公开(公告)号：JP2002296402A

公开(公告)日：2002-10-09

申请号：JP2001254005

申请日：2001-08-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO KOJI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: G03F7/004 ,  C08L67/00 ,  C08L69/00 ,  C08L71/00 ,  C08L81/02 ,  G02B1/04 ,  G02B3/00 ,  G02B5/18 ,  G03F7/039 ,  G03F7/38 ,  G03H1/02 ,  G03H1/04

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive variable refractive index composition for an optical material so that the refractive index of the material can be varied by an easy method, the difference in the varied refractive indices is sufficiently large, and a stable refractive index pattern and optical material can be obtained without depending on the succeeding use conditions. SOLUTION: The radiation-sensitive variable refractive index composition contains (A) a decomposable compound, (B) a non-decomposing compound having the refractive index lower than that of the decomposable compound (A), (C) a radiation-sensitive decomposing agent and (D) a stabilizer. By irradiating the composition with radiation through a pattern mask, the above component (C) and the component (A) in the irradiated part are decomposed to produce a difference in the refractive index between the irradiated part and the non- irradiated part to form a pattern having different refractive indices.

公开(公告)号：JP2001042335A

公开(公告)日：2001-02-16

申请号：JP21582699

申请日：1999-07-29

Applicant: SEIKO EPSON CORP ,  JSR CORP

Inventor： YAZAKI MASAYUKI ,  YAMADA KENICHI ,  MUTSUKA YASUAKI ,  SHIMOKAWA TSUTOMU ,  BESSHO NOBUO

IPC: C08J5/18 ,  C08G73/10 ,  G02F1/1337

Abstract: PROBLEM TO BE SOLVED: To suppress deterioration of an alignment film against light while suppressing manufacturing costs by forming the specified alignment film on a liquid crystal layer side surface of a substrate in a liquid crystal device having liquid crystal interposed between a pair of substrates opposedly disposed. SOLUTION: This liquid crystal device is provided with a TFT array substrate 10 constituting a sample of one transparent substrate and an counter substrate 20 disposed being opposed to the substrate 10 and constituting a sample of the other transparent substrate. And the TFT array substrate 10 is provided with a picture element electrode 9a and an alignment film 16 subjected to a prescribed alignment treatment such as the rubbing treatment is provided on an upper side of the picture element electrode. On the other hand, the counter substrate 20 is provided with a counter electrode 21 over all the surface thereof and an alignment film 22 subjected to a prescribed alignment treatment such as the rubbing treatment is provided on the lower side of the counter electrode 21. Polyimide as an alignment material is applied on the surfaces to film-form the films 16 and 22 and then they are subjected to the rubbing treatment. At this time, aromatic group concentration in the polyimide is specified to be 0-30 wt.%, more preferably 2-25 wt.%.

公开(公告)号：JPH11312860A

公开(公告)日：1999-11-09

申请号：JP11755498

申请日：1998-04-27

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  MASUKO HIDEAKI ,  NEMOTO HIROAKI ,  BESSHO NOBUO

IPC: H01L21/3205 ,  H05K1/03 ,  H05K1/09 ,  H05K3/02 ,  H05K3/06 ,  H05K3/20

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing electrodes by which a high- difinition pattern can be formed and the workability be improved substantially, in comparison to the conventional method by using a transfer film when forming electrodes constituting an electrode wiring or projecting electrode, in a printed circuit board, multilayer circuit board, multi-chip module, LCD, LSI, PDP, EL, FED, etc. SOLUTION: In this manufacturing method, a conductive paste layer formed on a supporting film is transferred to a substrate 11, and a resist film is formed on the conductive paste layer 21, and then the resist film is exposed to form the latent image of a resist pattern. The resist film is developed to form a resist pattern 35, and the conductive paste layer 21 is etched to form the pattern thereof corresponding to the resist pattern, and then the pattern is made to thermoset.

公开(公告)号：JPH11281815A

公开(公告)日：1999-10-15

申请号：JP8645698

申请日：1998-03-31

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： DESHIMARU YUICHI ,  NAKAMURA TOSHIO ,  SHIMIZU YOSHIHIRO ,  NEMOTO HIROAKI ,  BESSHO NOBUO

IPC: G03F7/038 ,  C08L27/20 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin compsn. which can be developed with an alkali aq. soln., which has high resolution, high sensitivity and various characteristics such as heat resistance, chemical resistance and transparency, which can form partition walls in the production of a color filter using an ink-jet recording technique so that an ink as a coloring agent does not spread out of the objective region for coloring and that an ink can be sprayed and applied with excellent surface smoothness in a pixel. SOLUTION: This resin compsn. consists of (A) a fluorine-contg. copolymer of hexafluoropropylene, unsatd. carboxylic acid and/or unsatd. carboxylic acid anhydride and unsatd. compd. which is copolymerizable with the above compds., (B) an acid producing compd. which produces an acid by irradiation of radiation, (C) a crosslinking compd., (D) a fluorine-contg. org. compd. except the component (A), and (E) an org. solvent which dissolves the components (A), (B), (C) and (D).

Abstract translation: 要解决的问题：提供一种辐射敏感树脂。 其可以用碱水溶液开发。 其具有高分辨率，高灵敏度和各种特性，例如耐热性，耐化学性和透明性，其可以使用喷墨记录技术在制造滤色器时形成分隔壁，使得作为着色剂的油墨 不会扩散出用于着色的目标区域，并且可以在像素中喷射并施加优异的表面光滑度的油墨。 解决方案：该树脂组成。 由（A）含氟组成。 共聚物六氟丙烯，不饱和。 羧酸和/或不饱和的。 羧酸酐和不饱和的。 卤素化合物。 其可与上述化合物共聚，（B）酸产生化合物。 其通过辐射照射产生酸，（C）交联组合物，（D）氟 - 有机 卤素化合物。 （A）和（E）组织除外。 溶解组分（A），（B），（C）和（D）的溶剂。

公开(公告)号：JP2008124030A

公开(公告)日：2008-05-29

申请号：JP2007311376

申请日：2007-11-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MASUKO HIDEAKI ,  NEMOTO HIROAKI ,  BESSHO NOBUO

IPC: H01B5/14 ,  H01B1/22 ,  H01J9/02 ,  H01J11/02 ,  H01J11/12 ,  H01J11/22 ,  H01J11/24 ,  H01J11/26 ,  H01J11/34 ,  H01J11/36 ,  H01J11/38 ,  H01J11/40 ,  H01J11/42

Abstract: PROBLEM TO BE SOLVED: To provide a conductive paste composition excellent in the dispersion stability, preservation stability and application characteristics of conductive particles, a transfer film excellent in flexibility and transferability, and a plasma display panel which can be manufactured with a small number of processes and is provided with an electrode of high dimension accuracy.
SOLUTION: The transfer film for electrode formation of the plasma display panel is characterized by that a film forming material layer comprising the conductive paste composition containing conductive particles, a bonder resin and fatty acid is formed on a support film.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供导电性颗粒的分散稳定性，保存稳定性和施加特性优异的柔性和转印性优异的转印膜以及能够以小的制造方法制造的等离子体显示面板的导电性糊剂组合物 工序数，并具有高精度的电极。 解决方案：用于等离子体显示面板的电极形成用转印膜的特征在于，在支撑膜上形成包含导电性糊剂组合物的成膜材料层，其含有导电性粒子，粘结剂树脂，脂肪酸。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004273723A

公开(公告)日：2004-09-30

申请号：JP2003061793

申请日：2003-03-07

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YOKOYAMA YASUAKI ,  BESSHO NOBUO

IPC: H01L21/683 ,  H01L21/304 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To provide a method for carrying a wafer in which the wafer is held tightly on organic polymer after the surface thereof is polished, especially when the polished wafer is thin, so that an element on the surface is not broken and the wafer is protected against fracture and/or deformation. SOLUTION: After a silicon wafer is polished while being held tightly on a substrate, e.g. a hard plate and/or a resilient carrier (backing material) and/or a wafer, using a wafer fixing agent containing a compound having liquid crystal properties and after or before the processed surface is cleaned, an organic polymer film is pasted to the polished surface, the substrate is heated at a temperature not lower than the melting point of the compound having liquid crystal properties, the wafer pasted with the organic polymer film is removed together with the organic polymer film and then transferred to a different place. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004127949A

公开(公告)日：2004-04-22

申请号：JP2003415105

申请日：2003-12-12

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MASUKO HIDEAKI ,  DESHIMARU YUICHI ,  ABE SHIGERU ,  UDAGAWA TADAHIKO ,  KUMANO KOJI ,  BESSHO NOBUO

IPC: H01J9/02 ,  H01J11/22 ,  H01J11/34 ,  H01J11/36 ,  H01J11/02

Abstract: PROBLEM TO BE SOLVED: To provide a barrier rib for a plasma display panel, its manufacturing method, and compositions preferably used for the barrier rib.
SOLUTION: The method for producing the barrier rib for the plasma display panel comprises: (i)a step of forming the film of barrier rib forming compositions having a structure laminating at least two barrier rib forming compositions having a different solubility for a developing solution; (ii)a step of forming a resist film on the film of barrier rib forming compositions; (iii)a step of selectively radiating a radiation on the resist film; (iv)a step of developing the resist film to form a resist pattern; (v)a step of selectively dissolving the film of barrier rib forming compositions through the resist pattern to form the pattern of barrier rib forming compositions; and (vi)a step of firing the pattern of barrier rib forming compositions, wherein the barrier rib forming composition containing: (a)a low melting point glass flit; (b)a binder containing an alkaline soluble resin; and (c)a solvent.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2004115682A

公开(公告)日：2004-04-15

申请号：JP2002282307

申请日：2002-09-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： BESSHO NOBUO ,  YOKOYAMA YASUAKI

IPC: C09J5/00 ,  C09J5/06 ,  C09J11/06 ,  H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a fixing agent capable of strongly fixing one solid material to the other solid material and of separating easily the solid materials from each other after fixing, and also to provide a method for fixing and separating the solid materials using the fixing agent.
SOLUTION: The fixing agent comprises a liquid crystal compound. The fixing method comprises (1) locating the fixing agent between one solid material and the other solid material and (2) melting the fixing agent by heating to fix the one solid material to the other solid material. The separation method comprises separating the two solid materials fixed by the above method under a temperature higher than the melting point of the fixing agent.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003347254A

公开(公告)日：2003-12-05

申请号：JP2002157060

申请日：2002-05-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： BESSHO NOBUO ,  HANAMURA MASAAKI ,  YOKOYAMA YASUAKI

IPC: B24B37/30 ,  C09J11/00 ,  C09J201/00 ,  H01L21/304 ,  H01L21/68 ,  H01L21/683 ,  B24B37/04

Abstract: PROBLEM TO BE SOLVED: To provide a wafer fixing composition containing a specific liquid crystal compound and an organic polymer and a semiconductor wafer processing method using the same, wherein a semiconductor wafer is brought into close contact with a base such as a hard plate, an elastic carrier (packing material), or a wafer and fixed so as to be held when the wafer is processed, the wafer as a work is easily separated, a fixing agent layer attached to the wafer is easily removed and/or cleaned, and the wafer as the work is kept free from contamination. SOLUTION: The wafer fixing composition contains a specific liquid crystal compound and an organic polymer. The wafer fixing composition can be provided in the form of liquid or a film. A thin film of the composition is formed on the wafer or the base. The wafer and the base, either of them is provided with the composition film on its surface, are brought into close contact with each other and fixed with each other. After the exposed surface of the wafer is subjected to processing, the wafer is separated from the base and cleaned, whereby the purpose can be achieved. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：为了提供含有特定液晶化合物和有机聚合物的晶片定影组合物和使用其的半导体晶片处理方法，其中半导体晶片与诸如硬的基底紧密接触 板，弹性载体（包装材料）或晶片，并且在晶片被加工时被固定以被保持，作为工件的晶片容易分离，附着到晶片的固定剂层容易地被去除和/或清洁 ，并且作为工件的晶片保持没有污染。 晶片固定组合物含有特定的液晶化合物和有机聚合物。 晶片定影组合物可以以液体或薄膜的形式提供。 该组合物的薄膜形成在晶片或基底上。 晶片和基板中的任一个在其表面上设置有组合物膜，彼此紧密接触并彼此固定。 在对晶片的暴露表面进行处理之后，将晶片与基板分离并清洁，从而可以实现目的。 版权所有（C）2004，JPO

公开(公告)号：JP2003332278A

公开(公告)日：2003-11-21

申请号：JP2002136995

申请日：2002-05-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： BESSHO NOBUO ,  HANAMURA MASAAKI ,  YOKOYAMA YASUAKI

IPC: B24B37/30 ,  H01L21/304 ,  B24B37/04

Abstract: PROBLEM TO BE SOLVED: To provide a wafer immobilizing agent, a composition for the wafer immobilizing agent and a method of working a wafer by using the same in which a semiconductor wafer is tightly immobilized and held on a substrate such as hard plate, elastic carrier (backing) or wafer when working the semiconductor wafer, the wafer of an object to be worked is easily released, further, a layer of the immobilizing agent stuck on the wafer is easily removed and irrigated and there is no danger of contamination with respect to the wafer of the object to be worked. SOLUTION: A liquid crystal compound is used as the immobilizing agent. Besides, the composition for immobilization contains the liquid crystal compound. By using them, a thin film of the liquid crystal compound is formed on a surface of the wafer or of the substrate and by using at least either one of the wafer or the substrate formed with the thin film on its surface, the both are tightly contacted and immobilized. Then, an exposed face of the wafer is worked and the wafer is separated from the substrate and irrigated to work the wafer. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供晶片固定剂，晶片固定剂组合物和使用其中半导体晶片紧密固定并保持在诸如硬板的基板上的晶片固定剂的方法 ，在加工半导体晶片时的弹性载体（背衬）或晶片，待加工物体的晶片容易释放，并且易于去除和灌溉固定在晶片上的固定剂层，并且没有污染的危险 相对于待加工物体的晶片。 解决方案：使用液晶化合物作为固定剂。 此外，用于固定的组合物含有液晶化合物。 通过使用它们，在晶片或基板的表面上形成液晶化合物的薄膜，并且通过使用在其表面上形成有薄膜的晶片或基板中的至少一个，两者都紧密 接触并固定。 然后，加工晶片的曝光面，并将晶片与基板分离并灌注以对晶片进行加工。 版权所有（C）2004，JPO