公开(公告)号：DE2702444A1

公开(公告)日：1978-07-27

申请号：DE2702444

申请日：1977-01-20

Applicant: SIEMENS AG

Inventor： LISCHKE BURKHARD DR ING ,  OELMANN ANDREAS DR ING ,  FROSIEN JUERGEN DIPL ING

IPC: H01L21/027 ,  H01J37/30 ,  H01J37/304 ,  H01L21/26 ,  H01L21/82 ,  H01J37/28 ,  H01J3/10

Abstract: An improved charged-particle beam optical apparatus for imaging a first mask including a plurality of apertures on a specimen to be irradiated. The mask is uniformly illuminated by a beam through a plurality of condenser lenses and the apparatus includes means for adjusting the position of the mask relative to the specimen. A selected area of the specimen has an adjustment marking disposed thereon which is illuminated by a ray of charged particles from the beam passing through a test opening provided in the mask. The apparatus further includes means for detecting radiation emanating from the specimen. The improvement of the invention comprises the provision of a second mask, having at least one aperture which is alignable with the test opening in the first mask, mounted in the apparatus and movable into positions above and below the first mask for aligning the test opening and aperture in the first and second masks and covering the plurality of apertures in the first mask so as to permit charged particles from the beam to pass only through the test opening in the first mask and the aperture in the second mask.

公开(公告)号：SU416804A1

公开(公告)日：1974-02-25

申请号：SU1827806

申请日：1972-09-11

IPC: H01J3/10 ,  B61L19/06 ,  H02J3/10

公开(公告)号：CH303062A

公开(公告)日：1954-11-15

申请号：CH303062D

申请日：1952-06-19

Applicant: SIEMENS REINIGER WERKE AG

Inventor： SIEMENS-REINIGER-WERKE AKTIENG

IPC: H01J3/10 ,  H01J35/10

公开(公告)号：US12145006B2

公开(公告)日：2024-11-19

申请号：US17970410

申请日：2022-10-20

Applicant: Varian Medical Systems, Inc.

Inventor： Mark Everett Trail ,  James Edward Clayton

IPC: A61N5/10 ,  H01J3/10 ,  H01J35/06 ,  H01J35/14 ,  H01J37/07 ,  H01J37/073 ,  H01J37/075 ,  H05H9/00 ,  H01J3/02 ,  H01J37/147

Abstract: Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 μsec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.4×10{circumflex over ( )}-6 cGy/bunch.

公开(公告)号：US08215011B2

公开(公告)日：2012-07-10

申请号：US12379307

申请日：2009-02-18

Applicant: Seok Hwan Ahn ,  Young Gwan Ko

Inventor： Seok Hwan Ahn ,  Young Gwan Ko

IPC: H01J3/10

CPC classification number: H05K3/107 ,  H05K3/0032 ,  H05K3/045 ,  H05K3/426 ,  H05K2201/0376 ,  H05K2201/0959 ,  H05K2203/025 ,  H05K2203/1461

Abstract: Disclosed is a printed circuit board having a plating pattern buried in a via and a method of manufacturing the same. The method of manufacturing the printed circuit board includes forming a negative pattern for forming a plating pattern, thus remarkably reducing the generation of plating thickness deviation in a plating process for forming a circuit pattern, and the printed circuit board has improved electrical signal transmission properties.

Abstract translation: 公开了一种印刷电路板及其制造方法。 制造印刷电路板的方法包括形成用于形成电镀图案的负图案，从而显着减少了用于形成电路图案的电镀工艺中电镀厚度偏差的产生，并且印刷电路板具有改善的电信号传输性能。

公开(公告)号：US5723940A

公开(公告)日：1998-03-03

申请号：US471296

申请日：1995-06-06

Applicant: Gerardus G.P. Van Gorkom ,  Petrus H.F. Trompenaars ,  Gerardus A.H.M. Vrijssen ,  Siebe T. De Zwart ,  Bernardus H.W. Hendriks ,  Nicolaas Lambert

Inventor： Gerardus G.P. Van Gorkom ,  Petrus H.F. Trompenaars ,  Gerardus A.H.M. Vrijssen ,  Siebe T. De Zwart ,  Bernardus H.W. Hendriks ,  Nicolaas Lambert

IPC: H01J31/12 ,  H01J29/82 ,  H01J29/87 ,  H01J31/15 ,  H04N5/70 ,  H01J29/70 ,  H01J1/62 ,  H01J3/10 ,  H01J63/04

CPC classification number: H01J31/124 ,  H04N5/70

Abstract: Flat-panel type picture display device having a luminescent screen and a large number of electron propagation ducts operating by means of electron wall interaction. Electrons are withdrawn from the ducts by means of an addressing system, whereafter these electrons are directed towards desired locations on the luminescent screen. An apertured spacer plate of electrically insulating material for passing electrons is arranged between the addressing system and the screen. To enable large voltage differences to be applied across the dimension of thickness of the spacer plate, the spacer plate is provided with a high-ohmic layer, or with a pattern of a low-ohmic material, or with an equalization layer at one side and with a low-ohmic layer at the other side, and at least the walls of the apertures are preferably coated with a material having a low secondary emission.

公开(公告)号：US5638388A

公开(公告)日：1997-06-10

申请号：US446195

申请日：1995-05-19

Applicant: William L. Nighan, Jr. ,  John Cole

Inventor： William L. Nighan, Jr. ,  John Cole

IPC: H01S3/094 ,  H01S3/081 ,  H01S3/0941 ,  H01S3/109 ,  H01S3/13 ,  H01S3/16 ,  H01J3/10

CPC classification number: H01S3/109 ,  H01S3/081 ,  H01S3/094053 ,  H01S3/09415 ,  H01S3/13 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1653 ,  H01S3/1673

Abstract: A diode pumped, multiaxial mode, intracavity frequency doubled laser resonator has high amplitude stability, meaning that the percent root mean square noise (%RMS) of the doubled output beam power is low. A diode pump source supplies a pump beam to a laser crystal positioned in a resonator cavity and produces a multiaxial mode infrared beam that is incident on a doubling crystal, also positioned in the resonator. A frequency doubled output beam is produced that has an RMS of less than 3%, and in some cases less than 0.2%. The laser is highly efficient, provides high output power, and its output beam is of high spatial quality.

Abstract translation: 二极管泵浦，多轴模式，腔内倍频激光谐振器具有高振幅稳定性，意味着双倍输出光束功率的均方根噪声百分比（％RMS）低。 二极管泵浦源将泵浦光束提供给位于谐振器腔中的激光晶体，并产生入射在双晶晶体上并且位于谐振器中的多轴模式红外光束。 产生频率倍增的输出光束，其RMS小于3％，在某些情况下小于0.2％。 激光器高效，提供高输出功率，其输出光束具有高空间质量。

公开(公告)号：US4549091A

公开(公告)日：1985-10-22

申请号：US521054

申请日：1983-08-08

Applicant: Theodore S. Fahlen ,  Barton Mass

Inventor： Theodore S. Fahlen ,  Barton Mass

IPC: H01S3/097 ,  H03K3/55 ,  G11C13/02 ,  H01J3/10

CPC classification number: H03K3/55 ,  H01S3/097

Abstract: An electrical excitation circuit is disclosed for a gas laser. The electrical excitation circuit includes a charging circuit connected in series with a pulse forming network between a power source and the laser load. The charging circuit includes a capacitor charged by the power source and a thyratron for transferring voltage to the pulse forming network. Alternatively, the charging circuit includes a capacitor charged upon the firing of a silicon controlled rectifier through a saturable step-up transformer which saturates for transferring voltage to the pulse forming network. The pulse forming network includes a saturable inductor switch positioned with respect to a capacitor so that when the voltage on the capacitor reaches a predetermined level, saturation of the saturable inductor switch releases electrical energy stored in the capacitor to the laser load.

Abstract translation: 公开了一种用于气体激光器的电激励电路。 电激励电路包括与电源和激光负载之间的脉冲形成网络串联连接的充电电路。 充电电路包括由电源充电的电容器和用于将电压传送到脉冲形成网络的闸流管。 或者，充电电路包括在通过可饱和升压变压器烧制可控硅整流器时充电的电容器，其饱和以将电压传送到脉冲形成网络。 脉冲形成网络包括相对于电容器定位的可饱和电感器开关，使得当电容器上的电压达到预定水平时，饱和电感器开关的饱和度释放存储在电容器中的激光负载的电能。

公开(公告)号：PL410162A1

公开(公告)日：2016-05-23

申请号：PL41016214

申请日：2014-11-17

Applicant: WOJSKOWA AKAD TECH

Inventor： GITKA ANDRZEJ ,  KWAŚNY MIROSŁAW ,  MIERCZYK ZYGMUNT ,  ŁAPIŃSKI MARIUSZ ,  BARAŃSKI JERZY

IPC: A61N5/06 ,  H01J3/10

Abstract: Wynalazek dotyczy oświetlacza zawierającego źródło światła w postaci matrycy diod LED i układ optyczny. Matryca (3) diod LED posiada centralny otwór z umieszczoną tam soczewką (4), a przed matrycą (3) diod LED znajduje się matryca (2) soczewek skupiających, zrównolegniających wiązkę promieniowania optycznego. Matryca (2) soczewek skupiających posiada centralny otwór nie mniejszy od średnicy soczewki (4). Przed matrycą (2) soczewek skupiających znajduje się zwierciadło wklęsłe (1), umieszczone w odległości umożliwiającej skupienie wszystkich równoległych wiązek świetlnych wychodzących z soczewek matrycy (2) soczewek skupiających poprzez odbicie od zwierciadła wklęsłego (1) na soczewce (4). Bezpośrednio za soczewką (4) znajduje sięświatłowód (5). Matryca (3) diod LED, matryca (2) soczewek skupiających oraz zwierciadło wklęsłe (1) umocowane są w sposób mechaniczny trwale w obudowie (8).

公开(公告)号：DE102014209389A1

公开(公告)日：2015-11-19

申请号：DE102014209389

申请日：2014-05-17

Applicant: INCOATEC GMBH

Inventor： HANS KARL

IPC: H01J3/10 ,  H01J5/48 ,  H01J29/02 ,  H01J35/06

Abstract: Eine Justageeinrichtung (20, 21) für einen Elektronenemitter (23) einer Elektronenröhre (40), umfassend – ein im Wesentlichen stabförmiges Stützelement (10) für den Elektronenemitter (23), und – ein im Wesentlichen rohrförmiges Befestigungselement (7), wobei das Befestigungselement (7) aufweist – einen Kopplungsabschnitt (KA), wobei das Stützelement (10) am Kopplungsabschnitt (KA) des Befestigungselements (7) befestigt ist, – einen Befestigungsabschnitt (BA) zur Befestigung des Befestigungselements (7) an einem Kathodenkörper (24) der Elektronenröhre (40), wobei der Befestigungsabschnitt (BA) zumindest teilweise vom Stützelement (10) durchragt wird, – und einen Verformungsabschnitt (VA), der zwischen dem Kopplungsabschnitt (KA) und dem Befestigungsabschnitt (BA) angeordnet ist, wobei der Verformungsabschnitt (VA) vom Stützelement (10) durchragt wird, ist dadurch gekennzeichnet, dass der Verformungsabschnitt (VA) mit wenigstens einer Einsenkung (28; 31) ausgebildet ist, die ringförmig umlaufend oder schraubenförmig umlaufend am Befestigungselement (7) verläuft. Die Erfindung stellt eine Justageeinrichtung für einen Elektronenemitter einer Elektronenröhre bereit, mit der eine gute Verformbarkeit des Befestigungselements gewährleistet ist, und die weniger fehleranfällig ist.