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公开(公告)号：DE69404066T2
公开(公告)日：1998-01-15
申请号：DE69404066
申请日：1994-04-05
Applicant: CANON KK
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公开(公告)号：DE69404066D1
公开(公告)日：1997-08-14
申请号：DE69404066
申请日：1994-04-05
Applicant: CANON KK
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公开(公告)号：JP2003113497A
公开(公告)日：2003-04-18
申请号：JP2001311136
申请日：2001-10-09
Applicant: CANON KK
Inventor： IWASAKI TATSUYA , DEN TORU
Abstract: PROBLEM TO BE SOLVED: To provide a nanostructure comprising a porous body having at least two or more different spaces between pores on a substrate. SOLUTION: In the method for manufacturing the nanostructure, the nanostructure has at least a first porous body, and a second porous body having shorter spaces between pores than those in the first porous body, and the manufacturing method has at least a step (A1) of forming a first and a second portions mainly made of aluminum on the substrate, a step (A2) of anodically oxidizing the first portion mainly made of aluminum to form the first porous body, and a step (A3) of anodically oxidizing the second portion mainly made of aluminum to form the second porous body.
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公开(公告)号：JP2002033549A
公开(公告)日：2002-01-31
申请号：JP2000215016
申请日：2000-07-14
Applicant: CANON KK
Inventor： UCHIDA MAMORU , IWASAKI TATSUYA
IPC: H01S5/10
Abstract: PROBLEM TO BE SOLVED: To solve problems of a difficulty in manufacturing a conventional semiconductor ring laser, a large power consumption and a low yield. SOLUTION: The semiconductor ring laser for constituting a ring resonator comprises an optical waveguide on a semiconductor substrate, and an optical crystal structure formed on a periphery of the waveguide in a direction parallel to the substrate.
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公开(公告)号：JP2002020892A
公开(公告)日：2002-01-23
申请号：JP2000201366
申请日：2000-07-03
Applicant: CANON KK
Inventor： DEN TORU , IWASAKI TATSUYA
IPC: B01D67/00 , B01D71/02 , B81B1/00 , C04B38/00 , C25D11/04 , C25D11/20 , H01L21/316 , H01L29/06 , H01L49/00
Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method of a structure having pores capable of controlling the array, interval, position, direction, shape, etc., of the pores manufactured by anodization. SOLUTION: In this manufacturing method of the array of the pores having substantially parallel axes to a surface of a substrate by achieving the anodization of a laminated film with an insulating layer and an anodized layer laminated on the substrate from an end of the laminated film, the anodized layer is a film mainly consisting of aluminum, the anodized layer is held by the insulating layers, the uneven array pattern of the intervals of the pores to be manufactured is made at least on one layer of the insulating layers in the direction of the pores.
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Patent Agency Ranking
公开(公告)号：JP2002004087A
公开(公告)日：2002-01-09
申请号：JP2000187668
申请日：2000-06-22
Applicant: CANON KK
Inventor： DEN TORU , IWASAKI TATSUYA
Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a more regular nanostructure by lessening the disorder and defect made by anodic oxidation. SOLUTION: In the method for manufacturing the nanostructure which anodically oxidizes a layer to be anodically oxidized essentially consisting of Al to form pores, a barrier film is formed by anodic oxidation on the surface of the layer to be anodically oxidized, and after the forming positions of the pores are positioned by removing at least part of the barrier film, the porous film by the anodic oxidation is manufactured.
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公开(公告)号：JP2001205600A
公开(公告)日：2001-07-31
申请号：JP2000019245
申请日：2000-01-27
Applicant: CANON KK
Inventor： IWASAKI TATSUYA , DEN TORU
Abstract: PROBLEM TO BE SOLVED: To provide an alumina nano-tube and a bunch of alumina nano-tubes having highly controlled size and construction. SOLUTION: The alumina nano-tube formed of an alumina having a columnar shape of size 500 nm or less has a columnar slit 53 parallel to the columnar shape. The bunch of alumina nano-tubes consist of the plurality of alumina nano-tubes 51 arrayed and put together in bunch.
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公开(公告)号：JP2001162600A
公开(公告)日：2001-06-19
申请号：JP2000266773
申请日：2000-09-04
Applicant: CANON KK
Inventor： DEN TORU , IWASAKI TATSUYA
Abstract: PROBLEM TO BE SOLVED: To provide a small structure forming an electrically conductive pass only in the inside of a nanohole and forming an enclosure only in the inside of the nanohole in a specific region by using the electrically conductive pass. SOLUTION: This structure has (a) a base plate 13, (b) a plural number of electrically conductive layers 15 arranged with intervals between each other on a surface of the bass plats, (c) a layer with aluminium oxide as a main component to cover a plural number of the electrically conductive layers and the surface of the bass plats positioned between a plural number of the electrically conductive layers and (d) a plural number of pores 12 arranged on the layer with the aluminium oxide as the main component, a plural number of the pores 12 are arranged on a plural number of the electrically conductive layers 15 and a surface 16 of the bass plate positioned between a plural number of the electrically conductive layers through a part of the layer with the aluminium oxide as the main component, and it includes a material on which a part of the layer with the aluminium oxide as the main component arranged between bottom parts of the pores positioned on the electrically conductive layers and the electrically conductive layers constitute the electrically conductive layers.
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公开(公告)号：JP2001138300A
公开(公告)日：2001-05-22
申请号：JP2000253821
申请日：2000-08-24
Applicant: CANON KK
Inventor： OKURA HIROSHI , DEN TORU , IWASAKI TATSUYA
IPC: B23K15/00 , B23K101/38 , B82B1/00 , B82B3/00 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C23F4/00 , C25D11/04 , C25D11/16 , G03F1/54 , G03F7/20 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/316 , H01L49/00 , G03F1/08
Abstract: PROBLEM TO BE SOLVED: To establish a nano-structure manufacturing method capable of forming thin holes in cylindrical shape arranged at any cyclic period on a base over a large area easily at a low cost in a short time. SOLUTION: The manufacturing method for a structure having thin holes comprises a process to prepare a base board 2 having recesses at the surface, a process to form a film 11 as work to be processed on the surface of the board, and a process to subject the film as work to be processed to a positive electrode oxidation.
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公开(公告)号：JP2000254900A
公开(公告)日：2000-09-19
申请号：JP35309499
申请日：1999-12-13
Applicant: CANON KK
Inventor： IWASAKI TATSUYA , DEN TORU
Abstract: PROBLEM TO BE SOLVED: To control the layout, clearance, position, direction and the like of pores by abutting on the upper and lower surfaces of a member mainly composed of aluminum, a pore layout control member made of the same material and anodically oxidizing the member mainly composed of aluminum to form pores. SOLUTION: The members composed mainly of aluminum (Al film) and the pore layout control members 16 are alternately laminated on a base surface (main surface), the surface of the member composed mainly of aluminum is coated with the pore layout control member 16, and the cross section of the laminate is anodically oxidized. Thereby the pores 14 can be formed in the direction substantially in parallel to the base surface and/or the boundary of the pore layout control member 16 and the member composed mainly of aluminum (finally, alumina), that is, substantially in parallel with the base surface (main surface). By mounting the pore layout control member 16 on a side surface of the patterned aluminum on the base, the pores can be arranged substantially vertically to the base surface (main surface).
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