Ionization vacuum gauge
    61.
    发明专利
    Ionization vacuum gauge 审中-公开
    离子真空计

    公开(公告)号:JP2005062167A

    公开(公告)日:2005-03-10

    申请号:JP2004216369

    申请日:2004-07-23

    CPC classification number: G01L21/34

    Abstract: PROBLEM TO BE SOLVED: To provide a miniaturized vacuum gauge that has high sensitivity and does not disturb the measurement of pressure greatly.
    SOLUTION: An ionization vacuum gauge measures a residual pressure of a gaseous substance remaining in a container 10 more concretely after operating a vacuum pump. The vacuum gauge comprises a cathode 17 for emitting electrons, a grid 13 for accelerating electrons emitted by the cathode, and a plate 15 for capturing gas ions or positively ionized molecules. The plate is arranged outside the grid. The value of the residual pressure in the container can be determined by measuring a plate current by a galvanometer.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题:提供具有高灵敏度并且不会大大影响压力测量的小型化真空计。 解决方案:电离真空计在操作真空泵之后更具体地测量残留在容器10中的气态物质的残留压力。 真空计包括用于发射电子的阴极17,用于加速由阴极发射的电子的栅极13和用于捕获气体离子或正离子化分子的板15。 板被布置在电网外。 容器中残留压力的值可以通过用电流计测量板电流来确定。 版权所有(C)2005,JPO&NCIPI

    HIGH-PRESSURE OPERATION FOR FIELD EMISSION COLD CATHODE

    公开(公告)号:JP2000353492A

    公开(公告)日:2000-12-19

    申请号:JP2000116161

    申请日:2000-04-18

    Applicant: CIT ALCATEL

    Abstract: PROBLEM TO BE SOLVED: To provide a gas detecting or measuring method and a device reduced in danger of breakdown of a field emission cathode. SOLUTION: The system for generating electrons with a field emission cathode 1 includes an array of electron emission micro-points 4-7 correlated with a grid 13 and carried by a substrate 3, and the substrate 3 has integral heater means 25-28 for heating the micro-points 4-7 in the range of about 300-400 deg.C and keeping the micro-points 4-7 at the temperature during electron emission. The cathode 1 can function at a higher residual air pressure without the danger of breakdown.

    ION SOURCE
    63.
    发明专利

    公开(公告)号:JP2000039375A

    公开(公告)日:2000-02-08

    申请号:JP20611598

    申请日:1998-07-22

    Abstract: PROBLEM TO BE SOLVED: To obtain an ion source which prevents a gas from being adsorbed to an electron collector during the operation of the ion source and which is not influenced by electron simulated desorption(ESD). SOLUTION: In an ion source, an airtight vacuum chamber 5 which is maintained in a vacuum state is provided, an electron emitter 1 which is arranged inside the vacuum chamber 5 and which emits electrons into the vacuum chamber 5 is provided, an electron collector 2 which holds and moves the electrons emitted from the electron emitter 1 is provided, and an ion collector 3 which pulls out ions generated inside the vacuum chamber 5 is provided. In addition, a heating means which heats the electron collector 2 by a means other than an electron impact means is provided. A temperature rise at 600 deg.C or higher at which a gas emission due to the diffusion of a gas from the electron collector 2 is increased is prevented. A temperature range of 400 to 600 deg.C is set as a temperature range which can prevent the adsorption of gas molecules surely is set.

    MICRO VACUUM PUMP AND DEVICE FOR MOUNTING MICRO VACUUM PUMP

    公开(公告)号:JPH1154070A

    公开(公告)日:1999-02-26

    申请号:JP21207697

    申请日:1997-08-06

    Applicant: NEC CORP

    Inventor: ITO FUMINORI

    Abstract: PROBLEM TO BE SOLVED: To assure quality as a vacuum pump by enhancing exhausting capability to rare gas as well as active gas and provide a getter effect well reproducible and stable over a long period of time. SOLUTION: This vacuum pump is equipped with a first conductive substrate 2 having a multiplicity of micro projection parts 5, and a second conductive substrate 4 which is disposed at a fixed space from the first conductive substrate 2 and to which a potential lower than that the micro projection parts 5 have is applied. Gate electrodes 3 confronting the second conductive substrate 4 are disposed on the first conductive substrate 2 via insulation layers 6, and the gate electrodes 3 are positioned near the micro protection parts 5 and each comprise an electrode to which a potential lower than that the micro projection parts 5 have is applied.

    IONIZING CHAMBER FOR PRESSURE MEASUREMENT OR MASS SPECTROMETRY

    公开(公告)号:JPH07153419A

    公开(公告)日:1995-06-16

    申请号:JP30268493

    申请日:1993-12-02

    Inventor: OSHIMA CHUHEI

    Abstract: PURPOSE:To prevent a stain in an ionizing chamber and attain pressure measurement or mass spectrometry with high accuracy in the ultra-high vacuum atmosphere. CONSTITUTION:An ionizing chamber 2 is made of a noble metal material which is inactive in adsorption of a gaseous molecule. A cold cathode incapable of generating an evaporation material is used as an electron source 6. In the case of use of a hot cathode, a shielding plate is disposed along an electron orbit 3, and only an electron is introduced into the ionizing chamber 2 via a reflection plate. Consequently, an ESD ion is not taken into a collector 5 so that a pressure or mass in the ultra-high vacuum atmosphere can be measured with high accuracy.

    JPS6176678U -
    67.
    实用新型

    公开(公告)号:JPS6176678U

    公开(公告)日:1986-05-23

    申请号:JP16145384

    申请日:1984-10-25

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