Abstract:
디스플레이장치가개시된다. 디스플레이장치는컨텐츠를영상처리하고제1 스케일링배율로스케일링처리하는영상처리부, 제1 스케일링배율로스케일링처리된컨텐츠의해상도및 디스플레이장치의출력해상도에기초하여제2 스케일링배율을결정하는제어부및 제1 스케일링배율로스케일링처리된컨텐츠를제2 스케일링배율에따라스케일링처리하여디스플레이하는디스플레이부를포함한다. 이에따라, 복수의스케일러를사용하여컨텐츠를스케일링처리함에따라전력소모및 리소스사용을저감시킬수 있다.
Abstract:
PURPOSE: A multi-channel contact sensing device is provided to reduce the size of the entire sensing device by not comprising a finger touch sensing module and a pen input sensing module. CONSTITUTION: A loop unit includes a transmitting sub-loop unit(331) and a receiving sub-loop unit(332). A control unit(310) applies a transmitting signal to the transmitting sub-loop unit and receives a receiving signal from the receiving sub-loop unit. A switch unit(320) does not make loops of the transmitting sub-loop unit to connect to a ground unit during the first period. The switch unit does not make loops of the receiving sub-loop unit to connect to the ground unit during the first period. The control unit connects the loops of the transmitting sub-loop unit to the ground unit during a second period. The control unit connects the loops of the receiving sub-loop unit to the ground unit during the second period. [Reference numerals] (310) Control unit; (320) Switch unit; (331) Transmitting sub-loop unit; (332) Receiving sub-loop unit; (340) Ground unit
Abstract:
PURPOSE: A touch area checking apparatus and a method thereof are provided to freely set up a position of a touch screen panel regardless of a position of a display panel and easily adjust a quantity of noise reducing by adjusting a length of a band spreading code. CONSTITUTION: A TSP(Touch Screen Panel)(310) is equipped with a first electrode layer of a first pattern aligned to a first direction and a second electrode layer of a second pattern aligned to a second direction. A signal generating unit(320) generates a band spreading signal and supplies the band spreading signal to the first electrode layer. A signal restoration unit(330) processes band restoration to the signal inputted from the second electrode layer. A touch area coordinate confirmation unit(340) confirms coordinates of a touch area from the signal outputted from the signal restoration unit.
Abstract:
A touch sensor is provided to apply to a small and thin product by integrating a backlight and a PCB(Printed Circuit Board), which is made of a transparent material, and simplify a manufacturing process by removing processes for making the PCB and an LGP(Light Guide Plate). A PCB(210) is transparent for visible light, and upper and lower clads(212,211) are formed to upper and lower faces of the PCB. A light source(240) outputs light to a side of the PCB. A key-top layer(220) is placed on the upper clad. A supporting member(230) supports the light source. A reflection pattern(214) is formed to a part of the surface facing the lower clad. A light blocking member(250) is inserted into the other sides excluding the side facing the light source. The light blocking member includes a mirror for reflecting a part of the light transferred to the PCB to a PCB side. The PCB is made of transparent polymer or glass, and a refractive index of the upper and lower clads is lower than the PCB.
Abstract:
A method for removing photoresist is provided to completely remove pretreated photoresist in a cleaning process using a photoresist cleaning solution by making the photoresist modified by being exposed to an ion implantation process have a state of being easily removed in a photoresist cleaning process. Supercritical carbon dioxide is penetrated into photoresist existing on a substrate having a conductive structure including metal to perform a pretreatment process on the photoresist so that the photoresist has a state of being easily removed in a subsequent cleaning process(S130). The pretreated photoresist is removed from the substrate by using a photoresist cleaning solution including an alkanolamine of 8-20 weight percent for avoiding corrosion of the metal, a polar organic solvent of 25-40 weight percent, a reducing agent of 0.5-3 weight percent and excess water(S150). The photoresist can include a photoresist pattern used as an ion implantation mask, a photoresist pattern used as an etch mask, and residual photoresist.