PROCEDE DE PREPARATION D'UN SUBSTRAT METALLISE,LEDIT SUBSTRAT ET SES UTILISATIONS

    公开(公告)号:FR2944982A1

    公开(公告)日:2010-11-05

    申请号:FR0952891

    申请日:2009-04-30

    Abstract: La présente invention concerne un procédé pour préparer un substrat métallisé comprenant les étapes consistant à : greffer sur ledit substrat un composé de type polymère présentant éventuellement un groupement apte à chélater au moins un ion métallique ; mettre ledit composé de type polymère apte à chélater au moins un ion métallique, en contact avec au moins un ion métallique et soumettre le composé de type polymère à des conditions permettant la réduction dudit (ou desdits) ion(s) métallique(s) chélaté(s) et répéter les étapes de chélation/réduction jusqu'à l'obtention d'un substrat métallisé. La présente invention concerne aussi les substrats obtenus durant ce procédé et leurs utilisations.

    66.
    发明专利
    未知

    公开(公告)号:DE60219929T2

    公开(公告)日:2008-01-17

    申请号:DE60219929

    申请日:2002-08-27

    Abstract: The present invention relates to a process for grafting and growing a conductive organic film on(to) an electrically conductive or semiconductive surface in which the grafting and growing of the film are performed simultaneously by electro-reduction of a diazonium salt that is a precursor of the said film on(to) the said surface cathodically polarized at a potential greater than or equal, in absolute value, to the electro-reduction potential of the diazonium salt relative to a reference electrode. The invention finds an application especially in the protection of surfaces, the manufacture of localized conductive coatings, of chemical sensors in the fields of chemistry and molecular biology, the manufacture of biomedical equipment, etc.

    69.
    发明专利
    未知

    公开(公告)号:DE60219929D1

    公开(公告)日:2007-06-14

    申请号:DE60219929

    申请日:2002-08-27

    Abstract: The present invention relates to a process for grafting and growing a conductive organic film on(to) an electrically conductive or semiconductive surface in which the grafting and growing of the film are performed simultaneously by electro-reduction of a diazonium salt that is a precursor of the said film on(to) the said surface cathodically polarized at a potential greater than or equal, in absolute value, to the electro-reduction potential of the diazonium salt relative to a reference electrode. The invention finds an application especially in the protection of surfaces, the manufacture of localized conductive coatings, of chemical sensors in the fields of chemistry and molecular biology, the manufacture of biomedical equipment, etc.

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