公开(公告)号：JPS6279424A

公开(公告)日：1987-04-11

申请号：JP21910785

申请日：1985-10-03

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  KAMIO MASARU ,  MOTOI YASUKO ,  TAKAO HIDEAKI ,  MURATA TATSUO ,  SEKIMURA NOBUYUKI

IPC: G09F9/30 ,  G02F1/1335 ,  G02F1/1339

Abstract: PURPOSE:To prevent a columnar inner spacer from damaging a colored part provided to one substrate by partitioning the colored part with a light shield part which projects from the colored part, putting this substrate opposite the other substrate and charging liquid crystal between the both, and making the spacer longer than the diagonal of the light shield part when charging the spacer. CONSTITUTION:A transparent electrode 6 is adhered on the opposite surface of one substrate 8 and the colored part 2 as a picture element is formed thereupon while partitioned by the metallic light shield which has higher partitions that the thickness of the colored part. Plural driving circuits 7 which correspond to the partitioned colored part 2 are provided on the opposite surface of the other substrate 8 and a liquid crystal layer 4 which contains columnar inner spacers 3 is charged between those substrates 8. In this constitution, the length B of the spacers 3 is made larger than the length A of the diagonal of the frame of the light shield part 1 which partitions the colored part 2 to prevent a spacer 3 from damaging the colored part 2 wheneven the spacer 3 is.

公开(公告)号：JPS61143791A

公开(公告)日：1986-07-01

申请号：JP26521284

申请日：1984-12-18

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  KAMIO MASARU ,  MOTOI YASUKO ,  SEKIMURA NOBUYUKI

IPC: G02F1/1335 ,  G02F1/133 ,  G09F9/35

公开(公告)号：JPS6187191A

公开(公告)日：1986-05-02

申请号：JP20799084

申请日：1984-10-05

Applicant: Canon Kk

Inventor： SEKIMURA NOBUYUKI ,  KAMIO MASARU ,  SAKAMOTO EIJI ,  MOTOI YASUKO

IPC: G02F1/1333 ,  G02F1/133 ,  G09F9/35

公开(公告)号：JPS6046371A

公开(公告)日：1985-03-13

申请号：JP15368283

申请日：1983-08-23

Applicant: CANON KK

Inventor： OOYAMA YASUKO ,  SAKAMOTO EIJI ,  YOKONO KOUJIROU

IPC: C23C14/54

Abstract: PURPOSE:To form a vapor deposition film having desired spectral transmittance in good reproducibility, in forming the vapor deposition film to the surface of a substrate, by performing vapor deposition while measuring the spectral transmittance of a formed film. CONSTITUTION:A resistance heating type boat 2 is placed in a vacuum container 1 and a stock material 3 to be vapor deposited is put in said boat 2. A current is supplied to the boat 2 to heat the same and the vapor deposition stock material 3 is melted and evaporated to form a vapor deposition film to the surface of a transparent substrate 4. During this operation, light with a specific wavelength from a light source 5 is allowed to pass through the substrate 4, to which a vapor deposition film is being formed, and a substrate 7, to which no vapor deposition film is adhered, simultaneously and the transmitted light thereof is measured by a measuring instrument 6. The vapor deposition film on the substrate 4 can be measured from the ratio of two transmitted lights and vapor deposition is stopped when desired spectral transmittance is obtained.

公开(公告)号：JP2002359185A

公开(公告)日：2002-12-13

申请号：JP2002126387

申请日：2002-04-26

Applicant: CANON KK

Inventor： SAKAMOTO EIJI

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To enhance positioning accuracy by suppressing unevenness in the temperature of gas on the dimension measurement optical path of a laser interferometer system stage thereby reducing the dimension measurement error. SOLUTION: The stage device comprises a stage 1 movable in two orthogonal directions, a reflector 26 mounted on the stage 1 and having a reflective face perpendicular to one of two orthogonal directions, a laser interferometer 24 for measuring the positional information of the stage 1 in one direction, and a means 28 for supplying wind to the stage side along the optical path of the laser interferometer 24. The means 28 supplies air in the one direction and the wind velocity in the optical path of the laser interferometer 24 is higher than the moving speed of the stage 1 in the one direction.

公开(公告)号：JP2001284213A

公开(公告)日：2001-10-12

申请号：JP2000093958

申请日：2000-03-30

Applicant: CANON KK

Inventor： MIWA YOSHINORI ,  SAKAMOTO EIJI

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a high-throughput aligner. SOLUTION: This exposure system which uses an excimer laser as a light source is provided with a chamber which contains an optical system and can make prescribed gas replacement, and a gas circulating mechanism having an exhaust port for exhausting the gas in the chamber and a supply port for supplying the gas into the chamber. On the circulating route of the circulating mechanism, a plurality of cleaners is arranged in parallel with each other in a state where the cleaners can be switched to each other.

公开(公告)号：JP2001126974A

公开(公告)日：2001-05-11

申请号：JP30403999

申请日：1999-10-26

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  ASANO TOSHIYA ,  INOUE MITSURU

IPC: H01L21/027 ,  G03F9/00

Abstract: PROBLEM TO BE SOLVED: To provide an aligner and a device manufacturing method for eliminating the need for elongating a reflecting mirror on a stage, even if the optical alignment axis is far from an exposure optical axis. SOLUTION: An aligner includes an exposure means for exposing the pattern of a negative print, a stage 1, an alignment optical system, an object (reflecting mirror) 8 extended in a prescribed direction, an exposure position measuring means 6 for positioning the substrate to an exposure optical axis, an alignment position measuring means 7, and a switching means for switching positional measurement by the exposing position measuring means 6 and by the alignment position measuring means 7. Then, the exposing sequence and the sequence of alignment measurement are determined, so that the distance between the object 8 and the exposure position measuring means 6 and the alignment position measuring means 7 is reduced to a minimum, when the switching operation is carried out.

公开(公告)号：JP2000150361A

公开(公告)日：2000-05-30

申请号：JP33202598

申请日：1998-11-06

Applicant: CANON KK

Inventor： SAKAMOTO EIJI

IPC: H01L21/68 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a position measuring method and a device by which the accurate position measurement of a mark for position measurement such as an alignment mark, etc., is possible even in the case that foreign matter such as dust or the like is caught between a wafer and a wafer chuck. SOLUTION: When retaining a water 1 where alignment marks 5 (5a, 5b,...) are made on the surface on a wafer chuck 2 which supports it with plural projections 3 (3a, 3b,...), the alignment marks 5 (5a, 5b,...) are arranged right above the projections 3 (3a,...) of the wafer chuck 2, and the position measurement in the direction parallel with the wafer 1 is performed. As a result, even in the case that foreign matter such as dust or the like intervenes between the wafer 1 and the projection 3, the alignment mark 5 never causes the dislocation within the plane of the wafer, and it is not affected by the existence of the dust, so it becomes possible to measure the position of the alignment mark 5 accurately, and this apparatus can prevent the deterioration of the accuracy in positioning.

公开(公告)号：JPH10112430A

公开(公告)日：1998-04-28

申请号：JP28159696

申请日：1996-10-04

Applicant: CANON KK

Inventor： SAKAMOTO EIJI

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To reduce scan stage length measurement error in laser interferometer method, for improved positioning precision by allowing an air-conditioning wind speed from a blast means which blows a temperature-controlled air current to a scan stage to be faster than a moving speed of the scan stage. SOLUTION: A blow-off opening of an air-conditioning means 28 is connected to a blast channel 41, and a scan stage 4 is provided in its air conduit 41. With the blast channel 41, the cross-section area of the air path is changed in succession, and the wind direction of air-conditioning air is made nearly in scanning direction on length-measurement light path. Here, the flow speed (wind speed) of air current 30 blown out of the air-conditioning means 28 on a length- measurement light path 25 is set to be about 0.2m/sec, being faster than scanning speed (= about 0.1m/sec) of the stage 4. In this case, all the air around a linear motor 27 is blown to ahead of scanning direction of the reticule stage 4, so that the air on the laser length-measurement light path 25 is just the one blown out of the air-conditioning means 28, resulting in temperature-fluctuation less than 0.1 deg. which is very small.

公开(公告)号：JPH0781755A

公开(公告)日：1995-03-28

申请号：JP25371193

申请日：1993-09-16

Applicant: CANON KK

Inventor： SAKAMOTO EIJI

IPC: B23Q3/08 ,  B65G49/07 ,  C23C14/50 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/677 ,  H01L21/683 ,  H01L21/68

Abstract: PURPOSE:To provide a substrate holder which can firmly support a substrate as a whole and uniformly cool it. CONSTITUTION:A holding board 1 which has the attracting face 1a to attract the main portion of a substrate is positioned by a X-Y stage drive mechanism. A hand 2 which has the attracting face 2f to attract the remaining portion of the substrate and the driving member 2a to carry the substrate to a position opposed to the attracting face 1a of the holding board 1 is mounted into a hand storage groove 1d in the holding board 1. The substrate attracted by both of the attracting face 1a of the holding board 1 and the attracting face 2f of the hand 2 and firmly held by both of them is uniformly cooled by temperature regulated fluid medium flowing in both inside pipes.