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    SYSTEMS AND METHODS FOR EUV LIGHT SOURCE METROLOGY
    71.
    发明申请
    SYSTEMS AND METHODS FOR EUV LIGHT SOURCE METROLOGY 审中-公开
    EUV光源计量系统与方法

    公开(公告)号：WO2007008470A2

    公开(公告)日：2007-01-18

    申请号：PCT/US2006/025792

    申请日：2006-06-29

    Applicant: CYMER, INC. ,  FOMENKOV, Igor, V. ,  BOWERING, Norbert, R. ,  HOFFMAN, Jerzy, R.

    Inventor： FOMENKOV, Igor, V. ,  BOWERING, Norbert, R. ,  HOFFMAN, Jerzy, R.

    IPC: G01J1/42

    CPC classification number: G03F7/7085 ,  B82Y10/00 ,  G21K2201/061

    Abstract: Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantity of photoelectrons. The system may further include a detector for detecting the photoelectrons and producing an output indicative of EUV power. In another aspect, a system for measuring an EUV light intensity may include a multi-layer mirror, e.g., Mo/Si, disposable along an EUV light pathway to expose the mirror and generate a photocurrent in the mirror. A current monitor may be connected to the mirror to measure the photocurrent and produce an output indicative of EUV power. In yet another aspect, an off-line EUV metrology system may include an instrument for measuring a light characteristic and MoSi 2 /Si multi layer mirror.

    Abstract translation: 披露了EUV光源计量系统和方法。 在第一方面，用于测量EUV光源功率输出的系统可以包括沿着EUV光路径设置的光电子源材料，以暴露材料并产生一定量的光电子。 该系统还可以包括用于检测光电子并产生指示EUV功率的输出的检测器。 在另一方面，用于测量EUV光强度的系统可以包括多层反射镜，例如Mo / Si，沿着EUV光路径可弃，以暴露反射镜并在反射镜中产生光电流。 电流监视器可以连接到反射镜以测量光电流并产生指示EUV功率的输出。 在另一方面，离线EUV测量系统可以包括用于测量光特性和MoSi 2 / Si多层反射镜的仪器。

    OPTICAL ELEMENT OF MULTILAYERED THIN FILM FOR X-RAYS AND NEUTRONS
    72.
    发明申请
    OPTICAL ELEMENT OF MULTILAYERED THIN FILM FOR X-RAYS AND NEUTRONS 审中-公开
    用于X射线和中子的多层薄膜的光学元件

    公开(公告)号：WO1996004665A1

    公开(公告)日：1996-02-15

    申请号：PCT/US1995009769

    申请日：1995-08-01

    Applicant: OSMIC, INC.

    Inventor： OSMIC, INC. ,  GUTMAN, George

    IPC: G21K01/06

    CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2201/068

    Abstract: This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.

    Abstract translation: 本发明涉及生产具有横向和深度梯度多层薄膜的平面和弯曲光学元件的新方法，特别是具有极高精度的多层，用于软和硬x射线和中子以及通过这些方法实现的光学元件。 为了提高光学元件的性能，分离出d间隔和曲率的误差并随后进行补偿。

    X-RAY ANALYSIS DEVICE
    73.
    发明申请
    X-RAY ANALYSIS DEVICE 审中-公开
    X射线分析仪

    公开(公告)号：WO1995022758A1

    公开(公告)日：1995-08-24

    申请号：PCT/DE1995000282

    申请日：1995-03-03

    Applicant: SIEMENS AKTIENGESELLSCHAFT ,  GÖBEL, Herbert

    Inventor： SIEMENS AKTIENGESELLSCHAFT

    IPC: G01N23/223

    CPC classification number: B82Y10/00 ,  G01N23/207 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

    Abstract: Conventional X-ray analysis devices usually operate on the Guinier, Seemann-Bohlin or Bragg-Brentano focussing principle. Here, the sample to be examined must meet certain geometrical requirements, and this is often impossible in practice. The object of the application is an analysis device fitted with a conventional X-ray tube (4) in which the sample is illuminated by a parallel monochromatic beam (7') and the deflected X-radiation (13) is detected as a parallel beam. The monochromator used is a parabolically curved multi-layer mirror ("graded-Bragg" structure (5)), the period of which changes over the length (1) of the reflector (5) in such a way that radiation of a given wavelength is always Bragg-reflected in the same direction regardless of the angle of incidence. Parallel-beam X-ray diffractometer, parallel-beam X-ray reflectometer.

    Abstract translation: 常规的X射线分析仪通常在吉尼尔，塞曼-的Bohlin或布拉格布伦塔诺聚焦的原理操作。 在这里，要被检查的样品必须满足一定的几何条件，其可在实践中并不经常实现。 本申请是一个与传统的X射线管（4）配备分析器，其中所述样品与平行照射时，单色光束（7“）和所述衍射X射线（13）被检测为一个平行光束。 一个抛物面形弯曲多层反射镜被使用（“梯度布拉格”结构（5）），其为单色器，该反射器的长度（1）的时段（5）变化，从而无论入射角的特定波长的辐射是总是在相同方向上的布拉格 是-reflektiert。

    ＥＵＶ 마스크용 공간 영상 측정 장치 및 방법
    76.
    发明授权
    ＥＵＶ 마스크용 공간 영상 측정 장치 및 방법 有权
    用于测量EUV掩模的航空图像的装置和方法

    公开(公告)号：KR101535230B1

    公开(公告)日：2015-07-09

    申请号：KR1020090049097

    申请日：2009-06-03

    Applicant: 삼성전자주식회사

    Inventor： 이동근 ,  김성수

    IPC: G01B9/02 ,  G03F7/20

    CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/84 ,  G21K2201/061

    Abstract: EUV 마스크용공간영상측정장치및 공간영상측정방법에관해개시한다. 일실시예에따른공간영상측정장치는, 상부에반사형 EUV(extreme ultra-violet) 마스크가위치되고, 상기반사형 EUV 마스크를 x축혹은 y축의방향으로이동시키는이동부, 상기이동부의상부에위치하고, 간섭 EUV 광중 일정파장의광을선택하여반사시키는 X-ray 거울(mirror), 상기이동부와상기 X-ray 거울의사이에위치하고, 반사된상기간섭 EUV 광을상기반사형 EUV 마스크의일부영역에집속시키는존플레이트(zoneplate) 렌즈, 및상기이동부의상부에위치하고, 집속된상기간섭 EUV 광이상기반사형 EUV 마스크의일부영역에의하여반사되는경우, 반사된상기간섭 EUV 광의에너지를감지하는검출부를포함하고, 상기존플레이트렌즈, 상기검출부및 노광기(scanner)의각각의개구수(numeric aperture) NA, NA, 및 NA와, 상기노광기의사입사도()는, NA=NA/4 및 NA=NA/4*의관계를만족한다.

    ＥＵＶ 마스크용 공간 영상 측정 장치 및 방법
    78.
    发明公开
    ＥＵＶ 마스크용 공간 영상 측정 장치 및 방법 有权
    用于测量EUV掩蔽物的AERIAL图像的装置和方法

    公开(公告)号：KR1020100130422A

    公开(公告)日：2010-12-13

    申请号：KR1020090049097

    申请日：2009-06-03

    Applicant: 삼성전자주식회사

    Inventor： 이동근 ,  김성수

    IPC: G01B9/02 ,  G03F7/20

    CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/84 ,  G21K2201/061 ,  G01B9/02 ,  G03F7/20

    Abstract: PURPOSE: A device and a method for measuring an aerial image for an EUV(Extreme Ultra-Violet) mask are provided to enable the aerial image of an EUV mask since the number of aperture and the incident level of a scanner are perfectly emulated. CONSTITUTION: A device for measuring an aerial image for an EUV mask comprises a moving unit, an X-ray mirror(20), a zone-plate lens(30) and a detection unit(50). A reflective EUV mask(40) is located on the moving unit. The moving unit moves the reflective EUV mask along an x-axis or a y-axis. The X-ray mirror selects and reflects a given wavelength of light from coherent EUV light. The zone-plate lens focuses the reflected coherent EUV light on a part of the coherent EUV mask. If the focused coherent EUV light is reflected by a part of the reflective EUV maks, the detection unit senses the energy of the reflected coherent EUV light. NA_zonplate, NA_detector and NA_scanner, which are the numeric aperutres of the zone-plate lens, the detection unit and the scanner, and the incident level(σ) of the scanner satisfy the relationships NA_zoneplate = NA_scanner /4 and NA_detector = NA_scanner /4* σ.

    Abstract translation: 目的：提供一种用于测量EUV（Extreme Ultra-Violet）掩模的空间图像的装置和方法，以便能够完全模拟扫描仪的孔径数和入射级别，从而使EUV掩模的空中图像成为可能。 构成：用于测量EUV掩模的空间图像的装置包括移动单元，X射线反射镜（20），区域透镜（30）和检测单元（50）。 反射EUV掩模（40）位于移动单元上。 移动单元沿x轴或y轴移动反射EUV掩模。 X射线镜选择并反射来自相干EUV光的给定波长的光。 区域透镜将反射的相干EUV光聚焦在相干EUV掩模的一部分上。 如果聚焦的相干EUV光被反射EUV maks的一部分反射，则检测单元感测反射的相干EUV光的能量。 NA_zonplate，NA_detector和NA_scanner，它们是区域透镜，检测单元和扫描仪的数字校准和扫描仪的入射等级（σ）满足关系NA_zoneplate = NA_scanner / 4和NA_detector = NA_scanner / 4 * σ。

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