Abstract:
Embodiments of the present disclosure generally relate to systems and methods for in-line measurement of alkali metal-containing structures or alkali ion-containing structures of, e.g., electrodes. In an embodiment, a system for processing an electrode is provided. The system includes a first processing chamber for forming an electrode comprising an alkali metal-containing structure. The system further includes a metrology station coupled to and in-line with the first processing chamber, the metrology station comprising: a source of radiation for delivering radiation to the alkali metal-containing structure, and an optical detector for receiving an emission of radiation emitted from the alkali metal-containing structure, and a processor configured to determine a characteristic of the alkali metal-containing structure of the electrode based on the emission of radiation.
Abstract:
An open scattered light smoke detector for detecting smoke may include a light transmitter for emitting light, a light receiver spectrally matched to the light transmitter, and a control unit configured to repeatedly actuate the light transmitter, with a pulsed signal sequence, to emit corresponding light pulses, evaluate temporally a signal sequence received by the light receiver, and output a fire alarm if a received signal strength exceeds a minimum value for the smoke concentration. The control unit may be configured to switch the detector from a normal operating mode into a service mode if a phase angle between an emitted and received signal sequence, as determined on the detector side, increases by a minimum angular value which, in terms of the travel time, corresponds technically to an increase in the optical path length from the light transmitter to the light receiver of more than some predefined distance.
Abstract:
An ultrasonic probe includes, a transducer transmitting and receiving ultrasonic waves, and converting ultrasonic signals into voltage signals and vice versa, a first circuit configured to transmit pulse voltage signals to the transducer and receive the voltage signals from the transducer, a second circuit configured to convert the voltage signals received from the first circuit into digital values from analog values, a battery unit configured to supply electric power to the first circuit and the second circuit, and a substrate being provided with the transducer, the first circuit and the second circuit, the first circuit being disposed on a first surface of the substrate, and the second circuit being disposed on a second surface opposite to the first surface of the substrate.
Abstract:
Apparatus and methods are provided for the imaging of structures in deep tissue within biological specimens, using spectral imaging to provide highly sensitive detection. By acquiring data that provides a plurality of images of the sample with different spectral weightings, and subsequent spectral analysis, light emission from a target compound is separated from autofluorescence in the sample. With the autofluorescence reduced or eliminated, an improved measurement of the target compound is obtained.
Abstract:
Methods and systems for determining one or more parameters of a wafer inspection process are provided. One method includes acquiring metrology data for a wafer generated by a wafer metrology system. The method also includes determining one or more parameters of a wafer inspection process for the wafer or another wafer based on the metrology data.
Abstract:
Provided is an apparatus for acquiring and projecting a broadband image, the apparatus including: a probe unit provided, on a probe housing of the probe unit, with a white light source unit configured to emit white light for acquiring a visible light image to a subject, a fluorescence excitation light source unit configured to emit fluorescence excitation light for acquiring an invisible light fluorescence image, and an image acquisition unit configured to receive an invisible light fluorescence image signal for the subject, and an image projection unit configured to project an image onto the subject; and an image processing unit configured to process an image received from the image acquisition unit. According to the apparatus for acquiring and projecting a broadband image, the visible light image and the invisible light fluorescence image may be simultaneously acquired and then displayed, and the acquired fluorescence image is projected onto a position where a fluorescence signal may be revealed, thus visually providing a position and shape in which the fluorescence signal is generated.
Abstract:
Systems and methods for measuring spectra and other optical characteristics such as colors, translucence, gloss, and other characteristics of objects and materials such as skin. Instruments and methods for measuring spectra and other optical characteristics of skin or other translucent or opaque objects utilize an abridged spectrophotometer and improved calibration/normalization methods. Improved linearization methods also are provided, as are improved classifier-based algorithms. User control is provided via a graphical user interface. Product or product formulations to match the measured skin or other object or to transform the skin or other object are provided to lighten, darken, make more uniform and the like.
Abstract:
An X-ray analyzer includes a sample stage, an X-ray source that irradiates a sample with primary X-rays, a detector that detects secondary X-rays generated from the sample, a position adjustment mechanism that adjusts relative positions of the sample stage and the primary X-rays, an observation mechanism that obtains an observation image of the sample, and a computer having a display unit and an input unit. The computer has a function of, in response to a pointer being moved from a central region of the observation screen to a certain position by dragging the input unit with keeping a holding state, moving the sample stage in a movement direction and at a movement speed corresponding to a direction and a distance of the certain position relative to the central region.
Abstract:
Methods and systems for determining one or more parameters of a wafer inspection process are provided. One method includes acquiring metrology data for a wafer generated by a wafer metrology system. The method also includes determining one or more parameters of a wafer inspection process for the wafer or another wafer based on the metrology data.
Abstract:
Systems and methods for measuring spectra and other optical characteristics such as colors, translucence, gloss, and other characteristics of objects and materials such as skin. Instruments and methods for measuring spectra and other optical characteristics of skin or other translucent or opaque objects utilize an abridged spectrophotometer and improved calibration/normalization methods. Improved linearization methods also are provided, as are improved classifier-based algorithms. User control is provided via a graphical user interface. Product or product formulations to match the measured skin or other object or to transform the skin or other object are provided to lighten, darken, make more uniform and the like.