Abstract:
본 발명은 용해도 향상을 위해 불소기를 도입하여 용해도가 향상된 중합성 메조겐 화합물, 이의 제조방법 및 이를 포함하는 중합성 액정 조성물에 관한 것으로, 본 발명의 중합성 메조겐 화합물은 용해도 향상기로 불소기를 도입하여 수직 배향형 호스트 액정에 대한 용해도를 증가시키고 광반응성기로 메타아크릴레이트를 도입함으로써 광가교 후 선경사각의 안정성을 향상시키는 효과가 있으므로 중합성 액정 조성물 특히 고분자 안정화 배향 유형의 액정디스플레이용 중합성 액정 조성물로 유용하게 사용될 수 있다.
Abstract:
본 발명은 2,6-다이아미노-9,10-다이하이드로안트라센을 고순도로 정제하는 방법에 관한 것으로, 본 발명에 따른 방법은 2,6-다이아미노안트라퀴논(이하, "화학식 2"로 표시함)을 출발 물질로 하여, 아연 촉매 하에 환원 반응시켜, 화학식 2 및 2,6-다이아미노-9,10-다이하이드로안트라센(이하, "화학식 1"로 표시함)을 제조하는 종래 방법에서, 화학식 1로 표시되는 화합물만을 선택적으로 정제하는 방법에 관한 것으로, 화학식 1 및 2로 표시되는 화합물의 전기음성도 차이에 기인하는 아민기의 반응성을 이용하여 화학식 1로 표시되는 화합물에 유기용매에서 잘 용해되는 용해도 향상기를 높은 선택성으로 도입시킴으로써, 추출의 과정을 통해 화학식 1로 표시되는 화합물을 고순도로 얻을 수 있는 효과가 있다.
Abstract:
The present invention relates to a new high heat resistant polyimide-based compound, a composition for forming an organic insulator including the same, and a thin-film transistor using the same. More specifically, the polyimide-based compound has greater insulation properties and heat resistance and can be processed in a lower temperature solution, and the composition for forming an organic insulator including the same can be used for manufacturing an organic insulation layer of the thin-film transistor and used as the organic insulation layer of a thin-film oxide transistor which requires high temperatures when processed.
Abstract:
The present invention relates to: a thin film transistor using a metallic oxide interlayer film which is formed between an organic insulator and a metallic oxide semiconductor; a manufacturing method thereof; and an electrical property improving method of the thin film transistor using the same. Specifically, the present invention is able to form a metallic oxide semiconductor layer in the shape of an even film which has a smooth surface by using a solution process by providing a chemically similar interface for the metallic oxide semiconductor without chemical damage of the organic insulator by forming the metallic oxide interlayer film between the organic insulator layer and the metallic oxide semiconductor layer. The metallic oxide interlayer film finally improves the electrical property of the metallic oxide thin film transistor for a solution process, which is a characteristic of a device, by improving the interfacial property of the organic insulator layer and the interfacial property of the metallic oxide semiconductor layer without degrading the insulating property of the organic insulator layer.
Abstract:
The present invention relates to a novel polyimide having excellent insulation and heat resistance, a method for producing the same, and an organic insulating film including the same. The novel polyimide according to the present invention has an excellent effect in exhibiting blue color at 496 nm, excellent thermal resistance against high temperature by having a high glass transition temperature of about 350°C or more and a 5% weight pyrolysis temperature of 500°C or more, and excellent electrical insulation by having a dielectric constant of 3 or smaller at 1 to 1000 kHz. Accordingly, the novel polyimide according to the present invention can be used as a material of a blue organic light-emitting diode and can also be usefully used as a material for an organic insulating film or a flexible metal coil layer (FMCL) film for electronic devices such as light-emitting diodes (LED) and organic thin film transistors (OTFT).