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公开(公告)号：US11150560B2
公开(公告)日：2021-10-19
申请号：US16881109
申请日：2020-05-22
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Anton Bernhard Van Oosten , Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.
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公开(公告)号：US11029612B2
公开(公告)日：2021-06-08
申请号：US16494200
申请日：2018-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Maarten Hartger Kimman , Hans Butler , Olof Martinus Josephus Fischer , Christiaan Alexander Hoogendam , Theodorus Mattheus Joannus Maria Huizinga , Johannes Marinus Maria Rovers , Eric Pierre-Yves Vennat , Maurice Willem Jozef Etienne Wijckmans
Abstract: The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator. The magnetic gravity compensator comprises: a first permanent magnet assembly mounted to one of the first part and the second part and comprising at least a first column of permanent magnets, the first column extending in the vertical direction, wherein the permanent magnets have a polarization direction in a first horizontal direction or in a second horizontal direction opposite to the first horizontal direction, wherein vertically adjacent permanent magnets have opposite polarization directions, a second permanent magnet assembly mounted to the other of the first part and the second part and comprising at least one other column of permanent magnets, the at least one other column extending in the vertical direction, wherein vertically adjacent permanent magnets of the at least one other column have opposite polarization directions in the first horizontal direction or the second horizontal direction, wherein the first permanent magnet assembly at least partially encloses the second permanent magnet assembly.
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公开(公告)号：US10571815B2
公开(公告)日：2020-02-25
申请号：US16547933
申请日：2019-08-22
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US10466599B2
公开(公告)日：2019-11-05
申请号：US16099733
申请日：2017-04-20
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US10409175B2
公开(公告)日：2019-09-10
申请号：US15027986
申请日：2014-10-22
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Cornelius Adrianus Lambertus De Hoon , Marc Wilhelmus Maria Van Der Wijst , Thijs Verhees , Sander Kerssemakers
Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.
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Patent Agency Ranking
公开(公告)号：US20190049852A1
公开(公告)日：2019-02-14
申请号：US16079169
申请日：2017-02-03
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Cornelius Adrianus Lambertus De Hoon , Fransiscus Mathijs Jacobs , Pavel Kagan , Jeroen Pieter Starreveld , Maurice Willem Jozef Etienne Wijckmans
IPC: G03F7/20 , F16F13/00 , F16F9/02 , F16F15/023
Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator pan arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.
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公开(公告)号：US09754711B2
公开(公告)日：2017-09-05
申请号：US14966814
申请日：2015-12-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Lodevicus Gerardus Janssen , Johannes Jacobus Hubertus Paulides , Elena Andreevna Lomonova , Dave Theodorus Everardus Henricus Van Casteren , Hans Butler
CPC classification number: H01F7/0236 , F16F6/005
Abstract: A vibration isolator is provided including a base structure, a load structure, a displacement structure and at least one vertical open gap formed by opposing and substantially parallel walls of the base structure and the load structure. The opposing walls being at least partly covered by respective arrays of permanent magnets, neighboring magnets in the arrays having alternating magnetization directions, an arrangement of the permanent magnets in the arrays being such that a gravitational force on the load structure is substantially compensated by a net magnetic force of the base structure on the load structure. The displacement structure relatively displaces arrays of permanent magnets of the opposing walls with respect to each along the gap for adjusting a load capacity of the vibration isolator.
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公开(公告)号：US09753381B2
公开(公告)日：2017-09-05
申请号：US14388773
申请日：2013-02-15
Applicant: ASML Netherlands B.V.
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hans Butler
CPC classification number: G03F7/70758 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F9/70 , H02K41/02
Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction.
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公开(公告)号：US20170010545A1
公开(公告)日：2017-01-12
申请号：US15185626
申请日：2016-06-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Antonius Theodorus Anna Maria Derksen , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay
IPC: G03F7/20
CPC classification number: G03F7/70858 , G03F7/70341 , G03F7/70716 , G03F7/70775 , G03F7/7085
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Abstract translation: 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号：US09442394B2
公开(公告)日：2016-09-13
申请号：US14817998
申请日：2015-08-04
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20 , G05B19/418 , H02P25/06
CPC classification number: G03F7/70725 , G03F7/70716 , G05B19/418 , H02P25/06 , Y02P90/04
Abstract: A multi-stage system includes a stator including a plurality of electric coils; a first stage including a first magnet assembly, the first stage moveable relative to the stator; a second stage including a second magnet assembly, the second stage moveable relative to the stator; a controller configured to position the first and the second stage relative to the stator by activating, respectively, a first subset of the plurality of electric coils to interact with the first magnet assembly and a second subset of the plurality of electric coils to interact with the second magnet assembly, the controller adapted to prevent at least one electric coil, to be simultaneously shared by the first and the second subset to position the first and the second stage on the stator, from activating.
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