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    SILICON SUBSTRATES WITH DOPED SURFACE CONTACTS FORMED FROM DOPED SILICON INKS AND CORRESPONDING PROCESSES
    71.
    发明申请
    SILICON SUBSTRATES WITH DOPED SURFACE CONTACTS FORMED FROM DOPED SILICON INKS AND CORRESPONDING PROCESSES 审中-公开
    具有由掺杂硅油和相应工艺形成的掺杂表面的硅基材

    公开(公告)号：WO2012106137A2

    公开(公告)日：2012-08-09

    申请号：PCT/US2012/022215

    申请日：2012-01-23

    Applicant: NANOGRAM CORPORATION ,  LIU, Guojun ,  SRINIVASAN, Uma ,  CHIRUVOLU, Shivkumar

    Inventor： LIU, Guojun ,  SRINIVASAN, Uma ,  CHIRUVOLU, Shivkumar

    IPC: H01L31/042 ,  H01L31/0216 ,  H01L31/18

    CPC classification number: H01L21/2252 ,  B82Y30/00 ,  H01L21/2225 ,  H01L21/228 ,  H01L31/068 ,  H01L31/0682 ,  H01L31/1804 ,  Y02E10/52 ,  Y02E10/547 ,  Y02P70/521

    Abstract: The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.

    Abstract translation: 使用掺杂的硅纳米颗粒油墨和其它液体掺杂剂源可以提供合适的掺杂剂源，以便如果提供合适的盖，则使用热处理将掺杂剂元素驱动到晶体硅衬底中。 合适的帽包括例如盖板，可以或可以不搁置在基材表​​面上的盖和覆盖层。 可以实现期望的掺杂剂。 可以使用硅油墨递送掺杂的纳米颗粒。 在掺杂剂驱入或至少部分致密化成掺入产品装置的硅材料之后，可以除去残留的硅油墨。 硅掺杂适用于将掺杂剂引入结晶硅以形成太阳能电池。

    PHOTOVOLTAIC STRUCTURES PRODUCED WITH SILICON RIBBONS
    73.
    发明申请
    PHOTOVOLTAIC STRUCTURES PRODUCED WITH SILICON RIBBONS 审中-公开
    用硅胶生产的光伏结构

    公开(公告)号：WO2011062975A2

    公开(公告)日：2011-05-26

    申请号：PCT/US2010/057011

    申请日：2010-11-17

    Applicant: NANOGRAM CORPORATION ,  CHIRUVOLU, Shivkumar ,  PAKALA, Neeraj ,  FERGUSON, Scott ,  DRAIN, Kieran

    Inventor： CHIRUVOLU, Shivkumar ,  PAKALA, Neeraj ,  FERGUSON, Scott ,  DRAIN, Kieran

    IPC: H01L31/18 ,  H01L31/042

    CPC classification number: H01L31/1804 ,  C30B15/007 ,  C30B15/04 ,  C30B15/24 ,  C30B25/00 ,  C30B29/06 ,  H01L31/042 ,  H01L31/048 ,  H01L31/1868 ,  Y02E10/547 ,  Y02P70/521

    Abstract: Photovoltaic elements can be formed by in-motion processing of a silicon ribbon. In some embodiments, only a single surface of a silicon ribbon is processed in-motion. In other embodiments both surfaces of a silicon ribbon is processed in-motion. In-motion processing can include, but is not limited to, formation of patterned or uniform doped regions within or along the silicon ribbon as well as the formation of patterned or uniform dielectric layers and/or electrically conductive elements on the silicon ribbon. After performing in-motion processing, additional processing steps can be performed after the ribbon is cut into portions. Furthermore, post-cut processing can include, but is not limited to, the formation of solar cells, photovoltaic modules, and solar panels.

    Abstract translation: 可以通过硅带的运动内处理来形成光伏元件。 在一些实施例中，只有硅带的单个表面被运动地处理。 在其它实施例中，硅带的两个表面被运动地处理。 运动内处理可以包括但不限于在硅带内或沿着硅带形成图案化或均匀的掺杂区，以及在硅带上形成图案化或均匀的介电层和/或导电元件。 在执行运动处理之后，可以在色带被切割成部分之后执行附加的处理步骤。 此外，后切割处理可以包括但不限于形成太阳能电池，光伏模块和太阳能电池板。

    METAL PATTERNING FOR ELECTRICALLY CONDUCTIVE STRUCTURES BASED ON ALLOY FORMATION
    74.
    发明申请
    METAL PATTERNING FOR ELECTRICALLY CONDUCTIVE STRUCTURES BASED ON ALLOY FORMATION 审中-公开
    基于合金形成的导电结构的金属图案

    公开(公告)号：WO2010135178A2

    公开(公告)日：2010-11-25

    申请号：PCT/US2010/034860

    申请日：2010-05-14

    Applicant: NANOGRAM CORPORATION ,  SRINIVASAN, Uma ,  PAKALA, Neeraj ,  SANDERS, William, A. ,  HIESLMAIR, Henry

    Inventor： SRINIVASAN, Uma ,  PAKALA, Neeraj ,  SANDERS, William, A. ,  HIESLMAIR, Henry

    IPC: H01L31/042 ,  H01L31/18

    CPC classification number: C22F1/00 ,  C21D1/34 ,  H01L21/32134 ,  H01L27/124 ,  H01L31/022441 ,  H01L31/0682 ,  Y02E10/547 ,  Y10T428/12396

    Abstract: Layered metal structures are patterned to form a surface with some locations having an alloy along the top surface at some locations and the original top metal layer at other locations along the surface. The alloy and original top metal layer can be selected to have differential etching properties such that the pattern of the alloy or original metal can be selectively etched to form a patterned metal interconnect. In general, the patterning is performed by localized heating that drives formation of the alloy at the heated locations. The metal patterning can be useful for solar cell applications as well as for electronics applications, such as display applications.

    Abstract translation: 层状金属结构被图案化以形成表面，其中一些位置在某些位置处具有沿着顶表面的合金，并且沿表面的其它位置具有原始顶部金属层。 可以选择合金和原始顶部金属层以具有差异蚀刻性质，使得可以选择性地蚀刻合金或原始金属的图案以形成图案化的金属互连。 通常，图案化是通过局部加热进行的，其驱动在加热位置形成合金。 金属图案化可用于太阳能电池应用以及电子应用，例如显示器应用。

    ZONE MELT RECRYSTALLIZATION FOR INORGANIC FILMS
    75.
    发明申请
    ZONE MELT RECRYSTALLIZATION FOR INORGANIC FILMS 审中-公开

    公开(公告)号：WO2009094124A3

    公开(公告)日：2009-07-30

    申请号：PCT/US2009/000301

    申请日：2009-01-16

    Applicant: NANOGRAM CORPORATION ,  HIESLMAIR, Henry ,  MOSSO, Ronald, J.

    Inventor： HIESLMAIR, Henry ,  MOSSO, Ronald, J.

    IPC: H01L21/20

    Abstract: ZMR apparatuses provide for controlled temperature flow through the system to reduce energy consumption while providing for desired crystal growth properties. The apparatus can include a cooling system to specifically remove a desired amount of heat from a melted film to facilitate crystallization. Furthermore, the apparatus can have heated walls to create a background temperature within the chamber that reduces energy use through the reduction or elimination of cooling for the chamber walls. The apparatuses and corresponding methods can be used with inorganic films directly or indirectly associated with a porous release layer that provides thermal insulation with respect to an underlying substrate. If the recrystallized film is removed from the substrate, the substrates can be reused. The methods can be used for large area silicon films with thicknesses from 2 microns to 100 microns, which are suitable for photovoltaic applications as well as electronics applications.

    FUNCTIONAL COMPOSITES, FUNCTIONAL INKS AND APPLICATIONS THEREOF
    76.
    发明申请
    FUNCTIONAL COMPOSITES, FUNCTIONAL INKS AND APPLICATIONS THEREOF 审中-公开
    功能复合材料，功能性油墨及其应用

    公开(公告)号：WO2008100568A1

    公开(公告)日：2008-08-21

    申请号：PCT/US2008/001954

    申请日：2008-02-14

    Applicant: NANOGRAM CORPORATION ,  CHIRUVOLU, Shivkumar ,  DIOUMAEV, Vladimir, K. ,  KAMBE, Nobuyuki ,  DU, Hui, K.

    Inventor： CHIRUVOLU, Shivkumar ,  DIOUMAEV, Vladimir, K. ,  KAMBE, Nobuyuki ,  DU, Hui, K.

    IPC: C09D11/00

    CPC classification number: H05K1/095 ,  C09D11/101 ,  H05K2201/0257 ,  H05K2201/0266 ,  H05K2201/0329 ,  Y10T428/25 ,  Y10T428/259

    Abstract: Functional composite materials comprise elemental inorganic particles within an organic matrix. The elemental inorganic materials generally comprise elemental metal, elemental metalloid, alloys thereof, or mixtures thereof. In alternative or additional embodiments, the inorganic particles can comprise a metal oxide, a metalloid oxide, a combination thereof or a mixture thereof. The inorganic particles can have an average primary particle size of no more than abut 250 nm and a secondary particle size in a dispersion when blended with the organic matrix of no more than about 2 microns. The particles can be substantially unagglomerated within the composite. The organic binder can be a functional polymer such as a semiconducting polymer. The inorganic particles can be surface modified, such as with a moiety having an aromatic functional group for desirable interactions with a semiconducting polymer. Appropriate solution based methods can be used for forming the composite from dispersions of the particles. The composites can be processed into products, such as printed electronics devices.

    Abstract translation: 功能复合材料包括有机基质内的元素无机颗粒。 元素无机材料通常包含元素金属，元素准金属，其合金或其混合物。 在替代或另外的实施方案中，无机颗粒可以包含金属氧化物，类金属氧化物，其组合或其混合物。 当与有机基质共混不超过约2微米时，无机颗粒的平均一次粒径不超过250nm，分散体中的二次粒径。 颗粒可以在复合材料内基本上未聚集。 有机粘合剂可以是功能聚合物，例如半导体聚合物。 无机颗粒可以被表面改性，例如具有芳族官能团的部分用于与半导体聚合物的期望相互作用。 基于溶液的方法可用于从颗粒的分散体形成复合物。 复合材料可以加工成产品，如印刷电子设备。

    REACTANT NOZZLES WITHIN FLOWING REACTORS
    79.
    发明申请
    REACTANT NOZZLES WITHIN FLOWING REACTORS 审中-公开
    流动反应器中的反应喷嘴

    公开(公告)号：WO2003086617A1

    公开(公告)日：2003-10-23

    申请号：PCT/US2003/010572

    申请日：2003-04-07

    Applicant: NANOGRAM CORPORATION ,  GARDNER, James, T. ,  MOSSO, Ronald, J. ,  GILLIAM, James, A.

    Inventor： GARDNER, James, T. ,  MOSSO, Ronald, J. ,  GILLIAM, James, A.

    IPC: B01J19/08

    CPC classification number: B01J19/26 ,  B01J19/121 ,  B01J19/127

    Abstract: Improved reaction chamber designs are described that provide for improved control over the flow within the reaction chamber (100). The reaction chamber (100) contains reactions for particle production from a flowing reactant stream. Improved reactant delivery nozzles (116) are described that are useful for the delivery of gas/vapor reactants and/or aerosol reactants. Improved nozzle designs can result in more uniform reactant flow. Suitable reactors can comprise an electromagnetic radiation source (134) that projects through the reactor to drive the reaction at an electromagnetic radiation reaction zone. The improved nozzle features are suitable for reactors for particle collection and/or for coating of substrates within the reaction chamber (100).

    Abstract translation: 描述了改进的反应室设计，其提供对反应室（100）内的流动的改进的控制。 反应室（100）含有从流动的反应物流产生颗粒的反应。 描述了改进的反应物输送喷嘴（116），其可用于输送气体/蒸汽反应物和/或气溶胶反应物。 改进的喷嘴设计可以导致更均匀的反应物流动。 合适的反应器可以包括电磁辐射源（134），其通过反应器突出以在电磁辐射反应区域驱动反应。 改进的喷嘴特征适用于用于在反应室（100）内进行颗粒收集和/或涂覆基材的反应器。

    PARTICLE PRODUCTION APPARATUS
    80.
    发明申请
    PARTICLE PRODUCTION APPARATUS 审中-公开
    颗粒生产设备

    公开(公告)号：WO2001007155A1

    公开(公告)日：2001-02-01

    申请号：PCT/US2000/019578

    申请日：2000-07-18

    Applicant: NANOGRAM CORPORATION

    Inventor： MOSSO, Ronald, J. ,  BI, Xiangxin ,  GARDNER, James, T. ,  KUMAR, Sujeet ,  PHILLIPS, Samuel, R.

    IPC: B01J19/08

    CPC classification number: B01J6/008 ,  B01J19/121 ,  B01J2219/0879

    Abstract: Improvements to chemical reaction systems (100) provide for the production of commercial quantities of chemical products, such as chemical powders. The improved chemical reaction systems (100) can accomodate a large reactant flux for the production of significant amounts of product. Preferred reaction systems (100) are based on laser pyrolysis. Features of the system (100) provide for the production of highly uniform product particles.

    Abstract translation: 化学反应体系（100）的改进提供了生产商业数量的化学产品，如化学粉末。 改进的化学反应体系（100）可以容纳大量的反应物通量，用于生产大量的产品。 优选的反应体系（100）基于激光热解。 系统（100）的特征提供了高度均匀的产品颗粒的生产。

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