工件之间的该间隙。
Abstract:
A multi-cell apparatus (100) and method for single ion addressing are described herein. One apparatus includes a first cell (102) configured to set a frequency, intensity, and a polarization of a laser and shutter the laser, a second cell (104) configured to align the shuttered laser to an ion in an ion trap such that the ion fluoresces light and/or performs a quantum operation, and a third cell (106) configured to detect the light fluoresced from the ion.
Abstract:
The present invention aims at realizing a gas concentration estimation apparatus with versatility wherein the gas concentration estimation apparatus estimates concentration of a target component in an analyte gas by analyzing a light emitted from plasma of the analyte gas. The present invention is directed to a gas concentration estimation apparatus including: a plasma generation device that turns an analyte gas into a plasma state; and an analysis device that analyzes plasma light emitted from the plasma generated by the plasma generation device and estimates concentration of a target component in the analyte gas wherein the analysis device estimates the concentration of the target component based on luminescence intensity of a wavelength component corresponding to luminescence from a predetermined radical within the plasma light, and the predetermined radical is different in atomic structure from the target component and includes an atom or a molecule separated from the target component.