公开(公告)号：US20140239200A1

公开(公告)日：2014-08-28

申请号：US14186366

申请日：2014-02-21

Applicant: NuFlare Technology, Inc

Inventor： Nobuo MIYAMOTO

IPC: H01J37/304 ,  H01J37/317

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/06 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0653 ,  H01J2237/24585 ,  H01J2237/30461

Abstract: A cathode operating temperature adjusting method includes acquiring an approximate equation approximating a correlation between an emission current value in an electron beam source using a cathode and an operating temperature of the cathode at which a bias voltage becomes saturated at the emission current, measuring a current density of an electron beam from the cathode when in the state where an n-th emission current value and an n-th cathode operating temperature are set in the electron beam source, determining whether the measured current density is within a first tolerance range, changing the n-th emission current value to an (n+1)th emission current value when the measured current density is not within the first tolerance range, calculating an operating temperature of the cathode corresponding to the (n+1)th emission current value by the approximate equation, and setting the calculated operating temperature, as an (n+1)th cathode operating temperature, in the electron beam source.

Abstract translation: 阴极工作温度调节方法包括获取接近于使用阴极的电子束源中的发射电流值与在发射电流下偏置电压饱和的阴极的工作温度之间的相关性的近似方程，测量电流密度 当在电子束源中设置第n个发射电流值和第n个阴极操作温度的状态下，确定所测量的电流密度是否处于第一公差范围内，从而改变阴极的电子束 当测量的电流密度不在第一公差范围内时，将第n发射电流值设置为第（n + 1）个发射电流值，通过以下方式计算与第（n + 1）个发射电流值对应的阴极的工作温度： 近似等式，并将计算出的工作温度设定为电子束源中的第（n + 1）个阴极工作温度。

公开(公告)号：US08785878B2

公开(公告)日：2014-07-22

申请号：US13680759

申请日：2012-11-19

Applicant: Canon Kabushiki Kaisha

Inventor： Keiichi Arita ,  Masahito Shinohara

IPC: G21K5/04 ,  H01J37/30 ,  H01J37/317 ,  H01J3/26 ,  H01J29/70

CPC classification number: H01J37/30 ,  B82Y10/00 ,  B82Y40/00 ,  G21K5/10 ,  H01J3/26 ,  H01J29/70 ,  H01J37/244 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/24542 ,  H01J2237/30433 ,  H01J2237/3175

Abstract: An apparatus includes an irradiation device configured to irradiate an object with charged particle beams, a measurement device configured to measure a characteristic of each of charged particle beams, and a controller. The measurement device includes a plate including knife edges, and a sensor configured to detect a charged particle beam incident thereon via the plate. The controller causes one charged particle beam, selected from the charged particle beams, to perform a scan relative to the measurement device so that the one charged particle beam traverses at least two knife edges among the plurality of knife edges, and to generate correction information for correcting a measurement error of the measurement device due to deformation of the plate, based on an output from the sensor upon the scan.

Abstract translation: 一种装置，包括被配置为对物体照射带电粒子束的照射装置，被配置为测量每个带电粒子束的特性的测量装置和控制器。 该测量装置包括一个包括刀刃的板，以及一个传感器，被配置成检测通过该板入射到其上的带电粒子束。 所述控制器使从所述带电粒子束中选出的一个带电粒子束相对于所述测量装置执行扫描，使得所述一个带电粒子束在所述多个刀刃之间穿过至少两个刀刃，并产生用于 基于扫描时的传感器的输出，校正由于板的变形引起的测量装置的测量误差。

公开(公告)号：US08710451B2

公开(公告)日：2014-04-29

申请号：US13251174

申请日：2011-09-30

Applicant: Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

Inventor： Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

IPC: H01J37/317

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having a plurality of first defection electrodes 51a, 51b, 51c and a plurality of second deflection electrodes 52a, 52b, 52c wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plurality of second deflection electrodes such that electric deflection fields between the plurality of second deflection electrodes and the plurality of opposite first deflection electrodes have a common orientation. The ion beam system has a high kinetic energy mode in which a distribution of the electric deflection fields has a greater width, and a low kinetic energy mode in which a distribution of the electric deflection fields has a smaller width.

Abstract translation: 离子束系统包括电压供应系统7和具有多个第一偏移电极51a，51b，51c和多个第二偏转电极52a，52b，52c的至少一个光束偏转器39，其中电压供应系统被配置为供应 对多个第二偏转电极的不同的可调偏转电压使得多个第二偏转电极和多个相对的第一偏转电极之间的电偏转场具有共同的取向。 离子束系统具有高动能模式，其中电偏转场的分布具有较大的宽度，以及低动能模式，其中电偏转场的分布具有较小的宽度。

公开(公告)号：US08624206B2

公开(公告)日：2014-01-07

申请号：US13655129

申请日：2012-10-18

Applicant: FEI Company

Inventor： Tom Miller ,  Gene Mirro ,  Cornelis Sander Kooijman ,  Hendrik Jan de Vos

IPC: H01J3/26

CPC classification number: H01J3/26 ,  H01J37/1472 ,  H01J37/1477 ,  H01J37/3026 ,  H01J2237/1504 ,  H01J2237/1518 ,  H01J2237/1526 ,  H01J2237/30416 ,  H01J2237/3045 ,  H01J2237/30461

Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.

Abstract translation: 引导带电粒子束的改进方法，其补偿带电粒子通过改变一个或多个偏转器信号而穿过系统所需要的时间。 根据本发明的一个实施例，在数模（D / A）转换之前，将数字滤波器应用于扫描图案，以便减少或消除可能由TOF误差引起的过拍影响。 在其他实施例中，也可以使用模拟滤波器或具有较低带宽的信号放大器的使用来补偿TOF误差。 通过改变扫描图案，可以显着减少或消除超拍效果。

公开(公告)号：US20130256554A1

公开(公告)日：2013-10-03

申请号：US13722774

申请日：2012-12-20

Applicant: Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

Inventor： Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

IPC: H01J3/26

CPC classification number: H01J3/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  Y10T29/49002

Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

Abstract translation: 本发明涉及一种用于将多个带电粒子子束引导到位于下游方向的图像平面上的投影透镜组合模块，以及用于组装这种投影透镜组件的方法。 特别地，本发明公开了一种具有增强的结构完整性和/或其最下游电极的放置精度提高的模块化投影透镜组件。

公开(公告)号：US20130143161A1

公开(公告)日：2013-06-06

申请号：US13680759

申请日：2012-11-19

Applicant: CANON KABUSHIKI KAISHA

Inventor： Keiichi ARITA ,  Masahito SHINOHARA

IPC: G21K5/10

CPC classification number: H01J37/30 ,  B82Y10/00 ,  B82Y40/00 ,  G21K5/10 ,  H01J3/26 ,  H01J29/70 ,  H01J37/244 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/24542 ,  H01J2237/30433 ,  H01J2237/3175

Abstract: An apparatus includes an irradiation device configured to irradiate an object with charged particle beams, a measurement device configured to measure a characteristic of each of charged particle beams, and a controller. The measurement device includes a plate including knife edges, and a sensor configured to detect a charged particle beam incident thereon via the plate. The controller causes one charged particle beam, selected from the charged particle beams, to perform a scan relative to the measurement device so that the one charged particle beam traverses at least two knife edges among the plurality of knife edges, and to generate correction information for correcting a measurement error of the measurement device due to deformation of the plate, based on an output from the sensor upon the scan.

Abstract translation: 一种装置，包括被配置为对物体照射带电粒子束的照射装置，被配置为测量每个带电粒子束的特性的测量装置和控制器。 该测量装置包括一个包括刀刃的板，以及一个传感器，被配置成检测通过该板入射到其上的带电粒子束。 所述控制器使从所述带电粒子束中选出的一个带电粒子束相对于所述测量装置执行扫描，使得所述一个带电粒子束在所述多个刀刃之间穿过至少两个刀刃，并产生用于 基于扫描时的传感器的输出，校正由于板的变形引起的测量装置的测量误差。

公开(公告)号：US20130075622A1

公开(公告)日：2013-03-28

申请号：US13702419

申请日：2010-08-20

Applicant: Tadashi Katayose

Inventor： Tadashi Katayose

IPC: A61N5/10 ,  G21K5/02 ,  H01J3/26

CPC classification number: A61N5/1077 ,  A61N5/1043 ,  A61N2005/1087 ,  G21K5/02 ,  H01J3/26

Abstract: The particle beam irradiation apparatus irradiates a charged particle beam accelerated by a accelerator onto an irradiation subject; the particle beam irradiation apparatus includes a scanning electromagnet that scans the charged particle beam, and a scanning electromagnet moving apparatus that moves the scanning electromagnet in such a way as to change the distance between the scanning electromagnet and the irradiation subject in the beam axis direction of the charged particle beam.

Abstract translation: 粒子束照射装置将由加速器加速的带电粒子束照射到照射对象上; 粒子束照射装置包括扫描带电粒子束的扫描电磁体和扫描电磁体移动装置，该扫描电磁体移动装置以扫描电磁体的方式移动扫描电磁体，以使扫描电磁体和被照射对象之间在射束轴方向上的距离 带电粒子束。

公开(公告)号：US20120126136A1

公开(公告)日：2012-05-24

申请号：US13294380

申请日：2011-11-11

Applicant: Hirohito Ito

Inventor： Hirohito Ito

IPC: H01J3/26

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/3177 ,  H01J2237/304 ,  H01J2237/31766

Abstract: A charged-particle beam exposure apparatus which includes a deflector that deflects a charged-particle beam, and a stage mechanism that drives a substrate, and draws a pattern on the substrate while scanning the charged-particle beam in a main-scanning direction by the deflector and scanning the substrate in a sub-scanning direction by the stage mechanism. The apparatus includes a blanker unit configured to control irradiation and unirradiation of the substrate with the charged-particle beam, and a controller configured to control the deflector to deflect the charged-particle beam in the sub-scanning direction by an amount of driving of the substrate in the sub-scanning direction by the stage mechanism during a period of time from stop of drawing on the substrate until restart thereof when the drawing on the substrate is stopped and then restarted while the substrate is driven in the sub-scanning direction by the stage mechanism.

Abstract translation: 一种带电粒子束曝光装置，其包括使带电粒子束偏转的偏转器，以及驱动基板的级机构，并且在主扫描方向上沿着主扫描方向扫描带电粒子束时在基板上绘制图案 偏转器，并通过平台机构沿副扫描方向扫描基板。 该设备包括：配置成控制带有带电粒子束的衬底的照射和未照射的消隐器单元;以及控制器，被配置为控制偏转器以使带电粒子束在副扫描方向上偏转一定量的驱动 基板在副扫描方向上由底板机构在基板停止时的时间内直到重新起动，当基板上的拉拔停止时再次启动，同时基板沿副扫描方向被驱动 舞台机制。

公开(公告)号：US20110084220A1

公开(公告)日：2011-04-14

申请号：US12901468

申请日：2010-10-08

Applicant: Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

Inventor： Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

IPC: G21K1/08 ,  H05K13/00

CPC classification number: H01J3/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  Y10T29/49002

Abstract: The present invention relates to a projection leis assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

Abstract translation: 本发明涉及一种用于将大量带电粒子子束引导到位于下游方向上的图像平面上的投射透镜组件模块，以及用于组装这种投影透镜组件的方法。 特别地，本发明公开了一种具有增强的结构完整性和/或其最下游电极的放置精度提高的模块化投影透镜组件。

公开(公告)号：US07214117B2

公开(公告)日：2007-05-08

申请号：US10853519

申请日：2004-05-26

Applicant: Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

Inventor： Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

IPC: H01L21/00

CPC classification number: H01J9/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/1477 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1516 ,  H01J2237/31793

Abstract: The present invention relates to a deflector of a micro-column electron beam apparatus and method for fabricating the same, which forms a seed metal layer and a mask layer on both sides of a substrate, and exposes some of the seed metal layer on which deflecting plates, wirings and pads are to be formed by lithography process using a predetermined mask. The wirings and pads are formed by plating metal on the exposed portion, and some of the metal layer is also exposed on which the deflecting plates are to be formed using a predetermined mask, and then the metal is plated with desired thickness, thereby the deflecting plates are completed. Therefore, by forming plurality of deflecting plates on both sides of the substrate at the same time through plating process, alignment between the deflecting plates formed on both sides of the substrate can be exactly made, and by fabricating a deflector integrated with the substrate and deflecting plates in a batch process, productivity and reproducibility is improved. In addition, since the deflecting plates, wirings and pads are directly formed on the substrate, structural safety is improved and thereby durability is also improved.

Abstract translation: 微柱电子束装置的偏转器及其制造方法技术领域本发明涉及一种微柱电子束装置的偏转器及其制造方法，其在基板的两面形成种子金属层和掩模层，并使一些种子金属层露出偏转 板，布线和焊盘将通过使用预定掩模的光刻工艺形成。 布线和焊盘通过在暴露部分上电镀金属而形成，并且一些金属层也暴露在其上将使用预定掩模在其上形成偏转板，然后以期望的厚度镀覆金属，由此偏转 板块完成。 因此，通过电镀处理同时在基板的两面形成多个偏转板，可以精确地形成形成在基板两侧的偏转板之间的对准，并且通过制造与基板一体化的偏转板和偏转 分批处理板，提高了生产率和再现性。 此外，由于偏转板，布线和焊盘直接形成在基板上，所以结构安全性得到改善，从而也提高了耐久性。