CMOS bolometer
    71.
    发明授权

    公开(公告)号:US09698281B2

    公开(公告)日:2017-07-04

    申请号:US13969828

    申请日:2013-08-19

    Abstract: A method of manufacturing a semiconductor device includes forming at least one sacrificial layer on a substrate during a complementary metal-oxide-semiconductor (CMOS) process. An absorber layer is deposited on top of the at least one sacrificial layer. A portion of the at least one sacrificial layer beneath the absorber layer is removed to form a gap over which a portion of the absorber layer is suspended. The sacrificial layer can be an oxide of the CMOS process with the oxide being removed to form the gap using a selective hydrofluoric acid vapor dry etch release process. The sacrificial layer can also be a polymer layer with the polymer layer being removed to form the gap using an O2 plasma etching process.

    MICROBOLOMETER ARRAY WITH IMPROVED PERFORMANCE
    73.
    发明申请
    MICROBOLOMETER ARRAY WITH IMPROVED PERFORMANCE 有权
    具有改进性能的MICROBOLOMETER ARRAY

    公开(公告)号:US20140226021A1

    公开(公告)日:2014-08-14

    申请号:US14131298

    申请日:2012-07-13

    Abstract: According to one aspect, the invention relates to a microbolometer array for thermal detection of light radiation in a given spectral band, comprising a supporting substrate and an array of microbolometers (300) of given dimensions, arranged in an array. Each of said microbolometers comprises a membrane (301) suspended above said supporting substrate, said membrane consisting of an element (305) for absorbing the incident radiation and a thermometric element (304) in thermal contact with the absorber, electrically insulated from said absorber element. The absorber element comprises at least one first metal/insulator/metal (MIM) structure comprising a multilayer of three superposed films of submicron-order thickness i.e. a first metallic film (311), a dielectric film (310), and a second metallic film (309), said MIM structure being able to have a resonant absorption of said incident radiation at at least one wavelength in said spectral band. The area of the microbolometer pixel covered by said membrane (301) is less than or equal to half of the total area of the microbolometer pixel.

    Abstract translation: 根据一个方面,本发明涉及一种用于在给定光谱带中的热辐射的热检测的微热辐射计阵列,其包括支撑衬底和以阵列布置的给定尺寸的微热计(300)阵列。 每个所述微伏热计包括悬挂在所述支撑基底上方的膜(301),所述膜由用于吸收入射辐射的元件(305)和与所述吸收体热接触的测温元件(304)组成,所述温度测量元件 。 所述吸收元件包括至少一个第一金属/绝缘体/金属(MIM)结构,其包括具有亚微米级厚度的三层重叠膜的多层,即第一金属膜(311),电介质膜(310)和第二金属膜 (309),所述MIM结构能够在所述光谱带中具有至少一个波长的所述入射辐射的共振吸收。 由所述膜(301)覆盖的微热辐射计像素的面积小于或等于微测热计像素的总面积的一半。

    VORRICHTUNG MIT MEMBRANSTRUKTUR ZUR DETEKTION VON WÄRMESTRAHLUNG, VERFAHREN ZUM HERSTELLEN UND VERWENDUNG DER VORRICHTUNG
    74.
    发明申请
    VORRICHTUNG MIT MEMBRANSTRUKTUR ZUR DETEKTION VON WÄRMESTRAHLUNG, VERFAHREN ZUM HERSTELLEN UND VERWENDUNG DER VORRICHTUNG 审中-公开
    与膜结构探测设备热辐射,方法用于生产和使用的设备

    公开(公告)号:WO2008145353A1

    公开(公告)日:2008-12-04

    申请号:PCT/EP2008/004246

    申请日:2008-05-28

    Abstract: Die Erfindung betrifft eine Vorrichtung zur Detektion von Wärmestrahlung, aufweisend mindestens eine Membran, auf der mindestens ein thermisches Detektorelement zur Umwandlung der Wärmestrahlung in ein elektrisches Signal angeordnet ist, und mindestens einen Schaltungsträger zum Tragen der Membran und zum Tragen mindestens einer Ausleseschaltung zum Auslesen des elektrischen Signals, wobei das Detektorelement und die Ausleseschaltung über eine elektrische Durchkontaktierung durch die Membran hindurch elektrisch miteinander verbunden sind. Daneben wird ein Verfahren zum Herstellen der Vorrichtung mit folgenden Verfahrensschritten angegeben: a) Bereitstellen der Membran mit dem Detektorelement und mindestens einer elektrischen Durchkontaktierung und Bereitstellen des Schaltungsträgers und b) Zusammenbringen der Membran und des Schaltungsträgers derart, dass das Detektorelement und die Ausleseschaltung über eine elektrische Durchkontaktierung durch die Membran hindurch elektrisch miteinander verbunden sind. Das Herstellen erfolgt vorzugsweise auf Wafer-Ebene: Es werden funktionalisierte Silizium-Substrate übereinander gestapelt, fest miteinander verbunden und anschließend vereinzelt. Vorzugsweise sind die Detektorelemente pyroelektrische Detektorelemente. Verwendung findet die Vorrichtung in Bewegungsmeldern, Präsenzmeldern und Wärmebildkameras.

    Abstract translation: 本发明涉及一种用于检测热辐射的装置,包括至少一个膜,至少一种热式光检测元件,用于将被设置在上电信号的热辐射,以及至少一个电路载体用于支持该膜片和用于支撑至少一个读出电路,用于读出电 信号,其中所述检测器元件,并通过接触通过该膜经由电读出电路被电连接在一起。 此外,提供了一种制造该装置的方法,包括以下步骤:a)提供所述膜与检测器元件,并通过至少一个电和提供在电路载体和b)使所述膜和所述电路基板,使得所述检测器元件和所述读出电路中的电经由 通过穿过膜电连接。 生产优选在晶片级进行:有叠置固定在一起官能硅衬底和随后分离。 优选地,所述检测器元件是热电检测器元件。 使用发现于运动检测器,占用检测器和热成像装置。

    CONDUCTION STRUCTURE FOR INFRARED MICROBOLOMETER SENSORS
    75.
    发明申请
    CONDUCTION STRUCTURE FOR INFRARED MICROBOLOMETER SENSORS 审中-公开
    红外线传感器的导电结构

    公开(公告)号:WO2008143632A1

    公开(公告)日:2008-11-27

    申请号:PCT/US2007/022206

    申请日:2007-10-17

    CPC classification number: G01J5/20 G01J2005/204

    Abstract: A conduction structure for infrared microbolometer sensors and a method for sensing electromagnetic radiation may be provided. The microbolometer may include a first conductor layer (64) and a second conductor layer (68). The microbolometer further may include a bolometer layer (62) between the first conductor layer and the second conductor layer.

    Abstract translation: 可以提供用于红外微测热计传感器的传导结构和用于感测电磁辐射的方法。 微热辐射计可以包括第一导体层(64)和第二导体层(68)。 微热比特还可以包括在第一导体层和第二导体层之间的测辐射热计(62)。

    SEMICONDUCTOR FILM BOLOMETER THERMAL INFRARED DETECTOR

    公开(公告)号:WO1991016607A1

    公开(公告)日:1991-10-31

    申请号:PCT/AU1991000162

    申请日:1991-04-24

    CPC classification number: G01J5/20 G01J2005/204

    Abstract: A thermal infrared detector comprising a dielectric pellicle (5) suspended over a cavity in a substrate (6), the pellicle supporting a detector element (1) comprising a heat sensitive semiconductor layer (3) between a pair of thin film metallic contacts (2, 4), these being deposited on the pellicle, the cavity being formed by etching and removal of the substrate material through holes or slots (8) in the surface of the substrate.

    Abstract translation: 一种热红外检测器,包括悬挂在衬底(6)中的空腔上的介电防护薄膜(5),所述防护薄膜组件支撑检测器元件(1),其包括在一对薄膜金属触点(2)之间的热敏半导体层(3) ,4),它们被沉积在防护薄膜组件上,通过蚀刻和去除衬底材料而形成的腔体通过衬底表面中的孔或槽(8)形成。

    INFRARED IMAGER WITH INTEGRATED METAL LAYERS
    77.
    发明申请
    INFRARED IMAGER WITH INTEGRATED METAL LAYERS 审中-公开
    具有集成金属层的红外成像器

    公开(公告)号:WO2014085699A1

    公开(公告)日:2014-06-05

    申请号:PCT/US2013/072395

    申请日:2013-11-27

    Abstract: Various techniques are provided for implementing, operating, and manufacturing infrared imaging devices using integrated circuits. In one example, a system includes a focal plane array (FPA) integrated circuit comprising an array of infrared sensors adapted to image a scene, a plurality of active circuit components, a first metal layer disposed above and connected to the circuit components, a second metal layer disposed above the first metal layer and connected to the first metal layer, and a third metal layer disposed above the second metal layer and below the infrared sensors. The third metal layer is connected to the second metal layer and the infrared sensors. The first, second, and third metal layers are the only metal layers of the FPA between the infrared sensors and the circuit components. The first, second, and third metal layers are adapted to route signals between the circuit components and the infrared sensors.

    Abstract translation: 提供了使用集成电路实现,操作和制造红外成像装置的各种技术。 在一个示例中,系统包括焦平面阵列(FPA)集成电路,其包括适于对场景成像的红外传感器阵列,多个有源电路部件,设置在电路部件上方并连接到电路部件的第一金属层,第二 金属层,设置在第一金属层上方并连接到第一金属层,以及第三金属层,设置在第二金属层的上方和红外传感器的下方。 第三金属层连接到第二金属层和红外传感器。 第一,第二和第三金属层是红外传感器和电路部件之间的FPA的唯一金属层。 第一,第二和第三金属层适于在电路部件和红外传感器之间路由信号。

    TWO STAGE TRANSFORMER COUPLING FOR ULTRA-SENSITIVE BOLOMETER TYPE RADIATION SENSOR
    79.
    发明申请
    TWO STAGE TRANSFORMER COUPLING FOR ULTRA-SENSITIVE BOLOMETER TYPE RADIATION SENSOR 审中-公开
    用于超敏感型BOLOMETER型辐射传感器的两级变压器联轴器

    公开(公告)号:WO2008130423A1

    公开(公告)日:2008-10-30

    申请号:PCT/US2007/074252

    申请日:2007-07-24

    CPC classification number: G01J5/20 G01J5/08 G01J5/0837 G01J5/24 G01J2005/204

    Abstract: A bolometer type ultra-sensitive silicon sensor including a detector stage (14), an intermediate stage (16), and a heat bath stage (17). The detector stage, the intermediate stage and a portion of the heat bath stage are generally co-planar and are interconnected by I-beam bridges so as to permit mutually co-planar rotation. Mechanical and electrical coupling is improved between a micro-antenna and the detector stage by a two stage transformer assembly (L1-L2, L5-L6) coupled between the micro-antenna and a detector element of the detector stage.

    Abstract translation: 包括检测器级(14),中间级(16)和热浴级(17)的测辐射热计型超灵敏硅传感器。 检测器级,中间级和热浴级的一部分通常是共面的,并且通过I型梁桥互连,以允许相互共面旋转。 通过耦合在微天线和检测器级的检测器元件之间的两级变压器组件(L1-L2,L5-L6)在微天线和检测器级之间改进机电耦合。

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