公开(公告)号：AT498634T

公开(公告)日：2011-03-15

申请号：AT02028496

申请日：2002-12-19

Applicant: JSR CORP

Inventor： YAMADA KENJI ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  KONNO KEIJI

IPC: C08F2/44 ,  C08F291/00 ,  C08G59/68 ,  G02B1/04 ,  G02B3/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075

Abstract: A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.

公开(公告)号：AU2002323913B2

公开(公告)日：2007-10-18

申请号：AU2002323913

申请日：2002-12-20

Applicant: JSR CORP

Inventor： BESSHO NOBUO ,  KUMANO ATSUSHI ,  YAMADA KENJI ,  KONNO KEIJI

IPC: G03F7/004 ,  C08F2/44 ,  C08F283/12 ,  C08F291/00 ,  C08G59/68 ,  C09D151/08 ,  G02B1/04 ,  G02B3/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075

Abstract: A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.

公开(公告)号：AU2002233644B2

公开(公告)日：2006-09-28

申请号：AU2002233644

申请日：2002-02-18

Applicant: JSR CORP

Inventor： YAMADA KENJI ,  NISHIMURA ISAO ,  KUMANO ATSUSHI ,  BESSHO NOBUO

IPC: C08L101/00 ,  G02B3/00 ,  G02B5/02 ,  G02B5/18 ,  G02B6/00 ,  G02B6/12 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: A method of forming a refractive index pattern or an optical material stable regardless of use conditions, which provides a sufficiently large change in refractive index by a simple method. The refractive index pattern or optical material is formed by exposing a refractive index changing composition which comprises (A) a decomposable compound, (B) a non-decomposable compound containing inorganic oxide particles and (C) a radiation sensitive decomposer to radiation and then treating it with (D) a stabilizer.

公开(公告)号：CA2387716A1

公开(公告)日：2002-03-07

申请号：CA2387716

申请日：2001-08-24

Applicant: JSR CORP

Inventor： BESSHO NOBUO ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI ,  KUMANO ATSUSHI ,  NISHIMURA ISAO

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G02B3/00 ,  C08L101/00 ,  G03H1/02 ,  G02B6/12 ,  G03F7/36

Abstract: A composition having a refractive index sensitively changeable by a radiatio n which comprises (A) a decomposable compound, (B) a non-decomposable compound having a refractive index lower than that of the decomposable compound (A), (C) a radiation-sensitive decomposing agent, and (D) a stabilizer. The irradiation of the composition with a radiation ray via a mask decomposes th e above (C) and (A) components in a irradiated portion, resulting in the occurrence of the difference in refractive index between an irradiated porti on and a non-irradiated portion, which leads to the formation of a pattern havi ng regions of different refractive indexes.

公开(公告)号：CA2414760A1

公开(公告)日：2003-06-21

申请号：CA2414760

申请日：2002-12-19

Applicant: JSR CORP

Inventor： KUMANO ATSUSHI ,  BESSHO NOBUO ,  YAMADA KENJI ,  KONNO KEIJI

IPC: C08F2/44 ,  C08F291/00 ,  C08G59/68 ,  G02B1/04 ,  G02B3/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  G02F1/19 ,  G02B1/00 ,  C09K3/00 ,  G02B6/18

Abstract: A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.

公开(公告)号：CA2408217A1

公开(公告)日：2002-11-12

申请号：CA2408217

申请日：2002-03-08

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  YAMADA KENJI ,  BESSHO NOBUO ,  KUMANO ATSUSHI

IPC: G02B1/04 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G02B3/00 ,  G02B6/00 ,  C08L81/00 ,  C08L85/00 ,  C08L83/04 ,  G02B6/12

Abstract: A composition which can be changed in refractive index by a simple method to give a refractive-index pattern and an optical material in each of which the resultant difference in refractive index is significantly large and is stabl e regardless of conditions of use thereafter; and a method of forming the pattern or optical material. The composition comprises (A) a decomposable compound, (B) a hydrolyzate of an alkoxide such as tetrabutoxytitanium, tetramethoxyzirconium, tetramethoxygermanium, or tetramethoxysilane or of a halide such as tetrachlorosilane, and (C) a radiation-sensitive decomposer. The composition is sensitive to a radiation.

公开(公告)号：AU8015701A

公开(公告)日：2002-03-13

申请号：AU8015701

申请日：2001-08-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/36 ,  C08L101/00 ,  G02B3/00 ,  G02B6/12 ,  G03H1/02

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

公开(公告)号：CA2424557A1

公开(公告)日：2003-03-31

申请号：CA2424557

申请日：2002-07-25

Applicant: JSR CORP

Inventor： KUMANO ATSUSHI ,  YAMADA KENJI ,  BESSHO NOBUO ,  NISHIMURA ISAO

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  H01L21/312 ,  H01L23/12 ,  H05K1/00 ,  H05K1/16 ,  C08L101/00 ,  G03F7/36

Abstract: A composition having a permitivity being radiation-sensitively changeable, which comprises (A) a decomposable compound, (B) a non-decomposable compound , (C) a radiation- sensitive decomposer and (D) a stabilizer. The composition allows the achievement of the change of the permitivity of a material, which is satisfactorily great and stable, in an easy and simple manner, and thus c an provide a permitivity pattern and an optical material having a satisfactory distribution of permitivity being stable independently of the condition for its use.

公开(公告)号：CA2431358A1

公开(公告)日：2002-06-20

申请号：CA2431358

申请日：2001-12-06

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  NISHIMURA ISAO ,  YAMADA KENJI ,  BESSHO NOBUO ,  KUMANO ATSUSHI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G03F7/36 ,  G03F7/38

Abstract: A radiation-sensitive composition changing in refractive index which compris es (A) a decomposable compound, (B) a nondecomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation-sensiti ve decomposer, and (D) a stabilizer. When the composition is irradiated with a radiation through a pattern mask, the ingredients (C) and (A) in the irradiated areas decompose to cause a difference in refractive index between the irradiated areas and the unirradiated areas. Thus, a pattern having different refractive indexes is formed.

公开(公告)号：EP1235104A4

公开(公告)日：2008-10-01

申请号：EP01958481

申请日：2001-08-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G02B3/00 ,  G02B6/12 ,  G03F7/36 ,  G03H1/02

CPC classification number: C08L83/14 ,  C08L67/00 ,  C08L69/00 ,  C09D183/06 ,  G02B1/045 ,  G02B5/1857 ,  G02B6/124 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0757 ,  C08L2666/02 ,  C08L2666/28

Abstract: A composition having a refractive index sensitively changeable by a radiation which comprises (A) a decomposable compound, (B) a non-decomposable compound having a refractive index lower than that of the decomposable compound (A), (C) a radiation-sensitive decomposing agent, and (D) a stabilizer. The irradiation of the composition with a radiation ray via a mask decomposes the above (C) and (A) components in a irradiated portion, resulting in the occurrence of the difference in refractive index between an irradiated portion and a non-irradiated portion, which leads to the formation of a pattern having regions of different refractive indexes.