公开(公告)号：KR1020040083648A

公开(公告)日：2004-10-06

申请号：KR1020030018196

申请日：2003-03-24

Applicant: 삼성전자주식회사

Inventor： 노남석 ,  이성덕 ,  홍문표 ,  김창용

IPC: G02F1/133

CPC classification number: G02F1/133514 ,  G02F2201/52

Abstract: PURPOSE: An RGBW LCD is provided to modify the arrangement of pixels for improving the luminance of the LCD by 50-70% more than an RGB LCD by white pixels without any additional design or driving. CONSTITUTION: An RGBW LCD includes pixel groups formed of mth pixel line(1X) and nth pixel line(2X), wherein m and n are respectively odd and even numbers. When a first dot(51) is formed of red, green and blue pixels, and a second dot(52) is formed of red, green and white pixels, the first and second dots are arranged in sequence in the mth pixel line. In the nth pixel line adjacent to the mth pixel line, the mth pixel line is shifted in the line direction by a dot, so that the second and first dots are arranged in sequence in the nth pixel line.

Abstract translation: 目的：提供一个RGBW LCD，用于修改像素排列，以提高LCD的亮度比RGB LCD高出白色像素的50-70％，无需任何额外的设计或驱动。 构成：RGBW LCD包括由第m个像素线（1X）和第n个像素线（2X）形成的像素组，其中m和n分别是奇数和偶数。 当第一点（51）由红色，绿色和蓝色像素形成，并且第二点（52）由红色，绿色和白色像素形成时，第一和第二点依次排列在第m个像素行中。 在与第m个像素线相邻的第n个像素行中，第m个像素线在行方向上移动一个点，使得第2个和第1个点依次排列在第n个像素行中。

公开(公告)号：KR1020030034820A

公开(公告)日：2003-05-09

申请号：KR1020010066575

申请日：2001-10-27

Applicant: 삼성전자주식회사

Inventor： 김상갑 ,  장용규 ,  홍문표 ,  정창오 ,  조범석

IPC: G02F1/1335

Abstract: PURPOSE: A reflective-transmissive liquid crystal display device and a method for manufacturing the same are provided to realize a high luminance display simultaneously having high light transmissivity and light reflexibility by optimizing the thickness of a reflective-transmissive electrode. CONSTITUTION: A thin film transistor is formed of a gate electrode(350), a source electrode(770), a drain electrode(760), and an active pattern(550) on a substrate(100). A passivation layer(900) is formed on the thin film transistor and the substrate, having a contact hole exposing the drain electrode. A transparent electrode(1000) is formed on the passivation layer to be connected with the drain electrode through the contact hole. A reflective-transmissive electrode(1100) is formed on the transparent electrode for reflecting light supplied in a direction forwarding the substrate while transmitting light supplied after passing through the substrate.

Abstract translation: 目的：提供反射透射型液晶显示装置及其制造方法，通过优化反射透射电极的厚度，实现同时具有高透光率和光反射性的高亮度显示。 构成：薄膜晶体管由衬底（100）上的栅电极（350），源电极（770），漏电极（760）和有源图案（550）形成。 钝化层（900）形成在薄膜晶体管和基板上，具有暴露漏电极的接触孔。 在钝化层上形成透明电极（1000），以通过接触孔与漏电极连接。 反射透射电极（1100）形成在透明电极上，用于反射在传送衬底的方向上提供的光，同时透射通过衬底之后提供的光。

公开(公告)号：KR1020030025516A

公开(公告)日：2003-03-29

申请号：KR1020010058597

申请日：2001-09-21

Applicant: 삼성전자주식회사

Inventor： 김보성 ,  홍문표 ,  김상갑 ,  노수귀

IPC: G02F1/136

Abstract: PURPOSE: A thin film transistor substrate for a reflective liquid crystal display device and a method for fabricating the same are provided to simplify the fabricating procedure by forming an embossing pattern on a photosensitive film for black matrix by using a black positive photosensitive film. CONSTITUTION: A method for fabricating a thin film transistor substrate for a reflective liquid crystal display device includes the steps of forming gate and data wires on an insulating substrate via a gate insulating film covering the gate wires or a semiconductor pattern formed on the gate insulating film on gate electrodes, forming a black matrix insulating film on the data wires and the semiconductor pattern by using a black photosensitive film, and forming a reflecting film connected to drain electrodes by using a conductive material with flexibility on the black matrix insulating film. The insulating film for the black matrix(80) is formed by the sub-steps of doping the photosensitive film, embossing the photosensitive film at positions corresponding to pixel areas by exposing and developing the photosensitive film by using mask, and forming first to third contact holes(101-103) for exposing the drain electrodes(62) and gate and data pads(24,64). The insulating film for the black matrix is flat at positions corresponding to the gate and data pads.

Abstract translation: 目的：提供一种用于反射型液晶显示装置的薄膜晶体管基板及其制造方法，以通过使用黑色正性感光膜在黑色矩阵的感光膜上形成压花图案来简化制造步骤。 构成：用于制造反射型液晶显示装置的薄膜晶体管基板的方法包括以下步骤：通过覆盖栅极线的栅极绝缘膜或形成在栅极绝缘膜上的半导体图案在绝缘基板上形成栅极和数据布线 在栅电极上，通过使用黑色感光膜在数据线和半导体图案上形成黑矩阵绝缘膜，并且通过在黑矩阵绝缘膜上使用具有柔性的导电材料形成连接到漏电极的反射膜。 用于黑矩阵（80）的绝缘膜通过掺杂感光膜的子步骤形成，通过使用掩模曝光和显影感光膜，将感光膜压印在与像素区域相对应的位置，并形成第一至第三接触 用于暴露漏电极（62）和栅极和数据焊盘（24,64）的孔（101-103）。 用于黑矩阵的绝缘膜在对应于栅极和数据焊盘的位置处是平坦的。

公开(公告)号：KR1020030019030A

公开(公告)日：2003-03-06

申请号：KR1020010055712

申请日：2001-09-11

Applicant: 삼성전자주식회사

Inventor： 탁영미 ,  박운용 ,  홍문표 ,  이정호

IPC: G02F1/13

CPC classification number: G03F9/7084 ,  G02F2001/13625 ,  G03F1/50 ,  G03F7/70475 ,  G03F7/70791

Abstract: PURPOSE: An exposure mask used for manufacturing a liquid crystal display and a method of exposing a substrate of the liquid crystal display using the mask are provided to enable accurate alignment of shots even in a large-sized substrate. CONSTITUTION: An exposure mask(M) used for manufacturing a liquid crystal display includes the first mask pattern(M1), the second mask pattern(M2), and the third mask(M3) pattern. The first mask pattern is used for exposing the center of a substrate and placed at the center of the exposure mask. The second mask pattern is used for exposing the left part of the substrate and located at the left of the first mask pattern, having the first distance(d1) between the first and second mask patterns. The third mask pattern is used for exposing the right part of the substrate and placed at the right side of the first mask pattern, having the second distance(d2) between the first and third mask patterns. An alignment key is formed in the first mask pattern.

Abstract translation: 目的：提供用于制造液晶显示器的曝光掩模和使用掩模使液晶显示器的基板曝光的方法，以使得即使在大尺寸基板中也能够精确地对准照片。 构成：用于制造液晶显示器的曝光掩模（M）包括第一掩模图案（M1），第二掩模图案（M2）和第三掩模（M3）图案。 第一掩模图案用于将基板的中心曝光并放置在曝光掩模的中心。 第二掩模图案用于曝光位于第一掩模图案左侧的基板的左部分，具有第一和第二掩模图案之间的第一距离（d1）。 第三掩模图案用于曝光基板的右部并放置在第一掩模图案的右侧，具有第一和第三掩模图案之间的第二距离（d2）。 在第一掩模图案中形成对准键。

公开(公告)号：KR1020030018215A

公开(公告)日：2003-03-06

申请号：KR1020010051817

申请日：2001-08-27

Applicant: 삼성전자주식회사

Inventor： 이정호 ,  홍문표

IPC: G02F1/136

Abstract: PURPOSE: A thin film transistor substrate of a liquid crystal display and a method for fabricating the substrate are provided to secure adhesive strength between a pad and an output terminal of a tap driving IC. CONSTITUTION: A thin film transistor substrate of a liquid crystal display includes an insulating substrate(10), a gate line formed on the substrate, a gate insulating layer(60) covering the gate line, a semiconductor pattern(70) formed on the gate insulating layer, and a data line formed on the semiconductor pattern or the gate insulating layer. The gate line includes a gate electrode(56) and a gate pad(53), and the data line includes source and drain electrodes(95,96) and a data pad(98). The thin film transistor substrate further has a passivation film(100) and a pixel electrode(112). The passivation film covers the data line and the semiconductor pattern and has the first contact hole(102) exposing the drain electrode and the second contact hole(108) exposing the gate pad or the data pad. The pixel electrode is connected to the drain electrode through the first contact hole.

Abstract translation: 目的：提供液晶显示器的薄膜晶体管基板和用于制造基板的方法，以确保焊盘与抽头驱动IC的输出端子之间的粘合强度。 构成：液晶显示器的薄膜晶体管基板包括绝缘基板（10），形成在基板上的栅极线，覆盖栅极线的栅极绝缘层（60），形成在栅极上的半导体图案（70） 绝缘层和形成在半导体图案或栅极绝缘层上的数据线。 栅极线包括栅电极（56）和栅极焊盘（53），数据线包括源极和漏极（95,96）和数据焊盘（98）。 薄膜晶体管基板还具有钝化膜（100）和像素电极（112）。 钝化膜覆盖数据线和半导体图案，并且具有露出漏极电极的第一接触孔（102）和露出栅极焊盘或数据焊盘的第二接触孔（108）。 像素电极通过第一接触孔连接到漏电极。

公开(公告)号：KR1020020095541A

公开(公告)日：2002-12-27

申请号：KR1020010033584

申请日：2001-06-14

Applicant: 삼성전자주식회사

Inventor： 김상갑 ,  홍문표 ,  정창오 ,  장용규

IPC: G02F1/136

Abstract: PURPOSE: A transflective liquid crystal display device and a method for fabricating the same are provided to fabricate the LCD with four or five masks by improving the fabricating procedure and optimize the thickness of thin films for the reflection/transmission electrodes, thereby increasing the light efficiency and achieving the high luminance display. CONSTITUTION: A transflective liquid crystal display device includes thin film transistors formed in first areas of a first substrate(100) with gate electrodes, source electrodes(770), drain electrodes(760) and an active pattern, an organic insulating film(900) formed with contact holes for exposing the drain electrodes, transparent electrodes(1000) formed on a top surface of the organic insulating film to contact the drain electrodes, reflection/transmission electrodes(1100) formed on a top surface of the transparent electrodes for reflecting light supplied in the direction toward the first substrate and transmitting the light supplied via the first substrate, a second substrate having common electrodes facing the reflection/transmission electrodes of the first substrate, a liquid crystal layer implanted between the reflection/transmission electrodes and the common electrodes, and a light supplying unit mounted to a rear surface of the first substrate.

Abstract translation: 目的：提供一种半透射型液晶显示装置及其制造方法，通过改进制造步骤和优化反射/透射电极薄膜的厚度来制造具有四个或五个掩模的LCD，从而提高光效率 并实现高亮度显示。 构成：半透射型液晶显示装置包括形成在具有栅电极的第一基板（100）的第一区域中的薄膜晶体管，源电极（770），漏电极（760）和有源图案，有机绝缘膜（900） 形成有用于露出漏极的接触孔，形成在有机绝缘膜的顶表面上的透明电极（1000）以接触漏电极，形成在透明电极的顶表面上的反射/发射电极（1100）用于反射光 沿着朝向第一基板的方向供给并透射经由第一基板供给的光，具有与第一基板的反射/透射电极相对的公共电极的第二基板，注入在反射/透射电极和公共电极之间的液晶层 以及安装到第一基板的后表面的光供给单元。

公开(公告)号：KR1020010029343A

公开(公告)日：2001-04-06

申请号：KR1019990042108

申请日：1999-09-30

Applicant: 삼성전자주식회사

Inventor： 홍문표

IPC: G02F1/136

Abstract: PURPOSE: A thin film transistor substrate is provided to be capable of improving a fabrication yield together with securing an aperture ratio, of minimizing a parasitic capacitance, and of sufficiently securing a sustain capacitance. CONSTITUTION: A data wire includes a data line(20) extended in one direction on an insulation substrate, and RGB color filters(31,32,33) are formed at each pixel on an insulation substrate. The insulation film is formed to cover the data wire and the color filters. A gate wire is formed on the insulation film and includes a gate line(50), which is intersected with the data line(20) so as to define the pixel, and a gate electrode being a branch of the gate line. A gate insulation film is formed on the insulation film to cover the gate wire and has a contact hole(61) for exposing a part of the data line together with the insulation film. A semiconductor layer pattern(70) is formed on the gate insulation film of the gate electrode and has an island shape. An ohmic contact layer pattern is formed on the semiconductor layer pattern. A pixel wire includes a source electrode(112), a drain electrode(111) and a pixel electrode(110) and is formed on the ohmic contact layer pattern. The source electrode(112) is connected to the data line(20) through the contact hole(61). The drain electrode(111) is separated from the source electrode with the gate electrode in the center. The pixel electrode(110) is connected to the drain electrode and is formed at the pixel.

Abstract translation: 目的：提供薄膜晶体管基板，以便能够提高制造成品率，同时确保孔径比，使寄生电容最小化并充分确保维持电容。 构成：数据线包括在绝缘基板上沿一个方向延伸的数据线（20），并且在绝缘基板上的每个像素处形成RGB滤色器（31,32,33）。 形成绝缘膜以覆盖数据线和滤色器。 栅极线形成在绝缘膜上，并且包括与数据线（20）相交以限定像素的栅极线（50）和作为栅极线分支的栅电极。 在绝缘膜上形成栅极绝缘膜以覆盖栅极线，并且具有用于使绝缘膜与数据线的一部分露出的接触孔（61）。 半导体层图案（70）形成在栅电极的栅极绝缘膜上并具有岛状。 在半导体层图案上形成欧姆接触层图案。 像素线包括源电极（112），漏电极（111）和像素电极（110），并形成在欧姆接触层图案上。 源电极（112）通过接触孔（61）连接到数据线（20）。 漏电极（111）与源电极分离，栅电极在中心。 像素电极（110）连接到漏电极并形成在像素处。

公开(公告)号：KR1020010009748A

公开(公告)日：2001-02-05

申请号：KR1019990028288

申请日：1999-07-13

Applicant: 삼성전자주식회사

Inventor： 홍문표

IPC: G02F1/136

Abstract: PURPOSE: A method of making a thin film transistor substrate is provided to widen an angle of visual field by making an arrangement direction of liquid crystal molecules of each region formed differently. CONSTITUTION: The method of making a thin film transistor substrate is composed of forming a data wiring comprising a data line(51), a source electrode, a drain electrode and a data pad and forming a passivation insulating film(60) covering data lines(51) and a gate insulating film(20). A photoresist film is coated and exposed by a mask(100) so that a photoresist film pattern(80) is formed which is inclined toward an edge from a center of a pixel region. A passivation film pattern(80) is formed by etching the passivation insulating film(60) by use of the photoresist film pattern(80) as a mask.

Abstract translation: 目的：提供一种制造薄膜晶体管基板的方法，通过使每个区域的液晶分子的排列方向不同而扩大视场的角度。 构成：制造薄膜晶体管衬底的方法包括：形成包括数据线（51），源电极，漏电极和数据焊盘的数据布线，并形成覆盖数据线的钝化绝缘膜（60） 51）和栅极绝缘膜（20）。 通过掩模（100）涂覆并曝光光致抗蚀剂膜，从而形成从像素区域的中心向边缘倾斜的光致抗蚀剂膜图案（80）。 通过使用光致抗蚀剂膜图案（80）作为掩模蚀刻钝化绝缘膜（60）来形成钝化膜图案（80）。

公开(公告)号：KR1020010005221A

公开(公告)日：2001-01-15

申请号：KR1019990026024

申请日：1999-06-30

Applicant: 삼성전자주식회사

Inventor： 김장수 ,  백범기 ,  허성욱 ,  홍문표

IPC: G02F1/136

Abstract: PURPOSE: A liquid crystal display device having a repair line is provided to effectively repair a disconnection line generated in three adjacent data lines to each other while removing non-repairable areas. CONSTITUTION: In a liquid crystal display device, the first substrate(1) for a thin film transistor substrate is provided. A plurality of gate lines(10) are formed on the first substrate. A plurality of gate pads are formed in one side end of the gate lines. A PCB substrate(3) for gate is located in the outside of the first substrate and is connected to the gate pads. A PCB substrate(4) for data is located in the outside of the first substrate and is connected to the data pads. The first to third repair lines are formed parallel to each other along the first edge formed with the data pad of the first substrate, the second edge being opposite to the first edge and the third edge being opposite to the gate pad. The first to third repair lines are formed through the PCB substrate for gate on the PCB substrate for data. A connection element connects the upper side end of the first and third repair lines being formed in the first edge of the first substrate, and the part of the first to third repair lines being formed in the PCB substrate for data.

Abstract translation: 目的：提供一种具有修理线的液晶显示装置，用于在除去不可修复区域的同时，将三条相邻的数据线中产生的断路线相互有效地修复。 构成：在液晶显示装置中，设置用于薄膜晶体管基板的第一基板（1）。 多个栅极线（10）形成在第一基板上。 在栅极线的一个侧端形成有多个栅极焊盘。 用于栅极的PCB基板（3）位于第一基板的外部并连接到栅极焊盘。 用于数据的PCB基板（4）位于第一基板的外部并连接到数据焊盘。 第一至第三修复线沿着与第一基板的数据焊盘形成的第一边缘彼此平行地形成，第二边缘与第一边缘相对，并且第三边缘与栅极焊盘相对。 第一至第三修复线通过用于数据的PCB衬底上的PCB衬底形成。 连接元件连接形成在第一基板的第一边缘中的第一和第三修复线的上侧端，并且第一至第三修复线的部分形成在PCB基板中用于数据。

公开(公告)号：KR1019990086657A

公开(公告)日：1999-12-15

申请号：KR1019980019760

申请日：1998-05-29

Applicant: 삼성전자주식회사

Inventor： 홍문표

IPC: G02F1/136

Abstract: 하부막이 상부막에 대해 언더 컷된 이중막 구조의 게이트 전극을 마스크로 반도체 패턴의 전면에 n
+ 또는 p
+ 이온을 주입한다. 이 과정에서, 상부 게이트 전극 패턴과 대응되는 영역의 바깥 부분에 위치한 반도체 패턴은 고농도로 도핑되어 소스 및 드레인 영역이 되고, 게이트 전극과 대응되는 부분은 도핑되지 않은 채널 영역이 되며, 채널 영역과 소스 및 드레인 영역의 사이에 게이트 전극과 중첩되지 않으며 도핑되지 않은 오프 셋 영역이 형성된다. 필요에 따라, 게이트 전극의 상부막을 전면 식각으로 제거하고, 하부막을 마스크로 하여 n
_ 또는 p
_ 이온을 주입하여 소스 및 드레인 영역의 안쪽에 저농도 LDD 영역을 형성한다.