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公开(公告)号：JP5065362B2
公开(公告)日：2012-10-31
申请号：JP2009272769
申请日：2009-11-30
Applicant: エナジー サイエンシーズ,インコーポレイティド
Inventor： クロウ，ハーベイ , ハナフィン，ジョージ , ラングワラ，イムティアズ
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公开(公告)号：JP2010048823A
公开(公告)日：2010-03-04
申请号：JP2009272769
申请日：2009-11-30
Applicant: Energy Sciences Inc , エナジー サイエンシーズ,インコーポレイティド
Inventor： RANGWALLA IMTIAZ , CLOUGH HARVEY , HANNAFIN GEORGE
Abstract: PROBLEM TO BE SOLVED: To provide a particle beam processing device that is smaller in size and operates at a higher efficiency, concerning a particle beam processing device including a particle beam generating assembly, a foil support assembly having a thin foil, and a processing zone causing a chemical reaction on a substrate or on a coating.
SOLUTION: The processing device includes a particle beam generating assembly 110, a foil support assembly 140, and a processing assembly 170. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to a particle beam processing device through a processing zone and is exposed to the electrons exiting from the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：提供一种粒子束处理装置，其尺寸更小并且以更高的效率运行，涉及包括粒子束产生组件的粒子束处理装置，具有薄箔的箔支撑组件和 处理区域，在基材或涂层上引起化学反应。 解决方案：处理装置包括粒子束产生组件110，箔支撑组件140和处理组件170.在粒子束产生组件中，通过在 最少一根钨丝。 然后提取电子以高速行进到箔片支撑组件，箔片支撑组件设置在比颗粒束产生组件低得多的电压下。 衬底通过处理区域被馈送到粒子束处理装置，并且暴露于离开粒子束产生组件并进入处理区的电子。 电子穿透和固化基板，导致化学反应。 版权所有（C）2010，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JP2000011933A
公开(公告)日：2000-01-14
申请号：JP17556998
申请日：1998-06-23
Applicant: UNIV NAGOYA
Inventor： MORITA SHINZO , OGAWA SHINJI
IPC: H01J37/06 , H01J33/00 , H01J37/073 , H01J37/301 , H01J37/305
Abstract: PROBLEM TO BE SOLVED: To provide a small and less expensive electron beam generator that generates effectively an electron beam that has large electron current and also has high acceleration energy. SOLUTION: A thermal electron emission negative electrode quipped with a tungsten filament 14 and a cold cathode 15 connected to it, and a ring-like positive electrode 17 are arranged facing opposite to each other in a container 11, an accelerating D.C. power source 26 is connected between the cold cathode and the positive electrode. The container 11 is filled with a thin gas, for instance, argon gas at a pressure of 0.1-1,000 mTorr. Since the electron space charge of the thermal electron emission negative electrode is neutralized by positive ions produced by the discharge of the thin gas, an extremely large electron current is emitted from the thermal electron emitting negative electrode. In addition, an electric field distribution is varied by a plasma produced through the discharge of the thin gas, and a large electric field is formed in a positive electrode drop region is formed, and thereby the electrons are accelerated to high energy.
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公开(公告)号：JPH11169438A
公开(公告)日：1999-06-29
申请号：JP34009897
申请日：1997-12-10
Applicant: ISHIKAWAJIMA HARIMA HEAVY IND
Inventor： SHIRAKAWA TADAHIDE
Abstract: PROBLEM TO BE SOLVED: To provide a compact electron beam irradiation device capable of performing sterilization by electron beams suited to the kind of an object to be sterilized. SOLUTION: By controlling the amount of electrons emitted from an electron gun 3 and made incident on an acceleration tube 6 corresponding to the kind of the object 1 to be sterilized by a current amount control means 18, the electron beams suited to the object 1 to be sterilized is irradiated, and since the need of using a tank like an electrostatic type electron beam irradiation device is eliminated, this device is compacted. Also, by providing a speed control means 17 on a conveyor 2, by slowing or accelerating the carrying speed of the conveyor 2 in the case that the size and weight of the object 1 to be sterilized exceeds a range controllable by the current amount control means 18, the energy value and irradiation amount of the electron beams irradiated to the object 1 to be sterilized become the appropriate size, and thus, the sterilization is performed by more suitable electron beams and the degradation of the conveyor 2 or the like is prevented.
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公开(公告)号：JPH1144800A
公开(公告)日：1999-02-16
申请号：JP20310497
申请日：1997-07-29
Applicant: ISHIKAWAJIMA HARIMA HEAVY IND
Inventor： KANEKO NAMIO
Abstract: PROBLEM TO BE SOLVED: To improve the reliability of an electron beam irradiation device. SOLUTION: This electron beam irradiation device is provided with a vacuum barrel 13 closed at the base end section and opened at the tip section, a window member 14 closing the tip section of the vacuum barrel 13, a differential exhaust barrel 15 fitted to the window member 14, a differential exhaust barrel window member 16 closing the tip section of the differential exhaust barrel 15, a horn 2 fitted to the differential exhaust barrel window member 16, a cathode 3 arranged in the vacuum barrel 13, an anode 4 arranged in the vacuum barrel 13, a magnet 6 arranged on the outer peripheral section of the differential exhaust barrel 15, a vacuum pump 8 connected to the vacuum barrel 13, and a differential exhaust vacuum pump 17 connected to the differential exhaust barrel 15. When the airtightness of the window member 16 is lowered, the inflow of the atmospheric air into the vacuum barrel 13 is suppressed by the window member 14. When the airtightness of both window members 14, 16 is lowered, most of the atmospheric air flowing into the differential exhaust barrel 15 is sucked by the differential exhaust vacuum pump 17, and a burnout of the cathode 3 is prevented.
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公开(公告)号：JPH08271634A
公开(公告)日：1996-10-18
申请号：JP8650595
申请日：1995-03-17
Applicant: TRYGON INC
Inventor： NABLO SAMUEL V , KNEELAND DAVID R
Abstract: PURPOSE: To exactly measure kinetic energy of electron and monitor a critical intervening elements by constituting irradiation window frame with a special metal and measuring bremsstrahlung X-ray flux signal generated in supporting metal foils. CONSTITUTION: Irradiation window frame parts supporting metal foils (titan for example) constituting an electron penetratable irradiation window frame being as an X-ray generation heavy metal radiation source (positive electrode) are formed with Al, Cu etc. Fluorescence intensity, X-ray and vortex electron energy are filtered and absorbed with detectors or vacuum walls. Ca. 20 to 25% of the electron beam is shielded with the window frame support part and to check the mutual correlation between the beam direction and rectangular direction to the beam, bremsstrahlung state of converged electron beam generated on electron stopping plane p-p' in the window frame is continuously measured. When this measured value is corrected so that the voltage and the temperature become specific values, a real time radiation monitor detects quantity data as exact as within ±1%. By this method, three kinds of critical intervening elements such as component gain, uniformity and energy and the like can be monitored.
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公开(公告)号：JPH05225934A
公开(公告)日：1993-09-03
申请号：JP30691992
申请日：1992-11-17
Applicant: ENERGY SCIENCES INC
Inventor： TSUBUI ABUNERII , UIREMU BUAN DE SUTATSUTO , MAIKURU JIYON SAUZA
Abstract: PURPOSE: To provide an electron gun including structural features having an extremely large width so that its width can be changed and improved homogeneity of a beam can be achieved. CONSTITUTION: A novel parallel filament electron gun is used for an electron beam emission accelerator or generator and for similar type of equipment. For the generation of electrons, the electron gun is provided with a substantially coplaner, similar filament F extended between a plurality of extractor grids G having the same lower spread extend longitudinally, and are spaced in parallel with one another transversely and a surface of the electrostatic lenses ESL having the same upper spread are provided to form electron beam characteristics.
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