3.
    发明专利
    未知

    公开(公告)号:DE60133433T2

    公开(公告)日:2009-04-16

    申请号:DE60133433

    申请日:2001-05-31

    Applicant: CANON KK

    Abstract: A stage apparatus on which a laser interferometer is mounted includes a reticle stage (1) movable in three, X-, Y-, and &thetas;-axes, laser heads (8a - 8d) each for generating a laser beam, interferometers (9a - 9d) each of which is mounted on the stage (1) and splits the laser beam into reference and measurement beams, bar mirrors (11a - 11c) each of which is arranged outside the stage (1) and reflects the measurement beam, and detectors (10a - 10c) each for detecting the interference beam of the reference and measurement beams.

    5.
    发明专利
    未知

    公开(公告)号:DE60133433D1

    公开(公告)日:2008-05-15

    申请号:DE60133433

    申请日:2001-05-31

    Applicant: CANON KK

    Abstract: A stage apparatus on which a laser interferometer is mounted includes a reticle stage (1) movable in three, X-, Y-, and &thetas;-axes, laser heads (8a - 8d) each for generating a laser beam, interferometers (9a - 9d) each of which is mounted on the stage (1) and splits the laser beam into reference and measurement beams, bar mirrors (11a - 11c) each of which is arranged outside the stage (1) and reflects the measurement beam, and detectors (10a - 10c) each for detecting the interference beam of the reference and measurement beams.

    SCANNING ALIGNER
    8.
    发明专利

    公开(公告)号:JPH1074684A

    公开(公告)日:1998-03-17

    申请号:JP24544996

    申请日:1996-08-29

    Applicant: CANON KK

    Inventor: ASANO TOSHIYA

    Abstract: PROBLEM TO BE SOLVED: To realize light-exposure with high resolution and margins by a method wherein a substrate stage holding substrate is driven in an optical axis direction and in a flapping direction, so that focusing means for positioning the substrates on an image face of a projection optical system is provided. SOLUTION: A reticle stage 1 and a Y stage 3b are moved at a specific speed ratio in a Y direction, and patterns on the reticle are scanned by slit-like exposed lights, and also waferns are scanned by the projection image to transfer the patterns to a transfer region on the wafers. During the scanning light- exposure, a height of a wafer face is measured by a focus sensor 13, and the height and tilt of the wafer stage 3 are controlled at a real time based on the measurement value to correct focus. After the scanning light-exposure for one transfer region is finished, an X stage 3a and/or a Y stage 3b are driven to move the wafer to the X direction and/or Y direction, and the other transfer regions are positioned for a start position of the scanning light-exposure, and the next scanning light-exposure is carried out. Thereby, a focus error traceable to distortions of a negative stage face is reduced.

    POSITIONING MOVABLE BODY MECHANISM
    9.
    发明专利

    公开(公告)号:JP2003168721A

    公开(公告)日:2003-06-13

    申请号:JP2001366057

    申请日:2001-11-30

    Applicant: CANON KK

    Inventor: ASANO TOSHIYA

    Abstract: PROBLEM TO BE SOLVED: To provide a positioning movable body mechanism for a stage unit, which is capable of restraining a stage from vibrating when driven and shortening a positioning/setting time. SOLUTION: This positioning movable body mechanism is equipped with a movable body which is supported in a freely movable manner in a space, an electromagnetic joint drive coil 51 which gives a driving force to the movable body to move it in a prescribed direction, a search coil 52 which measures the induced voltage generated in the electromagnetic joint drive coil 51, an integrator 53 which time-integrates the induced voltage measured by the search coil 52, a movement command generator which generates the acceleration of the movable body and a drive command given to the electromagnetic joint drive coil 51, a gain 54 calculating a command given to the electromagnetic joint drive coil 51 on the basis of the drive command and the output of the integrator 53, and a drive amplifier 55 and the like functioning as a magnetic flux feedback mechanism, and the time differential value of the root of the absolute value of the acceleration of the movable body generated by the movement command generator is set continuous. COPYRIGHT: (C)2003,JPO

    ALIGNER AND PRODUCTION OF DEVICE
    10.
    发明专利

    公开(公告)号:JP2000187338A

    公开(公告)日:2000-07-04

    申请号:JP36722398

    申请日:1998-12-24

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To make a position measuring mechanism mounted on a stage small in size and light in weight even when the moving range of the stage is large. SOLUTION: This aligner is provided with a projection optical system for projecting exposing light radiated to a reticle where a pattern is formed on a wafer 2, the stage holding the wafer 2 or the reticle and positioning, an alignment optical system radiating alignment light, a reflection mirror 7 arranged on the stage, and an interferometer for measuring the position of the stage by radiating light to the mirror 7. The aligner is also provided with plural interferometers measuring the position of the stage in a specified direction, and the separate interferometers are used as the interferometers used to measure the position of the stage in the specified direction in the case of positioning the stage with respect to the projection optical system and in the case of positioning the stage with respect to the alignment optical system. Thus, the length of the mirror 7 is shortened and the stage is made small in size and light in weight.

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